Patent application number | Description | Published |
20090015811 | EXPOSURE APPARATUS, METHOD FOR SELECTING OPTICAL ELEMENT, AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a light source configured to generate light having a wavelength of 250 nm or less, an illumination optical system comprising an optical element having synthetic quartz as a lens material and configured to illuminate an original plate using the light generated by the light source, and a projection optical system configured to project a pattern of the original plate onto a substrate. A value of an absorption coefficient of a hydroxyl group of the optical element having an infrared absorption band at 3585 cm | 01-15-2009 |
20090040497 | EXPOSURE APPARATUS, ADJUSTING METHOD, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate an original with light from a light source, a projection optical system configured to project a pattern image of the original onto a substrate, an optical integrator configured to form a pupil plane of the illumination optical system on an exit surface of the optical integrator, a first light-shielding unit and a second light-shielding unit each of which includes a plurality of light-shielding plates configured to shield certain components of the light from the light source, and a driving unit configured to drive the plurality of light-shielding plates. | 02-12-2009 |
20090075216 | STORAGE MEDIUM STORING EXPOSURE CONDITION DETERMINATION PROGRAM, EXPOSURE CONDITION DETERMINATION METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A computer-readable storage medium storing a program for causing a computer to execute determination of an exposure condition for use in illuminating an original plate with an illumination optical system and projecting an image of a pattern of the original plate onto a substrate through a projection optical system. The program causes the computer to perform operations including setting a light intensity distribution on a pupil plane in the illumination optical system based on a constraint condition concerning an optical element constituting the illumination optical system, calculating the image of the pattern of the original plate to be projected onto the substrate using the light intensity distribution, and determining the exposure condition for exposing the substrate with the image of the pattern of the original plate based on a calculation result of the image of the pattern of the original plate and the constraint condition. | 03-19-2009 |
20090135398 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes an illumination optical system configured to illuminate an original by a luminous flux from a light source and a projection optical system configured to project a pattern of the original onto a substrate. The illumination optical system includes a generator configured to form an effective light source as a light intensity distribution on a surface that has a Fourier transformation relationship with the original and an exposure dose adjuster arranged closer to the light source than the generator and configured to control an exposure dose on an exposure surface. The exposure dose adjuster includes a transmittance adjuster configured to discretely adjust a transmittance of the luminous flux, a zoom optical system configured to adjust a diameter of the luminous flux, and an aperture having a predetermined aperture area that defines a diameter of the luminous flux that has been adjusted by the zoom optical system. | 05-28-2009 |
20110304741 | IMAGE PICKUP APPARATUS - The image pickup apparatus includes an image sensor unit including an optical system forming an optical image of an object placed on a stage part and plural image sensors each of which captures part of the optical image, a drive mechanism relativity moving the stage part and the image sensor unit, and a processing part causing the image sensor unit to perform plural image capturing operations with causing the drive mechanism to relatively move the stage part and the image sensor unit after each image capturing operation, and combining the plural captured images to produce a whole image covering the whole image capturing area. The plural image sensors are arranged such that an effective diameter of the optical system necessary to introduce light from the stage part to all the plural image sensors is smaller than a diameter of a circle circumscribed to the whole image capturing area. | 12-15-2011 |
20120314051 | IMAGE PICKUP APPARATUS - An image pickup apparatus of the present invention includes a light source unit, an illumination optical system configured to introduce a light from the light source unit onto a plane to be illuminated, a sample stage configured to place an object on the plane to be illuminated, an image pickup optical system configured to form an image of the object placed on the plane to be illuminated, an image pickup element portion configured by disposing a plurality of image pickup elements on an image plane of the image pickup optical system, and a light shielding member configured to reduce entrance of a light to an area where the plurality of image pickup elements of the image pickup element portion are not disposed. | 12-13-2012 |
20130162801 | MICROSCOPE - Provided is a microscope which includes an image pickup element, a light source, an optical system, a control unit and a sensor. The control unit controls for the acquisition of, in parallel with the first image pickup event by the image pickup element, necessary information when the second image pickup event by the image pickup element is performed, by using the sensor. A pair of sensors for a microscope includes a pair of sensors. A first sensor of the pair of sensors provides a signal that represents an environmental variable of a first area at a first period in time. A second sensor of the pair of sensors provides a signal that represents a quality of the first sensor's ability to represent the environmental variable of a second area at the first period in time, wherein the second sensor is adjacent to the first sensor. | 06-27-2013 |
20130169859 | IMAGING APPARATUS - An imaging apparatus ( | 07-04-2013 |
20130222569 | IMAGING APPARATUS - An imaging apparatus includes: an illumination optical system including a light source and guiding the light from the light source to an illuminated surface B including an object; a plurality of image sensors for acquiring an image of the illuminated surface formed by an imaging optical system; a measurement unit for measuring a size of the object; and a control unit for determining an image sensor to be used when acquiring the image of the illuminated surface, among the plurality of image sensors, based on a measurement result of the measurement unit. | 08-29-2013 |
20140160267 | Image Pickup Apparatus - An image pickup apparatus includes a measuring section configured to measure a surface shape of an object, an image pickup section configured to obtain images of different areas of the object on an image plane of an image pickup optical system by image pickup elements, a focal-position detecting unit configured to detect a focal position of the object where a focal-position detecting point is focused on the image plane, and a focal-position determining unit configured to determine a focal position of the object at a point different from the focal-position detecting point on the basis of detection of the focal-position detecting unit and measurement of the measuring section. The image pickup section takes the images of the different areas on the basis of determination of the focal-position determining unit while the images are focused on the image pickup elements. | 06-12-2014 |