Patent application number | Description | Published |
20090018227 | Fine Particle-Dispersed Polyol Composition, Method for Producing Polymer Polyol, and Method for Producing Polyurethane Resin - A polyol composition comprising a polyol (a) and resin fine particles (b) dispersed in the polyol (a), and a method for producing the polyol composition are provided, wherein the resin fine particles (b) are particles such that an arithmetic standard deviation by volume of a particle size distribution of the particles, derived from respective values in 85 divisions of a range of 0.020 to 2000 μm determined by a laser diffraction/scattering particle size distribution analyzer, is not more than 0.6. A resin fine particle-dispersed polyol composition that, even if the resin particles dispersed in the polyol have a small particle diameter, allows the production of a polyurethane resin having an excellent mechanical strength such as elongation at break, and a method for producing the same, are provided. | 01-15-2009 |
20100036082 | POLYMER POLYOL, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING POLYURETHANE - A polymer polyol (A) that comprises a polyol (PL) and polymer particles (JR) having an ethylenically unsaturated compound (E) as a constituent unit and contained in a polyol (PL) is provided, in which a ratio of acrylonitrile in (E) is 0 mol % to 67 mol %, and relationship between a viscosity of the polymer polyol and a content (PC) of the polymer particles satisfies a formula (1) below, and/or satisfies formulae (2) and (3) below: | 02-11-2010 |
20100210768 | POLYMER POLYOL, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING POLYURETHANE RESIN - A polymer polyol (I) is provided that is formed of a polyol (A), polymer particles (B) obtained by polymerization of an ethylenically unsaturated compound (b), and an active-hydrogen-containing compound (d) having an aromatic ring and having a number-average molecular weight of 150 to 2,000, wherein a content of (d) is 1 to 20% on the basis of a weight of (B). The polymer polyol of the present invention contains polymer particles having sufficiently small particle diameters, has a low viscosity, and has excellent handleability. A polyurethane resin obtained by using the polymer polyol of the present invention has excellent mechanical strengths such as elongation at break. | 08-19-2010 |
20100222507 | METHOD FOR PRODUCING FINE-PARTICLE-DISPERSED POLYOL, AND METHOD FOR PRODUCING POLYURETHANE RESIN - A method for producing a fine-particle-dispersed polyol (I) is provided, the method including the steps (1) and (n−1): the step (1) of polymerizing an ethylenically unsaturated monomer (b) in a polyol (a), in the presence of fine particles (P1) and a radical polymerization initiator (c), so as to obtain a fine-particle-dispersed polyol intermediate (B2); and the step (n−1) of polymerizing (b) in a fine-particle-dispersed polyol intermediate (B(n−1)), in the presence of (c), so as to obtain a fine-particle-dispersed polyol intermediate (Bn) or the fine-particle-dispersed polyol (I), where n represents an integer of 3 to 7, wherein (P1) have a volume-average particle diameter (R1) of 0.01 μm to 1.0 μm, and a concentration of (b) in the step (1) is 7 wt % to 40 wt %. Thus, a method for producing a fine-particle-dispersed polyol can be provided that contains polymer fine particles dispersed in a polyol having a small particle diameter, and that, when it is used for forming a polyurethane resin, allows the polyurethane resin to exhibit excellent resin properties. | 09-02-2010 |
20110301256 | FINE PARTICLE-DISPERSED POLYOL COMPOSITION, METHOD FOR PRODUCING POLYMER POLYOL, AND METHOD FOR PRODUCING POLYURETHANE RESIN - A polyol composition comprising a polyol (a) and resin fine particles (b) dispersed in the polyol (a), and a method for producing the polyol composition are provided, wherein the resin fine particles (b) are particles such that an arithmetic standard deviation by volume of a particle size distribution of the particles, derived from respective values in 85 divisions of a range of 0.020 to 2000 μm determined by a laser diffraction/scattering particle size distribution analyzer, is not more than 0.6. A resin fine particle-dispersed polyol composition that, even if the resin particles dispersed in the polyol have a small particle diameter, allows the production of a polyurethane resin having an excellent mechanical strength such as elongation at break, and a method for producing the same, are provided. | 12-08-2011 |
20110301257 | FINE PARTICLE-DISPERSED POLYOL COMPOSITION, METHOD FOR PRODUCING POLYMER POLYOL, AND METHOD FOR PRODUCING POLYURETHANE RESIN - A polyol composition comprising a polyol (a) and resin fine particles (b) dispersed in the polyol (a), and a method for producing the polyol composition are provided, wherein the resin fine particles (b) are particles such that an arithmetic standard deviation by volume of a particle size distribution of the particles, derived from respective values in 85 divisions of a range of 0.020 to 2000 μm determined by a laser diffraction/scattering particle size distribution analyzer, is not more than 0.6. A resin fine particle-dispersed polyol composition that, even if the resin particles dispersed in the polyol have a small particle diameter, allows the production of a polyurethane resin having an excellent mechanical strength such as elongation at break, and a method for producing the same, are provided. | 12-08-2011 |
Patent application number | Description | Published |
20090305161 | LIQUID IMMERSION LITHOGRAPHY - A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator. | 12-10-2009 |
20100003615 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD - An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an alkaline developer. The upper layer-forming composition covers a photoresist film for forming a pattern by exposure to radiation. The composition comprises a resin dissolvable in a developer for the photoresist film and a solvent in which the resin is dissolved. The solvent has a viscosity of less than 5.2×10 | 01-07-2010 |
20120028198 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD - An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R | 02-02-2012 |