Patent application number | Description | Published |
20090057135 | SPUTTERING METHOD AND APPARATUS - The sputtering apparatus includes a vacuum vessel, a sputter electrode placed within the vacuum vessel to hold a target material to be sputtered, a radio frequency power source for applying radio frequency waves to the electrode, a substrate holder which is spaced from the electrode and on which a substrate is held, a thin film being to be deposited on the substrate from components of the target material, and an impedance adjusting circuit for adjusting a first impedance of the substrate holder. The impedance adjusting circuit has a first end directly set at a ground potential and has an impedance circuit which is adjustable for adjusting the first impedance, a second impedance of the impedance circuit is adjusted to thereby adjust the first impedance and, hence, a potential of the substrate. | 03-05-2009 |
20090066188 | PIEZOELECTRIC DEVICE, LIQUID DROPLET EJECTING HEAD USING THE SAME, AND PROCESS FOR PRODUCING THE SAME - The piezoelectric device includes a piezoelectric film that expands or contracts according to variations in voltage applied, a first electrode provided on a first side of the film, and a second electrode provided on a second side of the film. The film is formed on the second electrode by a vapor phase deposition and mainly composed of Pb | 03-12-2009 |
20100039481 | Film depositing apparatus, a film depositing method, a piezoelectric film, and a liquid ejecting apparatus - A film depositing apparatus comprises: a process chamber; a target holder provided in the process chamber for holding a target; a substrate holder for supporting a deposition substrate such that the deposition substrate faces the target holder in the process chamber; a power supply for supplying electric power between the target holder and the substrate holder to generate plasma in the process chamber; and an anode provided between the target holder and the substrate holder for capturing ions and/or electrons in the plasma being generated within the process chamber, wherein the anode includes: a cylindrical member provided so as to surround an outer periphery of a side of the substrate holder that faces the target holder; and at least one annular plate member attached to an inside wall of the cylindrical member, the plate member having a central opening larger than a surface of the deposition substrate. | 02-18-2010 |
20100039482 | MULTILAYER BODY, PIEZOELECTRIC ELEMENT, AND LIQUID EJECTING DEVICE - A multilayer body which includes a low-resistance metal layer having a low electrical resistance, excellent thermal resistance and low surface irregularity is provided. The multilayer body includes a substrate, and a low-resistance metal layer which is formed on the substrate and has a single-layer structure or a multilayer structure of two or more sublayers. The low-resistance metal layer includes a gold-containing layer or sublayer composed of gold and another metal. | 02-18-2010 |
20100066788 | PEROVSKITE-TYPE OXIDE FILM, PIEZOELECTRIC THIN-FILM DEVICE AND LIQUID EJECTING DEVICE USING PEROVSKITE-TYPE OXIDE FILM, AS WELL AS PRODUCTION PROCESS AND EVALUATION METHOD FOR PEROVSKITE-TYPE OXIDE FILM - Provided is a perovskite-type oxide film having a perovskite-type crystal structure and containing lead as a chief component, which, when subjected to Raman microspectroscopy at a plurality of points on a surface thereof so as to measure Raman spectra upon application of an electric field of 100 kV/cm and upon application of no electric field, has a mean of absolute values of peak shift amounts that is 2.2 cm | 03-18-2010 |
20100090154 | FILM DEPOSITING APPARATUS, A FILM DEPOSITING METHOD, A PIEZOELECTRIC FILM, AND A LIQUID EJECTING APPARATUS - A film depositing apparatus comprises: a process chamber; a gas supply source for supplying the process chamber with gases necessary for film deposition; an evacuating unit for evacuating the interior of the process chamber; a target holder placed within the process chamber for holding a target; a substrate holder for holding a deposition substrate within the process chamber in a face-to-face relation with the target holder; a power supply unit for supplying electric power between the target holder and the substrate holder to generate a plasma within the process chamber; and an anode provided between the target holder and the substrate holder so as to surround the outer periphery of the side of the substrate holder that faces the target holder, the anode comprising at least one plate member for capturing ions in the plasma generated within the process chamber. | 04-15-2010 |
20110041304 | PIEZOELECTRIC DEVICE, LIQUID DROPLET EJECTING HEAD USING THE SAME, AND PROCESS FOR PRODUCING THE SAME - The piezoelectric device includes a piezoelectric film that expands or contracts according to variations in voltage applied, a first electrode provided on a first side of the film, and a second electrode provided on a second side of the film. The film is formed on the second electrode by a vapor phase deposition and mainly composed of Pb | 02-24-2011 |
20130063800 | MIRROR DRIVING APPARATUS, METHOD OF DRIVING SAME AND METHOD OF MANUFACTURING SAME - An aspect of the present invention provides a mirror driving apparatus, including: a mirror section having a reflecting surface which reflects light; a pair of piezoelectric actuator sections arranged on either side of the mirror section; coupling sections which respectively connect one end of each of the piezoelectric actuator sections to an end portion of the mirror section which is distant from an axis of rotation of the mirror section in a direction along the reflecting surface and perpendicular to the axis of rotation; a fixing section which supports another end of each of the piezoelectric actuator sections; and a perpendicular movement suppressing structure which suppresses translational motion of the axis of rotation of the mirror section in a direction perpendicular to the reflecting surface, one end of the perpendicular movement suppressing structure being connected to the fixing section and another end thereof being connected to the mirror section. | 03-14-2013 |
20130208330 | MIRROR DRIVING DEVICE AND METHOD OF CONTROLLING THE DEVICE - A mirror driving device can include: a mirror part having a reflection surface configured to reflect light; mirror support parts formed at portions of the mirror part diagonal to each other; and a first actuator and a second actuator placed so as to surround the mirror part, wherein the first actuator and the second actuator each have a structure in which a plurality of first piezoelectric cantilevers with a longitudinal direction oriented to a direction of a first axis and a plurality of second piezoelectric cantilevers with a longitudinal direction oriented to a second axis are coupled together so as to be folded, and each of the first actuator and the second actuator has one end connected to the mirror part via a relevant one of the mirror support parts and another end connected to a fixing part near the mirror support part to which the one end is coupled. | 08-15-2013 |
20150022871 | MIRROR DRIVE DEVICE AND DRIVING METHOD THEREOF - In a mirror drive device, a first actuator section and a second actuator section are arranged on both sides of a mirror supporting section that supports a mirror section so as to sandwich the mirror supporting section. The upper electrode of a first actuator section includes a first electrode section and a second electrode section, and an upper electrode of a second actuator section includes a third electrode section and a fourth electrode section. The arrangements of the electrode sections correspond to stress distribution of principal stresses in the piezoelectric body in resonant mode vibration, and in a piezoelectric body portion that corresponds to positions of the first electrode section and the third electrode section and a piezoelectric body portion that corresponds to positions of the second electrode section and the fourth electrode section, stresses in opposite directions to each other are generated. | 01-22-2015 |