Patent application number | Description | Published |
20080201313 | DYNAMIC GRAPHICAL DATABASE QUERY INTERFACE - A graphical query interface provides visual feedback to a user during the construction of a query. In a first embodiment, the visual feedback helps the user determine the quality of the query as the query is being built. The relationship of columns in the database is graphically displayed to a user. When the user selects a column in the database, a filtered display mechanism displays only those columns or records that satisfy the portion of the query already constructed. In a second embodiment, the visual feedback eliminates some possible selections in the query tree due to previously-made selections that eliminate the eliminated selections as possibilities. In the second embodiment, the visual feedback mechanism may function according to data values in columns, and may also function according to known relationships between columns themselves. | 08-21-2008 |
20090094217 | DYNAMIC GRAPHICAL DATABASE QUERY INTERFACE - A graphical query interface provides visual feedback to a user during the construction of a query. In a first embodiment, the visual feedback helps the user determine the quality of the query as the query is being built. The relationship of columns in the database is graphically displayed to a user. When the user selects a column in the database, a filtered display mechanism displays only those columns or records that satisfy the portion of the query already constructed. In a second embodiment, the visual feedback eliminates some possible selections in the query tree due to previously-made selections that eliminate the eliminated selections as possibilities. In the second embodiment, the visual feedback mechanism may function according to data values in columns, and may also function according to known relationships between columns themselves. | 04-09-2009 |
20090106217 | ONTOLOGY-BASED NETWORK SEARCH ENGINE - A method and apparatus for searching for a documents residing on a network comprises receiving a search request from a user. The search request comprises one or more search terms of an ontology. The ontology includes a plurality of terms. One or more of the plurality of terms includes a plurality of sub-category terms. One or more documents residing on the network is identified based on the one or more search terms and an ontology index. The ontology index comprises a plurality of relationships between the plurality of terms and sub-category terms of the ontology and a plurality of documents residing on the network. One or more search results that describe the one or more documents is presented to the user. The one or more documents contain the one or more search terms, or one of the plurality of sub-category terms of the one or more search terms. | 04-23-2009 |
20090112838 | ONTOLOGY-BASED NETWORK SEARCH ENGINE - A method and apparatus for searching for a documents residing on a network comprises receiving a search request from a user. The search request comprises one or more search terms of an ontology. The ontology includes a plurality of terms. One or more of the plurality of terms includes a plurality of sub-category terms. One or more documents residing on the network is identified based on the one or more search terms and an ontology index. The ontology index comprises a plurality of relationships between the plurality of terms and sub-category terms of the ontology and a plurality of documents residing on the network. One or more search results that describe the one or more documents is presented to the user. The one or more documents contain the one or more search terms, or one of the plurality of sub-category terms of the one or more search terms. | 04-30-2009 |
20130132405 | Dynamically Associating Different Query Execution Strategies with Selective Portions of a Database Table - A query facility for database queries dynamically determines whether selective portions of a database table are likely to benefit from separate query execution strategies, and constructs an appropriate separate execution strategies accordingly. Preferably, the database contains at least one relatively large table comprising multiple partitions, each sharing the definitional structure of the table and containing a different respective discrete subset of the table records. The query facility compares metadata for different partitions to determine whether sufficiently large differences exist among the partitions, and in appropriate cases selects one or more partitions for separate execution strategies. Preferably, partitions are ranked for separate evaluation using a weighting formula which takes into account: (a) the number of indexes for the partition, (b) recency of change activity, and (c) the size of the partition. | 05-23-2013 |
Patent application number | Description | Published |
20090073448 | Method of measuring the overlay error, an inspection apparatus and a lithographic apparatus - The reflected radiation from a target mark including, for example, a plurality of gratings is detected by an array of pixels. The overlay error of the gratings for each pixel is detected, and an array of overlay errors is determined. Rather than simply averaging the overlay error value for all the pixels, filtering is performed. Pixels may be filtered according to the detected value of the overlay error or the detected intensity of the pixel. | 03-19-2009 |
20090195768 | Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark - An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°<α<90° and a second area comprising second periodic structure formed by second mark lines extending in a second direction, the second direction being at a second angle β with respect to the scribe lane direction: −90°≦β<0°. | 08-06-2009 |
20100301458 | Alignment Target Contrast in a Lithographic Double Patterning Process - A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The day may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist). | 12-02-2010 |
20110075238 | Method and System for Increasing Alignment Target Contrast - A semiconductor wafer is aligned using a double patterning process. A first resist layer having a first optical characteristic is deposited and foams at least one alignment mark. The first resist layer is developed. A second resist layer having a second optical characteristic is deposited over the first resist layer. The combination of first and second resist layers and alignment mark has a characteristic such that radiation of a pre-determined wavelength incident on the alignment mark produces a first or higher order diffraction as a function of the first and second optical characteristics. | 03-31-2011 |
20120218533 | METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPHIC APPARATUS AND AN APPARATUS FOR CONTROLLING LITHOGRAPHIC PROCESSING BY A LITHOGRAPHIC APPARATUS - Estimating model parameters of a lithographic apparatus and controlling lithographic processing by a lithographic apparatus includes performing an exposure using a lithographic apparatus projecting a pattern onto a wafer. A set of predetermined wafer measurement locations is measured. Predetermined and measured locations of the marks are used to generate radial basis functions. Model parameters of said substrate are calculated using the generated radial basis functions as a basis function across said substrate. Finally, the estimated model parameters are used to control the lithographic apparatus in order to expose the substrate. | 08-30-2012 |
20140192333 | Alignment Target Contrast in a Lithographic Double Patterning Process - A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist). | 07-10-2014 |