Patent application number | Description | Published |
20100062613 | METHOD OF PROCESSING A SUBSTRATE - A method of processing a substrate using plasma includes loading a substrate into a chamber, processing the substrate with a first plasma mode and then processing the substrate with a second plasma mode, wherein at least one of the first plasma mode and the second plasma mode is a time-modulation mode in which a plasma induced in the chamber is periodically turned on and off to reduce plasma-induced damage in the substrate. | 03-11-2010 |
20100130018 | Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device - Synchronous pulse plasma etching equipment includes a first electrode and one or more second electrodes configured to generate plasma in a plasma etching chamber. A first radio frequency power output unit is configured to apply a first radio frequency power having a first frequency and a first duty ratio to the first electrode, and to output a control signal including information about a phase of the first radio frequency power. At least one second radio frequency power output unit is configured to apply a second radio frequency power having a second frequency and a second duty ratio to a corresponding second electrode among the second electrodes. The second radio frequency power output unit is configured to control the second radio frequency power to be synchronized with the first radio frequency power or to have a phase difference from the first radio frequency power in response to the control signal. | 05-27-2010 |
20100203699 | Method of forming semiconductor device - Provided may be a method of forming a semiconductor device. The method may include performing a pre-anisotropic etching process on a dielectric layer exposed by a guide opening, performing an etch-back process on a mask layer and performing a post anisotropic etching process through a guide opening using the etched mask layer as an etching mask. | 08-12-2010 |
20110143537 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE AND SYNCHRONOUS PULSE PLASMA ETCHING EQUIPMENT FOR THE SAME - Provided are a method of fabricating a semiconductor device and synchronous pulse plasma etching equipment for the same. The method includes outputting a first radio frequency (RF) power and a control signal and outputting a second RF power. The first RF power is pulse-width modulated to have a first frequency and a first duty ratio, and is applied to a first electrode in a plasma etching chamber. The control signal includes information on a phase of the first RF power. The second RF power is pulse-width modulated to have the first frequency and a second duty ratio smaller than the first duty ratio, is applied to a corresponding second electrode among second electrodes in the plasma etching chamber, and is supplied for a time section in which the first RF power is supplied. | 06-16-2011 |
20130008867 | METHODS FOR MANUFACTURING MAGNETIC TUNNEL JUNCTION STRUCTURE - Methods for manufacturing a magnetic tunnel junction structure include forming a magnetic tunnel junction (MTJ) layer by sequentially stacking a first ferromagnetic layer, a tunnel insulation layer, and a second ferromagnetic layer on a substrate, forming a mask pattern on the MTJ layer, and etching at least a portion of the MTJ layer in an etching chamber using the mask pattern as an etch mask, wherein the etching of the at least a portion of the MTJ layer includes applying a RF source power to a first electrode of the etching chamber as first RF power in a first pulselike mode, and applying a RF bias power to a second electrode of the etching chamber as second RF power in a second pulselike mode. The second pulselike mode of the RF bias power has a different phase from the first pulselike mode of the RF source power. | 01-10-2013 |
20140024138 | METHOD FOR ETCHING METAL LAYER AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME - The inventive concepts disclosed herein include, for instance, methods for etching a metal layer and methods for manufacturing a semiconductor device using the etched metal layer. A wafer including a metal layer and a mask layer on the metal layer may be loaded into a process chamber. An etching gas may be supplied into the process chamber to etch the metal layer exposed by the mask layer. After the etching process, the mask layer may be removed. The etching gas can include phosphorus (P) and fluorine (F). An RF power may be constantly or selectively supplied to the process chamber, or different levels of RF power can be selectively supplied. An etching gas can be supplied to the process chamber when the RF power is off or at a lower level. A surface activation gas can be supplied when the RF power is on or at a higher level. | 01-23-2014 |
20140124881 | SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME - Provided are semiconductor devices and methods of fabricating the same. The semiconductor device may include lower wires, upper wires crossing the lower wires, select elements provided at intersections between the lower and upper wires, and memory elements provided between the select elements and the upper wires. Each of the memory elements may include a lower electrode having a top width greater than a bottom width, and a data storage layer including a plurality of magnetic layers stacked on a top surface of the lower electrode and having a rounded edge. | 05-08-2014 |
20150044781 | METHOD OF FORMING MAGNETIC MEMORY DEVICES - Provided is a method of forming a magnetic memory device. A first magnetic layer, a tunnel barrier, and a second magnetic layer are deposited on a substrate. The second magnetic layer, the tunnel barrier, and the first magnetic layer are etched to form magnetic tunnel junction structures. An ion beam etching process is performed using an oxygen-containing source gas to remove etching by-products on sidewalls of the magnetic tunnel junction structure and to oxidize the sidewalls of the magnetic tunnel junction structures. | 02-12-2015 |
20150069560 | MAGNETIC MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - Magnetic memory devices and methods of manufacturing the same are disclosed. A method may include forming a magnetic tunnel junction layer on a substrate, forming mask patterns on the magnetic tunnel junction layer, and sequentially performing a plurality of ion implantation processes using the mask patterns as ion implantation masks to form an isolation region in the magnetic tunnel junction layer. The isolation region may thereby define magnetic tunnel junction parts that are disposed under corresponding ones of the mask patterns. A magnetic memory device may include a plurality of magnetic tunnel junction parts electrically and magnetically isolated from each other through the isolation region. | 03-12-2015 |
Patent application number | Description | Published |
20090051098 | PRINTING SYSTEM, JOB PROCESSING METHOD, STORAGE MEDIUM, PROGRAM PRODUCT, AND PRINTING APPARATUS - A printing system which is capable of performing square back processing and preventing occurrence of a new trouble of inadvertently creating a saddle-stitched brochure defective in the appearance of a trimmed edge and/or print appearance, which is unexpected by an operator. A receiving unit receives a job of a first type for creating a saddle-stitched brochure subjected to square back processing and trimming processing or a second type creating a saddle-stitched brochure not subjected to the square back processing but subjected to the trimming processing. A controller controls a trimming position at an end of the sheet bundle for the job and/or an image printing position on a sheet included in the sheet bundle based on whether a job to be processed is of the first type or of the second type. | 02-26-2009 |
20090055012 | PRINTING SYSTEM, PRINTING APPARATUS, JOB PROCESSING METHOD, STORAGE MEDIUM, AND PROGRAM - A printing system which is capable of performing square back processing and has a mechanism that makes it possible to prevent occurrence of a new trouble of inadvertently creating a saddle-stitched brochure defective in appearance and/or stackability, which is unexpected by an operator. A printing apparatus receives plural jobs including a saddle-stitch job for creating a saddle-stitched brochure of a predetermined kind. In the saddle-stitch job, saddle-stitch processing and square back processing are carried out. The square back processing is performed by a saddle-stitching machine. The saddle-stitching machine forms a flat surface on the back of a saddle-stitched brochure. A controller permits or inhibits creating the saddle-stitched brochure of the predetermined kind for a job based on whether the job meets a predetermined condition. | 02-26-2009 |
20090257088 | IMAGE PROCESSING SYSTEM, IMAGE PROCESSING METHOD AND STORAGE MEDIUM - According to an embodiment of the present invention, when image data is output from an image forming apparatus, even if the specified sheet feeding unit is changed, an image positional shift function can be utilized. In an image processing apparatus, a factor according to which readjustment may be provided is generated, such as switching of sheet feeding trays or rotation of an image. In this case, the image processing apparatus can transmit a readjustment request to an external controller. The external controller receiving the readjustment request from the image processing apparatus changes the adjustment value and carries out a RIP processing again. Then, the external controller can re-transmit the image data subjected to the RIP processing to the image processing apparatus. | 10-15-2009 |
20100315657 | PRINTING SYSTEM, METHOD FOR CONTROLLING THE PRINTING SYSTEM, AND COMPUTER-READABLE STORAGE MEDIUM - A control method for controlling a printing system includes selectively executing an inline job and an offline job. The inline job is for executing post-processing on a sheet printed by a printing apparatus by using a post-processing apparatus and the offline job is for executing post-processing on a sheet without executing printing by the printing apparatus by using the post-processing apparatus. The control method also includes restricting execution of the inline job if a sheet has been set in a paper feed unit that is a paper feed source of the offline job to be executed. | 12-16-2010 |
20120243961 | PRINTING SYSTEM, JOB PROCESSING METHOD, STORAGE MEDIUM, PROGRAM PRODUCT, AND PRINTING APPARATUS - A printing system which is capable of performing square back processing and preventing occurrence of a new trouble of inadvertently creating a saddle-stitched brochure defective in the appearance of a trimmed edge and/or print appearance, which is unexpected by an operator. A receiving unit receives a job of a first type for creating a saddle-stitched brochure subjected to square back processing and trimming processing or a second type creating a saddle-stitched brochure not subjected to the square back processing but subjected to the trimming processing. A controller controls a trimming position at an end of the sheet bundle for the job and/or an image printing position on a sheet included in the sheet bundle based on whether a job to be processed is of the first type or of the second type. | 09-27-2012 |