Takashi Koike
Takashi Koike, Shizuoka JP
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20080285901 | Wheel Support Bearing Assembly with Built-In Load Sensor - A wheel support bearing assembly comprises a stationary outer member and a rotatable inner member. The to-be-detected parts of angle detection sensors are fixed to the inner member and an outer race of a constant velocity joint connected to the inner member, respectively. Detecting parts of the angle detection sensors are fixed to the outer member in face-to-face relation with the to-be-detected parts. The bearing assembly also includes a load conversion unit detecting a relative angular difference between the inner member and the constant velocity universal joint by comparing the detection signals from the detecting parts to detect the load acting on the bearing assembly. | 11-20-2008 |
Takashi Koike, Ashigarakami-Gun JP
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20090232992 | REVERSE MICELLE NETHOD OF PRODUCING CORE/SHELL PARTICLES - A core/shell particle which includes a core component that contains a metal, and a shell component that coats the core component, the shell component including a a hydrolysate and/or a partial condensate of a compound represented by the formula “(R) | 09-17-2009 |
20110180135 | BUFFER LAYER MANUFACTURING METHOD AND PHOTOELECTRIC CONVERSION DEVICE - A method of manufacturing a buffer layer of a photoelectric conversion device having a stacked structure in which a lower electrode, a photoelectric conversion semiconductor layer that generates a current by absorbing light, the buffer layer, and a translucent conductive layer are stacked on a substrate, in which the buffer layer is formed by a CBD method, a pH variation of reaction solution for forming the buffer layer is controlled within 0.5 while deposition of the buffer layer by the CBD method is in progress, and the reaction solution includes a Cd or Zn metal and a sulfur source. | 07-28-2011 |
20110186955 | METHOD OF PRODUCING PHOTOELECTRIC CONVERSION DEVICE AND PHOTOELECTRIC CONVERSION DEVICE - A method of producing a photoelectric conversion device having a multilayer structure, which includes a lower electrode, a photoelectric conversion layer made of a compound semiconductor layer, a buffer layer made of a compound semiconductor layer, and a transparent conductive layer, formed on a substrate is disclosed. Prior to a buffer layer forming step of forming the buffer layer on the photoelectric conversion layer, Cd ions are diffused into the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer on the surface thereof in an aqueous solution, which is controlled to a predetermined temperature not less than 40° C. and less than 100° C., contains at least one Cd source and at least one alkaline agent and contains no S ion source, and has a Cd ion concentration of not less than 0.1 M and a pH value in the range from 9 to 13. | 08-04-2011 |
20110189814 | PROCESS FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICES - In a process for producing a photoelectric conversion device comprising a bottom electrode layer, a photoelectric conversion semiconductor layer, a buffer layer, and a transparent conductive layer, which are stacked in this order on a substrate, all film forming stages ranging from a stage of forming the buffer layer to a stage of forming the transparent conductive layer are performed with a liquid phase technique. The buffer layer is formed with a chemical bath deposition technique, and the transparent conductive layer is formed with an electrolytic deposition technique. | 08-04-2011 |
20110189816 | METHOD OF PRODUCING PHOTOELECTRIC CONVERSION DEVICE - A method of producing a photoelectric conversion device having a multilayer structure formed on a substrate, the multilayer structure including a lower electrode, a photoelectric conversion layer made of a compound semiconductor layer, an n-type buffer layer made of a compound semiconductor layer, and a transparent conductive layer, is disclosed. A reaction solution, which is an aqueous solution containing an n-type dopant element, at least one of ammonia and an ammonium salt, and thiourea, is prepared, the n-type dopant is diffused into the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer in the reaction solution controlled to a temperature in the range from 20° C. to 45° C.; and the buffer layer is deposited on the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer subjected to the diffusion step in the reaction solution controlled to a temperature in the range from 70° C. to 95° C. | 08-04-2011 |
Takashi Koike, Iwata-Shi JP
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20090202185 | Bearing assembly with built-in absolute encoder - The bearing assembly includes a rolling bearing including a rotatable raceway member and a stationary raceway member. This bearing assembly also includes a to-be-detected member carried by the raceway member and having a magnetic characteristic which cyclically varies in a direction circumferentially of the to-be-detected element and has a cycle matching with one complete rotation of the raceway member, a magnetic sensor unit carried by the raceway member in face-to-face relation with the to-be-detected member, and a magnetic detecting circuit to supply an electric power to the unit and to process an output signal from the unit to provide an output to an external circuit. The magnetic characteristic of the to-be-detected member represents a substantially sinusoidal waveform rising and falling more steeply than a sinusoidal waveform at a zero-crossing point. | 08-13-2009 |
Takashi Koike, Mie JP
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20120066653 | DOSE-DATA GENERATING APPARATUS, DOSE-DATA GENERATING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included. | 03-15-2012 |
20130298087 | DOSE-DATA GENERATING APPARATUS - According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included. | 11-07-2013 |
20140242733 | REFLECTIVE MASK, METHOD OF MONITORING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, provided is a reflective mask having a substrate, a reflection layer that reflects EUV light formed above the substrate, and an absorption layer that absorbs the EUV light formed above the reflection layer. The reflective mask further includes a monitor pattern monitoring an attachment amount of contamination attached during exposure. | 08-28-2014 |
Takashi Koike, Shinjuku-Ku JP
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20120171369 | METHOD FOR PRODUCING A PERPENDICULAR MAGNETIC RECORDING MEDIUM - To provide a method for manufacturing a perpendicular magnetic recording medium, which is capable of coping with the much higher recording density. | 07-05-2012 |
Takashi Koike, Tokyo JP
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20120175243 | Method of producing a perpendicular magnetic recording medium - To provide a method for manufacturing a perpendicular magnetic recording medium which has improved electromagnetic conversion characteristics, and thus making it possible to achieve the much higher recording density. | 07-12-2012 |
Takashi Koike, Mie-Ken JP
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20130252176 | METHOD FOR MAKING CORRECTION MAP OF DOSE AMOUNT, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good. | 09-26-2013 |
Takashi Koike, Ageo-Shi JP
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20140017514 | FINISHING AGENT FOR TRIVALENT CHROMIUM CHEMICAL CONVERSION COATING FILM, AND METHOD FOR FINISHING BLACK TRIVALENT CHROMIUM CHEMICAL CONVERSION COATING FILM - The purpose of the present invention is to provide a water-soluble finishing agent for a trivalent chromium chemical conversion coating film, which has low insulation, no problems with tightening properties, outstanding gloss and high corrosion resistance, and can obtain a trivalent chromium chemical conversion coating film, especially a black trivalent chromium chemical conversion coating film, having few scratches and flaws. The finishing agent for a trivalent chromium chemical conversion coating film is characterized by containing a trivalent chromium source, a phosphate ion source, a zinc ion source, a chelating agent which can form a complex with trivalent chromium, and a non-ionic water-soluble polymer compound selected from a group comprising poly(vinyl alcohol) and derivatives thereof, poly(vinyl pyrrolidone) and derivatives thereof, poly(alkylene glycol)s and derivatives thereof, and cellulose ethers and derivatives thereof. | 01-16-2014 |
Takashi Koike, Saitama JP
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20130301140 | STACK-TYPE LENS ARRAY AND LENS MODULE - Provided is a stack-type lens array capable of preventing a lens from peeling off due to stress during dicing or vibration and impact when used. The stack-type lens array is formed by stacking and bonding two lens sheets in which micro lenses are arranged on a flat portion at predetermined intervals. Antireflection films are vapor-deposited on a convex surface and a concave surface of the lens and a light shielding film is vapor-deposited such that a circular opening is formed at the center of the concave surface. The opening serves as a diaphragm aperture of the lens. An exposed surface in which neither the antireflection film nor the light shielding film is vapor-deposited is provided outside the light shielding film between adjacent lenses. A dicing line is set at the center of the exposed surface. An adhesive layer is formed in a predetermined pattern on the exposed surface. | 11-14-2013 |
20130342924 | LENS MODULE AND METHOD FOR MANUFACTURING THEREOF - A lens module capable of preventing a deterioration of optical properties and a method for manufacturing thereof are provided. Optical axes of lens portions of superimposed lens arrays are aligned. Substrate portions of the other lens arrays of the superimposed lens arrays except the lowermost lens array are cut by a first cutting portion. Subsequently, thermosetting resins are supplied from a gap between cut surfaces of the cut substrate portion so as to fill a gap between the substrate portions of the superimposed lens arrays with the thermosetting resins and to cause the thermosetting resins to integrally cover the cut surfaces of the substrate portion and a surface of the substrate portion of the uppermost lens array. Thereafter, the thermosetting resins are cured, and an individual lens module is separated by cutting the substrate portion of the lowermost lens array using a second cutting portion. | 12-26-2013 |