Teruhide
Teruhide Hayasida, Shinagawa-Ku JP
Patent application number | Description | Published |
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20140350854 | INFORMATION PROVIDING SYSTEM AND INFORMATION PROVIDING METHOD - An information providing system includes an obtaining portion that obtains image information captured by a moving object traveling on a road, and an information providing portion that provides the obtained image information, and additional information related to the image information. | 11-27-2014 |
Teruhide Inoue, Minato-Ku JP
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20110043872 | ERECTING EQUAL-MAGNIFICATION LENS ARRAY PLATE, OPTICAL SCANNING UNIT, AND IMAGE READING DEVICE - An erecting equal-magnification lens array plate includes a stack of a first lens array plate provided with a plurality of first lenses arranged on a first surface and a plurality of second lenses arranged on a second surface, and a second lens array plate provided with a plurality of third lenses arranged on a third surface and a plurality of fourth lenses arranged on a fourth surface. The erecting equal-magnification lens array plate is provided with a first light shielding wall provided upright to surround the first lens, and a second light shielding wall provided upright to surround the fourth lens. An area on the first surface of the first lens array plate outside the effective region of the first lenses is roughened. | 02-24-2011 |
Teruhide Inoue, Tokyo JP
Patent application number | Description | Published |
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20090131239 | BASE GLASS COMPOSITION FOR GRADED-REFRACTIVE-INDEX ROD LENS AND GRADED-REFRACTIVE-INDEX ROD LENS PRODUCED FROM THE SAME - A glass composition suitable for producing a graded-refractive-index rod lens having an angular aperture of 16-20° without containing lead or thallium and a graded-refractive-index rod lens produced from the composition are provided. | 05-21-2009 |
20090323196 | CLAD GLASS COMPOSITION AND MOTHER GLASS ROD FOR GRADIENT-INDEX ROD LENS FORMED USING THE SAME, GRADIENT-INDEX ROD LENS AND METHOD OF MANUFACTURING THE SAME, ROD LENS ARRAY, AND IMAGE PROCESSOR - The present invention provides a clad glass composition that is excellent in devitrification resistance and that prevents the whole mother glass rod from devitrifying by preventing a core glass composition from devitrifying in forming a mother glass rod using a concentric crucible drawing method. The clad glass composition forms a clad of a mother glass rod for a gradient-index rod lens having a core/clad structure. The clad glass composition includes the following components, indicated by mol %: 45 to 65% SiO | 12-31-2009 |
Teruhide Nishino, Yokohama-Shi JP
Patent application number | Description | Published |
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20100014945 | SEMICONDUCTOR PROCESSING APPARATUS HAVING ALL-ROUND TYPE WAFER HANDLING CHAMBER - A semiconductor manufacturing apparatus includes a wafer handling chamber; at least one wafer input/output chamber attached to the wafer handling chamber; and multiple wafer processing chambers attached to the wafer handling chamber. The wafer handling chamber has a polygonal shape on a processing chamber level on which the wafer processing chambers are installed, and one wafer processing chamber is installed on each and every side of the polygon. | 01-21-2010 |
20100049353 | SEMICONDUCTOR MANUFACTURING APPARATUS EQUIPPED WITH WAFER INSPECTION DEVICE AND INSPECTION TECHNIQUES - A semiconductor manufacturing apparatus includes a processing unit for processing at least one wafer; a loading/unloading unit for loading/unloading at least wafer; an input/output chamber for taking in a processed wafer from the processing unit and taking out the processed wafer to the loading/unloading unit, and taking in a unprocessed wafer from the loading/unloading unit and taking out the unprocessed wafer to the reaction unit; and a wafer inspection device for inspecting the processed wafer through a light transmittable top portion of the input/output chamber, through which light is transmittable, while the processed wafer is temporarily placed in the input/output chamber. | 02-25-2010 |
20100158644 | SEMICONDUCTOR-PROCESSING APPARATUS EQUIPPED WITH ROBOT DIAGNOSTIC MODULE - A semiconductor-processing apparatus includes: a wafer transfer chamber provided with a wafer transfer robot having an end effector therein, at least one reactor connected to the wafer transfer chamber, and a robot diagnostic module connected to the wafer transfer chamber for diagnosing the transfer robot. The robot diagnostic module includes at least one sensor for detecting a position of the end effector when the end effector is located inside the robot diagnostic module. | 06-24-2010 |