Patent application number | Description | Published |
20090284150 | PHOTOCATHODE APPARATUS USING PHOTOELECTRIC EFFECT OF SURFACE PLASMON RESONANCE PHOTONS - A photocathode apparatus is constructed by a transparent body adapted to receive incident light, and a metal cover layer formed on a surface of the transparent body. The incident light reaches an incident/reflective surface of the metal cover layer through the surface of the transparent body to excite surface plasmon resonance light in the incident/reflective surface of the metal cover layer, thus emitting photoelectrons from a photoelectric surface of the metal cover layer opposite to the incident/reflective surface thereof by the photoelectric effect of one of the surface plasmon resonance photons and its second harmonic generation wave. | 11-19-2009 |
20090296200 | OPTICAL AMPLIFIER USING PHOTOELECTRIC EFFECT OF SURFACE PLASMON RESONANCE PHOTONS AND ITS MANUFACTURING METHOD - In an optical amplifier including a metal layer having an incident/reflective surface adapted to receive incident light and output its reflective light, and a dielectric layer formed on an opposite surface of the metal layer opposing the incident/reflective surface, the incident light excites surface plasmon resonance light in the metal layer while the dielectric layer is excited, so that an extinct ion coefficient of the dielectric layer is made negative. | 12-03-2009 |
20100014546 | OPTICAL PULSE GENERATING APPARATUS USING PHOTOELECTRIC EFFECT OF SURFACE PLASMON RESONANCE PHOTONS AND ITS MANUFACTURING METHOD - In an optical pulse generating apparatus including a metal layer having an incident/reflective surface adapted to receive incident light and output its reflective light as an optical pulse signal, a dielectric layer formed on an opposite surface of the metal layer opposing the incident/reflective surface, and a dielectric layer exciting unit for exciting the dielectric layer on a time basis, the incident light exciting surface plasmon resonance light in the metal layer while the dielectric layer is excited on a time basis, so that an extinction coefficient of the dielectric layer is made negative. | 01-21-2010 |
20110052871 | HEAT DISSIPATING MATERIAL INCLUDING CARBON SUBSTRATE WITH NANOMETER-ORDER UNEVEN STRUCTURE AND ITS MANUFACTURING METHOD - A heat dissipating material includes a carbon substrate having an uneven structure on a surface thereof, and a size of the uneven structure is on the nanometer-order. | 03-03-2011 |
20140084785 | LIGHT SOURCE DEVICE, METHOD FOR MANUFACTURING THE SAME AND FILAMENT - A filament showing high radiation characteristics and hardly suffering from disconnection and film separation is provided by using a high melting point metal compound such as tantalum carbide. As the filament, a filament comprising a tungsten base material | 03-27-2014 |
20140084786 | LIGHT SOURCE DEVICE - A filament of simple structure showing improved conversion efficiency is provided. There is provided a light source device comprising a light-transmitting gas-tight container, a filament disposed in the light-transmitting gas-tight container, and a lead wire for supplying an electric current to the filament, wherein the filament consists of a single crystal. Sum of concentration of lattice defects and impurity concentration of the filament consisting of a single crystal is preferably lower than 0.01%. | 03-27-2014 |
20140292188 | INCANDESCENT BULB, FILAMENT, AND METHOD FOR MANUFACTURING FILAMENT - An object of the present invention is to provide a filament showing improved conversion efficiency with a simple configuration. According to the present invention, surface of a filament material processed into a predetermined shape is processed into a mirror surface by mechanical polishing, and surface roughness (center line average roughness Ra) thereof is thereby made to be 1 μm or smaller. Reflectance of the filament can be thereby improved, and emissivity of the filament for lights of the infrared wavelength region can be suppressed. | 10-02-2014 |
20140346944 | LIGHT SOURCE DEVICE AND FILAMENT - A light source device comprising a filament showing high electric power-to-visible light conversion efficiency is provided. The light source device of the present invention comprises a translucent gastight container, a filament disposed in the translucent gastight container, and a lead wire for supplying an electric current to the filament. The filament comprises a substrate formed from a metal material and a visible light-absorbing film covering the substrate. The visible light-absorbing film is transparent to lights of infrared region. The reflectance of the substrate for visible lights is thereby made low, and the reflectance of the substrate for infrared lights is thereby made high. Therefore, radiation of infrared lights is suppressed, and visible luminous efficiency can be enhanced. | 11-27-2014 |
20140361675 | LIGHT SOURCE DEVICE AND FILAMENT - A light source device comprising a filament showing high electric power-to-visible light conversion efficiency is provided. A light source device comprising a translucent gastight container, a filament disposed in the translucent gastight container, and a lead wire for supplying an electric current to the filament is provided. The filament comprises a substrate formed with a metal material and a white scatterer layer covering the substrate. To the white scatterer layer, a visible light-absorbing material that absorbs lights of visible region is added. The reflectance of the filament for visible lights is thereby made low, and the reflectance of the filament for infrared lights is thereby made high. Therefore, radiation of infrared lights is suppressed, and visible luminous efficiency can be enhanced. | 12-11-2014 |
Patent application number | Description | Published |
20080285052 | SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND COMPUTER - A shape measuring apparatus for measuring the shape of a measurement target surface includes an interferometer and computer. The interferometer senses interference light formed by measurement light from the measurement target surface and reference light by a photoelectric converter, while changing the light path length of the measurement light or the reference light. The computer Fourier-transforms a first interference signal sensed by the photoelectric converter to obtain a phase distribution and an amplitude distribution, shapes the amplitude distribution, inversely Fourier-transforms the phase distribution and the shaped amplitude distribution to obtain a second interference signal, and determines the shape of the measurement target surface based on the second interference signal. | 11-20-2008 |
20090219499 | SURFACE SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element. | 09-03-2009 |
20090244513 | POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides a position detection apparatus including a first obtaining unit configured to obtain imaging characteristics of an imaging optical system for a plurality of light beams, having different wavelength with each other, of the light having the wavelength width, a second obtaining unit configured to obtain optical images of a target object for the plurality of light beams, a restoration unit configured to restore optical images of the target object for the plurality of light beams by correcting, deterioration in the obtained optical images of the target object attributed to the imaging optical system, based on the obtained imaging characteristics of the imaging optical system, and a generation unit configured to generate an optical image of the target object for light including the plurality of light beams by synthesizing the restored optical images of the target object for the plurality of light beams. | 10-01-2009 |
20090286172 | SURFACE SHAPE MEASUREMENT APPARATUS AND EXPOSURE APPARATUS - A surface shape measurement apparatus is configured to measure a surface shape of an object to be measured, and includes a beam splitter configured to split white light from a light source into two light beams, a pair of prisms each configured to increase an incident angle of each light beam that has been split by the beam splitter and directed to the object or a reference surface, each prism having an antireflection part that is formed at a period of a wavelength of the white light or smaller and has a moth-eye shape, a superimposition unit configured to superimpose object light from the object with reference light from the reference surface and has passed the second prism, and to generate white interference light, and a Lyot filter configured to discretely separate the white interference light for each of a plurality of wavelengths. | 11-19-2009 |
20100092882 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus including a projection optical system configured to project a pattern of a reticle located on an object plane onto a substrate located on an image plane, a phase shift type mark mounted on a stage which holds the substrate, an image sensor which is set at one of a position of the object plane and a position optically conjugate to the object plane, and is configured to capture an image of the mark via the projection optical system, and a controller configured to control the stage based on an interval between edge images, formed by a pair of edge portions, in the image of the mark captured by the image sensor. | 04-15-2010 |
20110141451 | DISPLACEMENT MEASUREMENT DEVICE, EXPOSURE APPARATUS, AND WORKING DEVICE - A device has a scale on which a grating pattern is formed, a light source to irradiate light on the scale, a wavelength plate to transform multiple diffracted lights from the light source into circular polarized light, respectively, an optical element to superposition and cause interference of the multiple diffracted lights, and a photodetector to receive the interfered light. Also, a generating unit to generate linearly polarized light by the light from the light source, so that the multiple diffracted lights input to the wavelength plate become linearly polarized light with a same mutual polarization direction. | 06-16-2011 |
20110176139 | MEASURING APPARATUS AND EXPOSURE DEVICE - An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted. | 07-21-2011 |
20120164583 | DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of charged particle beams onto the substrate; a measurement device configured to detect a charged particle beam that reaches the measurement device due to a charged particle beam incident, via the projection system, on a mark formed on the substrate, to measure a position of the mark; and a controller. The controller is configured to control operations of the projection system and the measurement device so that the position of the mark is measured with at least one of the plurality of charged particle beams, in parallel with drawing on the substrate with a part of the plurality of charged particle beams. | 06-28-2012 |
20130021588 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A measurement apparatus includes a beam splitter that splits light from a light source into measurement light to be directed to an object to be measured and reference light to be directed to a reference surface, a beam combiner that combines the measurement light reflected by the object and the reference light reflected by the reference surface to generate combined light, and obtains physical information of the object based on the combined light. The measurement apparatus further includes a coherence controller which changes spatial coherences of the measurement light and the reference light. | 01-24-2013 |
20130112097 | IMPRINT METHOD IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - An imprint method of transferring a pattern formed on a mold onto a resin on a substrate. The substrate is held on a holding surface in a holding step. A shape of a substrate-side pattern area where the pattern is formed on the substrate is deformed in a deforming step. A resin on the deformed substrate-side pattern area is brought into contact with the mold in a contacting step. The resin is cured in a curing step, and the mold is released from the resin in contact with the mold in a mold-releasing step. In the deforming step, a deformation force, which is greater than a maximum static frictional force acting between a rear surface of the substrate corresponding to the substrate-side pattern area and the holding surface, is applied to the substrate in a direction along the surface thereof. | 05-09-2013 |
20130163004 | POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING DEVICE - A position detection apparatus that illuminates diffraction gratings formed on two objects with light from a light source and receives diffracted light from the diffraction gratings to acquire relative positions of the two objects includes: an optical system configured to cause plus n-th order diffracted light and minus n-th order diffracted light from each of the diffraction gratings to interfere with each other, where n is a natural number; a light receiving unit; and a processing unit, wherein the light receiving unit receives a two-beam interference light from each of the diffraction gratings, and wherein the processing unit acquires the relative positions of the two objects by using the two-beam interference light at an area where two-beam interference lights of the diffracted light from the respective diffraction gratings do not overlap each other among the two-beam interference lights of the diffracted light from each of the diffraction gratings. | 06-27-2013 |
20130168569 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus including a stage configured to hold the substrate and to be moved, a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams, a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage, and a processor configured to perform a process of obtaining a position of the mark. | 07-04-2013 |
20150015861 | CALIBRATION METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step. | 01-15-2015 |
20150022796 | INTERFEROMETER, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane. | 01-22-2015 |
Patent application number | Description | Published |
20090133484 | VEHICLE LOCKING DEVICE AND VEHICLE LOCKING METHOD - A vehicle locking device locking a vehicle on a chassis dynamometer, equipped with rollers allowing driving wheels of the vehicle placed thereon, while keeping the driving wheels thereof placed on the rollers, was configured so as to detect angles of traction, to determine traction forces optimum for hauling the vehicle based on the detected angles, and to control the vehicle locking device based on thus-determined traction forces so as to take up a belt, aiming at readily and stably locking a test vehicle under optimum traction forces. | 05-28-2009 |
20090310382 | IMAGE DISPLAY DEVICE - An image display device comprises a light-emitting unit ( | 12-17-2009 |
20100033072 | FIELD EMISSION ELECTRON SOURCE - A field emission electron source for emitting electrons under applied electric field includes a cold cathode having molecules of an aromatic compound vapor-deposited thereon at a pointed end of said cold cathode. | 02-11-2010 |
20120013837 | COMPOSITION FOR FORMING LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides: a composition for forming a liquid crystal alignment film capable of forming a liquid crystal alignment film excellent in evenness; and a liquid crystal display device. The present invention provides a composition for forming a liquid crystal alignment film, wherein the composition comprises: a material for forming a liquid crystal alignment film; 4,6-dimethyl-2-heptanone; diisobutyl ketone; and at least one of γ-butyrolactone and N-methyl-2-pyrrolidone as solvents. | 01-19-2012 |
20120063117 | LIGHT SOURCE APPARATUS - Provided is a light source apparatus having a phosphor layer | 03-15-2012 |
20130213460 | POWER GENERATION DEVICE, THERMAL POWER GENERATION METHOD AND SOLAR POWER GENERATION METHOD - A small sized power generator is provided, being highly efficient in power generation. The power generator can include a heat-light conversion element for converting heat to infrared light and a semiconductor power generation cell for converting the infrared light to electrical energy. The heat-light conversion element can include a material in which reflectance is higher on a long wavelength side of a predetermined infrared wavelength, relative to reflectance on a short wavelength side thereof. The material can cause radiation of the infrared light upon being heated. Heat from a heat source is transferred to the heat-light conversion element, thereby radiating the infrared light. The semiconductor power generation cell converts this infrared light to electrical energy, thereby performing thermal power generation. In order to heat the heat-light conversion element, a light collection optical system can be provided for collecting sunlight toward the heat-light conversion element, enabling solar thermo-photovoltaic power generation. | 08-22-2013 |
20140333194 | LIGHT SOURCE DEVICE AND FILAMENT - A light source device comprising a filament showing high electric power-to-visible light conversion efficiency is provided. A light source device comprising a translucent gastight container, a filament disposed in the translucent gastight container, and a lead wire for supplying an electric current to the filament is provided. The filament comprises a substrate formed from a metal material and a visible light reflectance-reducing film coating the substrate for reducing visible light reflectance of the substrate. The reflectance of the substrate for visible lights is thereby made low, and the reflectance of the substrate for infrared lights is thereby made high. Therefore, radiation of infrared lights is suppressed, and visible luminous efficiency can be enhanced. | 11-13-2014 |