Patent application number | Description | Published |
20080311515 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) including a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) having an acetal-type acid dissociable, dissolution inhibiting group, and the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) (wherein Z represents a hydrogen atom or a group represented by general formula (b1-1-1); R | 12-18-2008 |
20090253075 | POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
| 10-08-2009 |
20090269706 | METHOD FOR FORMING RESIST PATTERN - A method for forming a resist pattern that includes the steps of: forming a resist film on a substrate using a resist composition including a resin component (A) that exhibits changed alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure; selectively exposing the resist film; and developing the resist film using an alkali developing solution for a developing time of less than 30 seconds, thereby forming a resist pattern. | 10-29-2009 |
20090317745 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - Provided are a novel positive resist composition that includes a low molecular weight material as a base material component, and a method of forming a resist pattern using the positive resist composition. | 12-24-2009 |
20100055606 | Positive resist composition and method of forming resist pattern - The present invention provides a positive resist composition capable of forming a resist pattern with high resolution, and a method of forming a resist pattern. | 03-04-2010 |
20100143845 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a base material component (A) that exhibits increased solubility in an alkali developing solution under action of an acid; and an acid generator component (B) that generates an acid upon exposure, wherein the base material component (A) includes a polymeric compound (A1) having a structural unit (a10) derived from hydroxystyrene and a structural unit (a11) represented by general formula (a11-1) shown below: | 06-10-2010 |
20100297560 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND - A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein represents an anion moiety represented by one of general formulas (1) to (5)). | 11-25-2010 |
20100304289 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a resin component (A) and an acid-generator component (B), the resin component (A) including a structural unit (a1) derived from hydroxystyrene, and a structural unit (a2) having an acetal-type acid dissociable dissolution inhibiting group, and the acid-generator component (B) including an acid generator (B1- | 12-02-2010 |