Patent application number | Description | Published |
20100072170 | SHORT PITCH METAL GRATINGS AND METHODS FOR MAKING THE SAME - Methods for forming a metal grating include providing a first grating including a plurality of grating lines formed from a dielectric material, each grating having a pair of sidewalls, facing sidewalls of adjacent grating lines being separated by corresponding trenches, the grating lines and trenches forming a grating surface; forming a layer of a metal on the grating surface, where the metal layer has a constant thickness and conforms to the grating surface; and removing portions of the metal layer between sidewalls of adjacent grating lines of the first grating to form a metal grating having grating lines formed from the metal, the grating lines of the metal grating corresponding to the portions of the metal layer adjacent the sidewalls of the grating lines of the first grating. The metal grating has a pitch of 200 nm or less, a depth of 50 nm or more, and the grating lines of the metal grating have an aspect ratio of 10-to-1 or more. | 03-25-2010 |
20100073756 | PATTERNED POLARIZATION-SENSITIVE OPTICAL ELEMENTS AND DEVICES USING THE SAME - In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object. | 03-25-2010 |
20100075262 | POST ARRAYS AND METHODS OF MAKING THE SAME - In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees. | 03-25-2010 |