Patent application number | Description | Published |
20080312858 | SYSTEM AND METHOD FOR RULE-BASED DATA MINING AND PROBLEM DETECTION FOR SEMICONDUCTOR FABRICATION - A fabrication history of a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target. | 12-18-2008 |
20090093904 | System and Method for Rule-Based Data Mining and Problem Detection for Semiconductor Fabrication - A fabrication history a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target. | 04-09-2009 |
20110276170 | ENHANCING INVESTIGATION OF VARIABILITY BY INCLUSION OF SIMILAR OBJECTS WITH KNOWN DIFFERENCES TO THE ORIGINAL ONES - A system, method and/or computer program product for analyzing a functionality of at least two manufactured products obtain a first characteristic of a first manufactured product. The system acquires a second characteristic of a second manufactured product. The system identifies a common feature between the first characteristic and the second characteristic. The system identifies a distinguishable feature between the first characteristic and the second characteristic. The system determines a cause of a deviation of a functionality in the first manufactured product or the second manufactured product or both manufactured products based on the identified common feature or the identified distinguishable feature or both features. | 11-10-2011 |
20120215335 | DETECTING COMBINED TOOL INCOMPATIBILITIES AND DEFECTS IN SEMICONDUCTOR MANUFACTURING - A system, a method and a computer program product for identifying incompatible manufacturing tools. The system receives measurements of products that were subject to a manufacturing process involving a plurality of manufacturing tools. The measurements pertain to a performance characteristic of each product. The system evaluates whether each manufacturing tool implemented in a sequential manufacturing process individually performs normally based on the received measurements. In response to evaluating each manufacturing tool implemented in said manufacturing process individually performs normally, the system evaluates whether a first combination of the manufacturing tools together in sequential manufacturing process perform normally based on the received measurements. The system further evaluates performance of products generated by all other combinations of tools in the sequential manufacturing process not including the first combination of tools, and, using objective measures, identifies a combination of tools that perform optimally. | 08-23-2012 |
20130103178 | ENHANCING INVESTIGATION OF VARIABILITY BY INCLUSION OF SIMILAR OBJECTS WITH KNOWN DIFFERENCES TO THE ORIGINAL ONES - A system, method and/or computer program product for analyzing a functionality of at least two manufactured products obtain a first characteristic of a first manufactured product. The system acquires a second characteristic of a second manufactured product. The system identifies a common feature between the first characteristic and the second characteristic. The system identifies a distinguishable feature between the first characteristic and the second characteristic. The system determines a cause of a deviation of a functionality in the first manufactured product or the second manufactured product or both manufactured products based on the identified common feature or the identified distinguishable feature or both features. | 04-25-2013 |