Patent application number | Description | Published |
20100321831 | WRITE POLE FABRICATED USING A CARBON HARD MASK AND METHOD OF MAKING - A magnetic writer comprises a write pole, a substrate and a non-magnetic, oxygen-free buffer material. The write pole has a leading edge, a trailing edge, a first side and second side. The substrate is at the leading edge of the write pole. The non-magnetic, oxygen-free buffer material is located between the write pole and the substrate. | 12-23-2010 |
20120270073 | Magnetic Element With Dual Magnetic Moments - An apparatus and associated method may be used to provide a data sensing element capable of detecting changes in magnetic states. Various embodiments of the present invention are generally directed to a magnetically responsive lamination of layers and [a] means for generating a high magnetic moment region proximal to an air bearing surface (ABS) and a low magnetic moment region proximal to a hard magnet. | 10-25-2012 |
20130095349 | READER STOP-LAYERS - Tolerances for manufacturing reader structures for transducer heads continue to grow smaller and storage density in corresponding storage media increases. Reader stop layers may be utilized during manufacturing of reader structures to protect various layers of the reader structure from recession and/or scratches while processing other non-protected layers of the reader structure. For example, the stop layer may have a very low polish rate during mechanical or chemical-mechanical polishing. Surrounding areas may be significantly polished while a structure protected by a stop layer with a very low polish rate is substantially unaffected. The stop layer may then be removed via etching, for example, after the mechanical or chemical-mechanical polishing is completed. | 04-18-2013 |
20130149559 | Magnetic Element with Dual Magnetic Moments - An apparatus and associated method may be used to provide a data sensing element capable of detecting changes in magnetic states. Various embodiments of the present invention are generally directed to a magnetically responsive lamination of layers and [a] means for generating a high magnetic moment region proximal to an air bearing surface (ABS) and a low magnetic moment region proximal to a hard magnet. | 06-13-2013 |
20130286511 | Biased Two Dimensional Magnetic Sensor - Apparatus for two dimensional reading. In accordance with some embodiments, a magnetic read element has a bias magnet disposed between a plurality of read sensors. The bias magnet may be configured to concurrently bias each read sensor to a predetermined magnetization. | 10-31-2013 |
20140057133 | ALIGNED MAGNETIC INSULATING FEATURE - Various apparatus and associated method embodiments are generally directed to a magnetic stack positioned on an air bearing surface (ABS) and biased to a predetermined magnetization by a bias magnet. The bias magnet can be separated from the magnetic stack and at least one magnetic shield by a self-aligned magnetic insulating feature that is comprised of first and second insulating layers. | 02-27-2014 |
20140177102 | MULTI-READER METHOD AND APPARATUS - In accordance with one embodiment, a multi-reader can be manufactured so as to be able to read from multiple regions of a storage device contemporaneously during operation. Such a device can be configured, for example, by forming a first wall; forming a second wall; and utilizing the first wall and the second wall to form two adjacent reader stacks | 06-26-2014 |
20140302345 | MAGNETORESISTIVE SENSOR WITH STOP-LAYERS - Tolerances for manufacturing reader structures for transducer heads continue to grow smaller and storage density in corresponding storage media increases. Reader stop layers may be utilized during manufacturing of reader structures to protect various layers of the reader structure from recession and/or scratches while processing other non-protected layers of the reader structure. For example, the stop layer may have a very low polish rate during mechanical or chemical-mechanical polishing. Surrounding areas may be significantly polished while a structure protected by a stop layer with a very low polish rate is substantially unaffected. The stop layer may then be removed via etching, for example, after the mechanical or chemical-mechanical polishing is completed. | 10-09-2014 |