Patent application number | Description | Published |
20080241751 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized. | 10-02-2008 |
20080274422 | PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION - Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present invention is for preparing a chemically amplified resist composition containing a binder, an acid generator, a nitrogenous basic substance and a solvent and it has steps of selecting, as the solvent, a solvent having a peroxide content not greater than an acceptable level, and mixing constituent materials of the resist composition in the selected solvent. | 11-06-2008 |
20090030177 | SYNTHESIS OF PHOTORESIST POLYMER - A polymer for use in photoresist compositions is synthesized by effecting polymerization reaction to form a polymerization product mixture and subjecting the mixture to molecular weight fractionation by a liquid phase separation technique using a good solvent and a poor solvent. The fractionation step is iterated at least twice, and one iteration of fractionation includes adding a good solvent which is different from the good solvent added in the other iteration of fractionation. | 01-29-2009 |
20100261123 | PATTERNING PROCESS - In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1,400-5,000 pbw of the solvent is present per 100 pbw of the base resin, and the solvent comprises at least 60 wt % of PGMEA and ethyl lactate, and 0.2-20 wt % of a high-boiling solvent. A resist pattern is formed by coating the resist composition on a substrate, prebaking, patternwise exposure, post-exposure baking, development, and heat treatment. | 10-14-2010 |
20110177464 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized. | 07-21-2011 |
20110294047 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS - A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity. | 12-01-2011 |
Patent application number | Description | Published |
20090039672 | Glass run and manufacturing method thereof - A glass run includes a main body portion attached to a channel portion DC provided along an inner periphery of a door frame and having an approximately U-shape in section, formed of a base bottom portion and an exterior sidewall portion and an interior sidewall portion extending from the base bottom portion and an exterior seal lip and an interior seal lip extending from almost front ends of the exterior sidewall portion and the interior sidewall portion to an inside of the main body portion. Moreover, for the glass run, by molding, integrally formed is an entire longitudinal area having a sectional shape having the main body portion and the interior and exterior seal lips and provided with an upper side portion corresponding to an upper edge portion of a door glass and a front vertical side portion and a rear vertical side portion corresponding to a front edge portion and a rear edge portion of the door glass. | 02-12-2009 |
20110277388 | Weather strip and production method for the same - A method for producing a weather strip, includes an extrusion step for extruding a non-vulcanized and non-foamed rubber into a predetermined shape, a coating step for coating a treatment liquid containing a simple sulfur, a sulfur compound, or both of the simple sulfur and the sulfur compound on an outer surface of a sealing part of a non-vulcanized and non-foamed intermediate molded body that is molded by the extrusion step, and a vulcanizing and foaming step for forming a skin layer in a non-foamed state by heating and vulcanizing a surface of the treatment liquid, and forming a sponge layer by vulcanizing and foaming the non-vulcanized and non-foamed rubber that is internal from the skin layer by passing the intermediate molded body on which the treatment liquid has been coated during the coating step through a heating zone, the steps being performed when molding the extruded part. | 11-17-2011 |
20140053469 | GLASS RUN WITH DEVIATION PREVENTION PORTION - A glass run includes a main body portion attached to a mounting portion provided along an inner periphery of a door frame of a vehicle with an approximately U-shape in a cross section, the main body portion including a base bottom portion, an interior sidewall portion, and an exterior sidewall portion extending from the base bottom portion, and an interior seal lip and an exterior seal lip extending from front ends of the interior sidewall portion and the exterior sidewall portion to an inside of the main body portion. An entire longitudinal area of the glass run is integrally formed by molding to be provided with an upper side portion corresponding to an upper edge portion of a door glass and a front vertical side portion and a rear vertical side portion corresponding to a front edge portion and a rear edge portion of the door glass. | 02-27-2014 |