Patent application number | Description | Published |
20090015808 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
20090015816 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
20090109418 | Wafer table for immersion lithography - Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar. | 04-30-2009 |
20090128793 | Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method - A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking. | 05-21-2009 |
20100259737 | Exposure apparatus preventing gas from moving from exposure region to measurement region - An exposure apparatus that has an exposure region for irradiating exposure light to a substrate via an optical system and a liquid and a measurement region for obtaining information relating to the position of the substrate in advance of exposure and moves the substrate between the exposure region and the measurement region to perform exposure of the substrate; comprising a penetration shielding mechanism that prevents the penetration of the gas in the vicinity of the exposure region to the measurement region. | 10-14-2010 |
20110013161 | Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method - An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally. | 01-20-2011 |
20110228240 | Stage apparatus and exposure apparatus - A stage apparatus includes: a moving stage, which moves along a movement plane; a first moving table, which holds a specimen while being able to move with respect to the moving stage; and a second moving table, which is provided on the moving stage and, when the first moving table has moved from a first position to a second position, is positioned at the first position. | 09-22-2011 |
20110261331 | Exposure apparatus and device manufacturing method - A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table. | 10-27-2011 |
20110261345 | Exposure apparatus and device manufacturing method - A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. | 10-27-2011 |
20120094238 | SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion. | 04-19-2012 |
20130135596 | LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and liquid includes a movable member having an upper surface, a part of which holds the substrate. A liquid immersion system that has a supply port and a recovery port supplies the liquid to a space between the projection optical system and the upper surface via the supply port of a supply path and recovers the liquid of a liquid immersion region formed in the space via the recovery port of a recovery path. A flow path is connected to the supply path between the supply port and a source of the liquid, the flow path permitting flow therethrough to remove liquid that remains in the supply path, the liquid that remains in the supply path having been supplied from the source of the liquid without being discharged from the supply port. | 05-30-2013 |
20130135597 | EXPOSURE APPARATUS, METHOD FOR PRODUCING DEVICE, AND METHOD FOR CONTROLLING EXPOSURE APPARATUS - A liquid immersion exposure apparatus includes a movable member having a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under a projection optical system. A liquid immersion system has a supply path and a recovery path. The liquid immersion system supplies the liquid to a space between the projection optical system and the surface via the supply path and recovers the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path. A controller stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality. The abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area. | 05-30-2013 |
20130141701 | EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 06-06-2013 |
20130141703 | EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 06-06-2013 |
20130293855 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate via a projection optical system and a liquid. The exposure apparatus includes a stage that is movable below the projection optical system while holding the substrate and a detector that is capable of detecting a liquid adhered to a rear surface of the substrate. As an alternative, or in addition, the apparatus can include a detector that is capable of detecting a liquid adhered to an optical member disposed at the stage. | 11-07-2013 |
20130301016 | WAFER TABLE HAVING SENSOR FOR IMMERSION LITHOGRAPHY - A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and a liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The table assembly top surface has a first opening portion, and a top surface of a sensor is arranged inside of the first opening portion. The sensor top surface is positionable opposite the projection system by the table assembly such that a gap, in which the liquid can be maintained, is formed between the projection system and the sensor top surface. The table assembly and sensor top surfaces are apposed on a substantially same plane, or are substantially co-planar. | 11-14-2013 |
20130301018 | WAFER TABLE HAVING SENSOR FOR IMMERSION LITHOGRAPHY - A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The top surface and the substrate are positionable opposite to the projection system such that the liquid is maintained between the projection system and a portion of one or both of the top surface and a surface of the substrate. A sensor has a top surface arranged at the top surface of the table assembly and is positionable opposite to the projection system such that a gap, in which the liquid can be maintained, is formed between the projection system and the top surface of the sensor. The top surfaces of the table assembly and of the sensor are apposed on a substantially same plane, or are substantially co-planar. | 11-14-2013 |
20140022523 | EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART - An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening. | 01-23-2014 |
20150234282 | LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A liquid immersion exposure apparatus includes a projection system having a last optical element, a liquid supply system having a first path through which immersion liquid is supplied to a supply opening, and a liquid removal system having a second path connected to the first path. The liquid removal system removes the immersion liquid from the first path using the second path so that the supply flow path becomes a substantially gas filled space. | 08-20-2015 |
20150234293 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a projection system having a final optical element via which an exposure beam is projected, an immersion member having an opening through which the exposure beam is projected, liquid supply ports and liquid recovery ports, a stage which is movable below and relative to the projection system and the immersion member, the stage including a holder configured to hold a substrate, and a detection system configured to detect a residual liquid on at least one of the substrate held on the holder of the movable stage and the movable stage. A liquid immersion area that covers only a portion of the upper surface of the substrate is formed on an upper surface of the substrate held on the holder of the movable stage, while supplying immersion liquid via the liquid supply ports and removing the immersion liquid via the liquid recovery ports. | 08-20-2015 |
20150286151 | EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART - An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid ( | 10-08-2015 |
Patent application number | Description | Published |
20100309326 | IMAGE PICKUP APPARATUS DETACHABLY CONNECTING TO LIGHT EMITTING DEVICE AND CONTROL METHOD THEREOF - An image pickup apparatus detachably connecting to a light emitting device. Still image shooting is performed during moving image recording being paused according to a still image shooting instruction received during the moving image recording being performed and the moving image recording is resumed after performing the still image shooting. Information about charge control of the connected light emitting device is acquired. Light emitting of the connected light emitting device involved with the still image shooting is prohibited based on the acquired information about the charge control. | 12-09-2010 |
20110013894 | IMAGE PICKUP APPARATUS AND CONTROL METHOD THEREFOR - The image pickup apparatus includes an image pickup element including first pixels for photoelectrically converting an object image formed by a light flux from an image taking optical system and second pixels for photoelectrically converting optical images formed by light fluxes divided form the light flux from the image taking optical system, and a controller performing focus detection based on a phase difference of the optical images, control of an aperture stop included in the image taking optical system and an image capturing operation for generating a captured image by using signals obtained from the first pixels. The controller increases, when an image capturing aperture size of the aperture stop is smaller than a focus detecting aperture size in a case of performing the focus detection between the image capturing operations in continuous image capturing, the aperture size to the focus detecting aperture size in the focus detection. | 01-20-2011 |
20120133821 | IMAGE CAPTURING APPARATUS AND CONTROL METHOD FOR THE SAME - An image capturing apparatus that uses an image sensor having pixels for capturing an image and pixels for detecting a phase difference. If, in the case where it is determined that it is necessary to restart focus detection during recording of a moving image, an opening diameter of an aperture is not an opening diameter at which phase-difference detection type AF using the pixels for detecting a phase difference can be performed, the aperture is changed to an opening diameter at which phase-difference detection type AF can be performed during focus detection. Thus, even if a photographic lens that does not support driving within a minute range is mounted, a focus detection operation suitable for shooting a moving image can be performed. | 05-31-2012 |
20120307090 | IMAGING APPARATUS AND CONTROL METHOD CONFIGURED TO AUTHENTICATE A USER - An imaging apparatus includes a registration unit configured to register an ID tag, a detection unit configured to detect an ID tag within a detection area and a determination unit configured to determine if the ID tag detected by the detection unit is registered. The imaging apparatus further includes a operation member configured to execute a predetermined operation, and a control unit configured to prevent execution of the predetermined operation even if the operation member is operated, in cases where the ID tag detected by the detection unit is not registered in the registration unit. | 12-06-2012 |
20130057740 | IMAGE CAPTURE APPARATUS AND METHOD OF CONTROLLING THE SAME - An image capture apparatus comprises an image sensor, an acquisition unit which acquires information concerning distances to objects in a plurality of areas in an image capturing area, and a control unit which controls a charge accumulation period for each of a plurality of segmented areas of the image sensor, wherein the plurality of areas for which information concerning distances to the objects are acquired by the acquisition unit respectively correspond to the plurality of segmented areas, and the control unit controls the charge accumulation periods for the respective segmented areas at the time of light emission by a light-emitting device based on the information concerning the distances to the objects in the corresponding areas. | 03-07-2013 |
20140002682 | IMAGING APPARATUS AND CONTROL METHOD CONFIGURED TO AUTHENTICATE A USER | 01-02-2014 |
20140232911 | IMAGE CAPTURING APPARATUS AND CONTROL METHOD THEREOF - An image capturing apparatus comprises: a first image sensor configured to photo-electrically convert a subject image and output an image signal; a first image processing unit configured to develop a first image signal generated by the first image sensor; a second image processing unit configured to reduce a number of pixels in the first image signal and develop the image signal whose pixels have been reduced as a second image signal; a recording unit configured to record an image signal; and a display unit having a lower pixel count than the pixel count of the first image sensor, wherein in the case where an instruction to capture a still image has been made, the recording unit records the image signal developed by the first image processing unit and the display unit displays the image signal developed by the second image processing unit. | 08-21-2014 |