Patent application number | Description | Published |
20090027391 | DIRECTABLE LIGHTING METHOD AND APPARATUS - A method for a computer system includes receiving a plurality of values for an illumination parameter associated with an illumination source for a scene, determining a plurality illumination contributions for a surface of an object within the scene, in response to the plurality of values, determining a plurality of texture maps associated with the surface of the object in response to the plurality of illumination contributions, wherein each of the plurality of texture maps is associated with each of the plurality of values for the illumination parameter, receiving a value for the illumination parameter at render time from a user, determining a texture map associated with the surface of the object, in response to the value for the illumination parameter and in response to the plurality of texture maps, rendering the surface of the object using the texture map to form an image, and displaying the image to the user. | 01-29-2009 |
20130055107 | COLLABORATION PLANE - Methods and systems for dynamically and collaboratively generating software documentation are described. In particular, methods and systems provide for in-context authoring, identification, and presentation of software documentation based on one or more determined contexts. For example, methods and systems enable a computing device to identify one or more current contexts for the device, and to provide documentation content based on the identified context. | 02-28-2013 |
Patent application number | Description | Published |
20090078360 | Method of manufacturing apparatus for spatial and temporal control of temperature on a substrate - An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate. | 03-26-2009 |
20090301657 | PLASMA PROCESSING SYSTEMS WITH MECHANISMS FOR CONTROLLING TEMPERATURES OF COMPONENTS - A plasma processing system with improved component temperature control is disclosed. The system may include a plasma processing chamber having a chamber wall. The system may also include an electrode disposed inside the plasma processing chamber. The system may also include a support member disposed inside the plasma processing chamber for supporting the electrode. The system may also include a support plate disposed outside the chamber wall. The system may also include a cantilever disposed through the chamber wall for coupling the support member with the support plate. The system may also include a lift plate disposed between the chamber wall and the support plate. The system may also include thermally resistive coupling mechanisms for mechanically coupling the lift plate with the support plate. | 12-10-2009 |
20120018411 | APPARATUS FOR SPATIAL AND TEMPORAL CONTROL OF TEMPERATURE ON A SUBSTRATE - An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. | 01-26-2012 |
20130072024 | APPARATUS FOR SPATIAL AND TEMPORAL CONTROL OF TEMPERATURE ON A SUBSTRATE - An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate. | 03-21-2013 |
20140332161 | APPARATUS FOR SPATIAL AND TEMPORAL CONTROL OF TEMPERATURE ON A SUBSTRATE - An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. | 11-13-2014 |
Patent application number | Description | Published |
20090199665 | FLOATING COLLAR CLAMPING DEVICE FOR AUTO-ALIGNING NUT AND SCREW IN LINEAR MOTION LEADSCREW AND NUT ASSEMBLY - An auto-aligning linear motion apparatus is provided. The apparatus includes a leadscrew. The apparatus also includes a nut arrangement configured to surround the leadscrew, wherein the nut arrangement includes at least a nut, a nut bracket, and a floating collar. A shoulder screw is inserted through a nut bracket slot of the nut bracket and a nut slot of the nut to rest at least partially within the floating collar. One dimension of the nut bracket slot is larger than a dimension through a cross-section area of the shoulder screw to enable the shoulder screw to move within the nut bracket slot to adjust the nut arrangement as the leadscrew is rotated to maintain a concentric relationship between the nut arrangement and the leadscrew. | 08-13-2009 |
20090199766 | ELECTRODE ORIENTATION AND PARALLELISM ADJUSTMENT MECHANISM FOR PLASMA PROCESSING SYSTEMS - A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction. | 08-13-2009 |
20090200268 | ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEAL - A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall. | 08-13-2009 |
20120291954 | ELECTRODE ORIENTATION AND PARALLELISM ADJUSTMENT MECHANISM FOR PLASMA PROCESSING SYSTEMS - A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction. | 11-22-2012 |
20130333498 | FLOATING COLLAR CLAMPING DEVICE FOR AUTO-ALIGNING NUT AND SCREW IN LINEAR MOTION LEADSCREW AND NUT ASSEMBLY AND METHODS THEREOF - An auto-aligning linear motion apparatus is provided. The apparatus includes a leadscrew. The apparatus also includes a nut arrangement configured to surround the leadscrew, wherein the nut arrangement includes at least a nut, a nut bracket, and a floating collar. A shoulder screw is inserted through a nut bracket slot of the nut bracket and a nut slot of the nut to rest at least partially within the floating collar. One dimension of the not bracket slot is larger than a dimension through a cross-section area of the shoulder screw to enable the shoulder screw to move within the nut bracket slot to adjust the nut arrangement as the leadscrew is rotated to maintain a concentric relationship between the nut arrangement and the leadscrew. | 12-19-2013 |
20130340938 | ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEAL - A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall. | 12-26-2013 |
20160033977 | PLASMA PROCESSING DEVICES HAVING MULTI-PORT VALVE ASSEMBLIES - A plasma processing device may include a plasma processing chamber, a plasma electrode assembly, a wafer stage, a plasma producing gas inlet, a plurality of vacuum ports, at least one vacuum pump, and a multi-port valve assembly. The multi-port valve assembly may comprise a movable seal plate positioned in the plasma processing chamber. The movable seal plate may comprise a transverse port sealing surface that is shaped and sized to completely overlap the plurality of vacuum ports in a closed state, to partially overlap the plurality of vacuum ports in a partially open state, and to avoid substantial overlap of the plurality of vacuum ports in an open state. The multi-port valve assembly may comprise a transverse actuator coupled to the movable seal plate and a sealing actuator coupled to the movable seal plate. | 02-04-2016 |