Teplin
Charles Teplin, Golden, CO US
Patent application number | Description | Published |
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20110030773 | PHOTOVOLTAIC CELL WITH BACK-SURFACE REFLECTIVITY SCATTERING - Crystal oriented photovoltaic cells with increased efficiency are disclosed herein. In an exemplary embodiment, a photovoltaic device includes a metal substrate with a crystalline orientation comprising a diffracting structure integrated into a surface of the metal substrate. The photovoltaic device includes a heteroepitaxial crystal silicon layer having the crystalline orientation of the metal substrate and a heteroepitaxially grown buffer layer having the crystalline orientation. The buffer layer is positioned adjacent to the surface of the metal substrate having the diffracting structure. | 02-10-2011 |
20120315405 | HOT WIRE CHEMICAL VAPOR DEPOSTION (HWCVD) WITH CARBIDE FILAMENTS - A hot wire chemical vapor deposition apparatus for use in depositing thin films such as amorphous or epitaxial silicon upon a surface of a wafer or substrate by cracking a source or precursor gas such as silane. The apparatus includes a vacuum chamber and a source of precursor gas operable to inject the precursor gas into the chamber. The HWCVD apparatus also includes a heater with a support surface exposed to the deposition chamber, and the heater is operable to heat a substrate positioned upon the support surface. The apparatus includes a catalytic decomposition assembly with a filament positioned between the heater and the precursor gas inlet for selectively passing a current through the filament to resistively heat material of the filament. The filament material may be carbide such as tantalum carbide, which may be coated on a graphite core. | 12-13-2012 |
Charles Teplin, Boulder, CO US
Patent application number | Description | Published |
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20110146791 | EPITAXIAL GROWTH OF SILICON FOR LAYER TRANSFER - Methods of preparing a thin crystalline silicon film for transfer and devices utilizing a transferred crystalline silicon film are disclosed. The methods include preparing a silicon growth substrate which has an interface defining substance associated with an exterior surface. The methods further include depositing an epitaxial layer of silicon on the silicon growth substrate at the surface and separating the epitaxial layer from the substrate substantially along the plane or other surface defined by the interface defining substance. The epitaxial layer may be utilized as a thin film of crystalline silicon in any type of semiconductor device which requires a crystalline silicon layer. In use, the epitaxial transfer layer may be associated with a secondary substrate. | 06-23-2011 |
Charles W. Teplin, Golden, CO US
Patent application number | Description | Published |
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20110308615 | CRYSTAL SILICON PROCESSES AND PRODUCTS - Crystal silicon processes and products ( | 12-22-2011 |
20130168684 | BACK CONTACT TO FILM SILICON ON METAL FOR PHOTOVOLTAIC CELLS - A crystal oriented metal back contact for solar cells is disclosed herein. In one embodiment, a photovoltaic device and methods for making the photovoltaic device are disclosed. The photovoltaic device includes a metal substrate with a crystalline orientation and a heteroepitaxial crystal silicon layer having the same crystal orientation of the metal substrate. A heteroepitaxial buffer layer having the crystal orientation of the metal substrate is positioned between the substrate and the crystal silicon layer to reduce diffusion of metal from the metal foil into the crystal silicon layer and provide chemical compatibility with the heteroepitaxial crystal silicon layer. Additionally, the buffer layer includes one or more electrically conductive pathways to electrically couple the crystal silicon layer and the metal substrate. | 07-04-2013 |
20140141563 | BACK CONTACT TO FILM SILICON ON METAL FOR PHOTOVOLTAIC CELLS - Systems and Methods for back contact to film silicon on metal for photovoltaic cells are provided. In one embodiment, a method for creating a conductive pathway in a photovoltaic cell comprises: obtaining a layered photovoltaic device comprising: a metal substrate with a crystal orientation; a crystal semiconductor layer with the crystal orientation; and a heteroepitaxially grown buffer layer positioned between the substrate and the crystal semiconductor layer; and forming one or more conductive pathways between the crystal semiconductor layer and the metal substrate, the pathways being through at least a portion of the buffer layer. | 05-22-2014 |