Takeshi Shimada
Takeshi Shimada, Kawasaki JP
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20100080121 | Communication Method And Radio Network Control Device In A Mobile Communication System - A mobile communication system in which a mobile station copies data and transmits that copied data to a plurality of base stations, each base station sends that copied data to a serving radio network control device (S-RNC) directly or via a drift radio network control device (D-RNC), and the S-RNC selectively combines and outputs the received copied data; wherein a congestion monitoring unit monitors the congestion state of a line between the D-RNC and S-RNC, and when that line is congested, a D-RNC selectively combines the copied data that is inputted from the plurality of base stations and sends the result to that line, and when the line is not congested, the D-RNC sends the copied data that is inputted from the plurality of base stations to the line without performing selective combination. | 04-01-2010 |
20110038316 | CONTROL APPARATUS, WIRELESS COMMUNICATION APPARATUS, COMMUNICATION SYSTEM, AND CONTROL METHOD - A mobile communication system has a mobile terminal, basestations, and a Radio Network Controller (RNC). In the case where drop of a frame occurs during data communication in Iub/Iur (between the basestations and the RNC), the RNC executes retransmission of an EDCH FP frame between the RNC and the basestations by transmitting a TN frame to the basestations to repair the drop of the frame without executing retransmission with the terminal device. | 02-17-2011 |
Takeshi Shimada, Hikari JP
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20100294432 | Plasma Processing Apparatus - A plasma processing apparatus, a processing chamber having one surface formed by a flat-plate-like insulating-material manufactured window, a sample mounting electrode having a sample mounting plane formed on a surface opposed to the insulating-material manufactured window, a gas-inlet for a flat-plate-structured capacitively coupled antenna formed on an outer surface of the insulating-material manufactured window with slits provided in a radial pattern, an inductively coupled antenna formed outside OF the insulating-material manufactured window and performing an inductive coupling with a plasma via the window, the plasma being formed within the processing chamber, a radio-frequency power supply, and an LC circuit. The inductively coupled antenna is configured by a coil which is wound a plurality of times with a direction defined as a longitudinal direction, the direction extending perpendicular to the sample mounting plane. | 11-25-2010 |
20110111602 | PLASMA PROCESSING METHOD - Disclosed is a plasma processing method that excels in mass production consistency as it suppresses the flaking of a reaction product deposited on a portion outside the effective range of a Faraday shield in a vacuum vessel. The plasma processing method, which plasma-processes a sample having a layer made of an etch-resistant material by using a plasma processing apparatus having a discharger and a processor, includes a first step of performing an aging process that is to be performed before etching the sample, a second step of performing etching by plasma-processing the layer that is made of an etch-resistant material and formed on the sample, a third step of stabilizing a film deposited on the inner wall of a chamber forming the processor by performing plasma processing after the second step, and an additional step of repeating the second step and the third step. | 05-12-2011 |
20120103933 | PLASMA PROCESSING METHOD - In a plasma processing method of dry-etching of a magnetic film having a thickness of 200 nm to 500 nm, a plasma processing method of dry-etching of a sample having the magnetic film on which a multilayered film including a resist film, an non-organic film underlying the resist film, a Cr film underlying the non-organic film, and an Al | 05-03-2012 |
20130146563 | PLASMA PROCESSING METHOD - A method for plasma-etching a magnetic film and plasma-cleaning, in which deposits in an etching processing chamber are efficiently removed while corrosion of a wafer is suppressed, is provided. A plasma processing method for plasma-etching a to-be-processed substrate having a magnetic film in an etching processing chamber includes the steps of plasma-etching the magnetic film using a first gas not containing chlorine, transferring out the to-be-processed substrate from the etching processing chamber, first plasma-cleaning of the etching processing chamber using a second gas containing chlorine, and second plasma-cleaning using a third gas containing hydrogen after the first plasma cleaning. | 06-13-2013 |
Takeshi Shimada, Hikari-Shi JP
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20090078676 | METHOD FOR DRY ETCHING Al2O3 FILM - The invention provides a dry etching method for processing a wafer having an Ru film formed on a thick Al | 03-26-2009 |
20100288195 | PLASMA PROCESSING METHOD AND APPARATUS - Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time. | 11-18-2010 |
20140116985 | METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT - The present invention provides a method for manufacturing a magnetoresistive element having a high selection ratio of an insulating layer to a free layer. The method for manufacturing a magnetoresistive element includes the steps of preparing (left drawing, middle drawing) a substrate on which a free layer, a fixed layer disposed under a first magnetic layer, and a barrier layer that is an insulating layer disposed between the free layer and the fixed layer are formed and processing (right drawing) the free layer by plasma etching, in which an insulating layer configuring the barrier layer contains a Ta element or a Ti element. | 05-01-2014 |
20150020970 | PLASMA PROCESSING METHOD AND APPARATUS - Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time. | 01-22-2015 |
Takeshi Shimada, Shizuoka JP
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20100183862 | RESIN COMPOSITION, AND PREPREG - The present invention discloses: | 07-22-2010 |
Takeshi Shimada, Gunma JP
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20090130559 | METHOD OF PRODUCING POSITIVE ELECTRODE ACTIVE MATERIAL AND NONAQUEOUS ELECTROLYTE BATTERY USING THE SAME - The present invention provides a positive electrode active material that has rate characteristics suitable for nonaqueous electrolyte batteries and particularly nonaqueous electrolyte secondary batteries, a method by which this positive electrode active material can be easily mass produced, and a high-performance nonaqueous electrolyte battery that has a positive electrode active material obtained by this method. | 05-21-2009 |
20100148114 | POSITIVE ELECTRODE ACTIVE MATERIAL AND METHOD OF PRODUCING THE SAME AND NONAQUEOUS ELECTROLYTE BATTERY HAVING POSITIVE ELECTRODE CONTAINING POSITIVE ELECTRODE ACTIVE MATERIAL - The present invention provides an olivine-type positive electrode active material that is an inexpensive and very safe positive electrode active material that also exhibits excellent battery properties even at high energy densities. The present invention also provides a method of producing this olivine-type positive electrode active material and a nonaqueous electrolyte battery that has a positive electrode that contains this olivine-type positive electrode active material. The present invention relates to a positive electrode active material that comprises an olivine-type lithium manganese phosphate compound represented by the following general formula (1) | 06-17-2010 |
Takeshi Shimada, Saitama JP
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20090036293 | SEMICONDUCTOR CERAMIC COMPOSITION - It is intended to provide a semiconductor ceramic composition containing no Pb, which is capable of shifting the Curie temperate to a positive direction as well as of controlling room temperature resistivity and having an excellent jump characteristic. Since the semiconductor ceramic composition in which a portion of Ba of BaTiO | 02-05-2009 |
20090057626 | SEMICONDUCTOR CERAMIC COMPOSITION AND METHOD FOR PRODUCING THE SAME - It is intended to provide a semiconductor ceramic composition capable of shifting the Curie temperature to a positive direction as well as of obtaining an excellent jump characteristic while suppressing an increase in room temperature resistivity to a minimum value. There is provided a semiconductor ceramic composition in which a portion of Ba of BaTiO | 03-05-2009 |
20090105064 | SEMICONDUCTOR CERAMIC COMPOSITION AND METHOD FOR PRODUCING THE SAME - To provide a semiconductor ceramic composition containing no Pb in which a part of Ba in BaTiO | 04-23-2009 |
20100012905 | SEMICONDUCTOR CERAMIC COMPOSITION AND PROCESS FOR PRODUCING THE SAME - It is intended to provide a semiconductor ceramic composition in which a part of Ba in BaTiO | 01-21-2010 |
20100075824 | SEMICONDUCTOR CERAMIC COMPOSITION AND METHOD FOR PRODUCING THE SAME - It is intended to provide a Pb-free semiconductor ceramic composition capable of shifting its Curie temperature toward a positive direction and capable of enhancing its jump characteristic while minimizing the increase in the resistivity at room temperature. There is provided a semiconductor ceramic composition in which a part of Ba of BaTiO | 03-25-2010 |
Takeshi Shimada, Kyoto JP
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20090297066 | Image transmitting apparatus and image transmitting program - A game apparatus functioning as an image transmitting apparatus includes a CPU. The CPU performs an edit of at least one image with a controller according to an instruction by a user, transmits image data of the image through a wireless communication module to a network during execution of the edit, and further transmits layout information indicating a layout of the image after completion of the edit. | 12-03-2009 |
20130103748 | INFORMATION PROCESSING SYSTEM, STORAGE MEDIUM HAVING STORED THEREIN INFORMATION PROCESSING PROGRAM, INFORMATION PROCESSING APPARATUS, AND INFORMATION PROCESSING METHOD - In an example information processing system including a server and at least one apparatus capable of communicating with the server, the apparatus includes at least an application execution unit. The application execution unit executes a predetermined application. The system includes, by either one of the apparatus and the server or by a cooperation of the apparatus and the server, an execution state determination unit and a writing management unit. The execution state determination unit determines whether or not a state of the execution performed by the application execution unit has satisfied a predetermined condition. The writing management unit, when the state has satisfied the predetermined condition, permits a user of the apparatus to write in information managed by the server. | 04-25-2013 |
Takeshi Shimada, Kyoto-Shi JP
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20110113423 | SYSTEM AND METHOD FOR INSTALLING SOFTWARE APPLICATIONS - An example method of installing an application onto an apparatus involves displaying an application menu screen comprising a fixed number of menu item display locations, at least one of the menu item display locations displaying a first menu item for an non-installed application. An announcement screen is displayed in response to selection of the first menu item for the non-installed application, the announcement screen comprising a selection item configured to initiate a downloading operation for the non-installed application. The downloading operation is initiated in response to selection of the selection item. The application can be installed/non-installed separately from other applications. | 05-12-2011 |
20140123131 | SYSTEM AND METHOD FOR INSTALLING SOFTWARE APPLICATIONS - An example computer apparatus includes a processor coupled to a memory storing a program. The processor executes the program to perform operations including displaying an application menu screen displaying at least a selectable first menu item for an uninstalled first application and a selectable second menu item for an installed second application; periodically determining availability/unavailability of the first application for download from another computer apparatus; in response to selection of the first menu item if the most recent periodic determining has determined that the first application is unavailable for download from the server, providing announcement information about the first application; and in response to selection of the first menu item if the most recent periodic determining has determined that the first application is available for download from the server, initiating a process for downloading and installing the first application. | 05-01-2014 |
Takeshi Shimada, Tokyo JP
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20150194315 | PLASMA ETCHING METHOD - A plasma etching method for plasma etching a film to be etched to a size smaller than a prescribed size using a mask patterned to the prescribed size performs etching on the film to be etched to the size smaller than the prescribed size while forming a protection film on side walls of the film to be etched. | 07-09-2015 |