Patent application number | Description | Published |
20080307991 | Method for producing metal thin film - A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate. | 12-18-2008 |
20090109355 | Polarizer, method of manufacturing polarizer and liquid crystal projector - A polarizer capable of being manufactured in simple steps, and a method of manufacturing the polarizer, as well as a liquid crystal projector are provided. The polarizer includes a substrate having light permeability, and a plurality of linear projections being arranged on the substrate and extending along one direction within a plane thereof. Each of the linear projections having a base layer and a plating layer in the named order from the substrate, the base layer containing a catalyst material for electroless plating process, and the plating layer being deposited by using the base layer as a catalyst. | 04-30-2009 |
20090263590 | METHOD OF MANUFACTURING POLYSILANE-MODIFIED SILICON FINE WIRE AND METHOD OF FORMING SILICON FILM - A method of forming a silicon film capable of forming an excellent high-crystalline silicon film without heat treatment at high temperature is provided. A method of manufacturing a polysilane-modified silicon fine wire includes a step of: irradiating a mixed liquid including a silicon fine wire and a polysilane with light to bond the polysilane to a surface of the silicon fine wire. | 10-22-2009 |
20090305061 | ELECTRODE AND METHOD FOR FORMING THE SAME AND SEMICONDUCTOR DEVICE - An electrode includes a substrate, a contact layer, and a metal layer. The substrate has activated Si on the surface thereof. The contact layer includes a thin film (organic molecular film) made of an organic molecule having a first end with one of a CH group, a CH | 12-10-2009 |
20100173553 | PRINTING METHOD AND DISPLAY APPARATUS MANUFACTURING METHOD - A printing method including the steps of, forming a transfer layer on a blanket, forming a groove portion on the transfer layer by pressing a protrusion portion of a mold member including the protrusion portion having a predetermined pattern against the transfer layer, the groove portion having the pattern corresponding to the protrusion portion, forming a print pattern layer on the blanket by causing the transfer layer on the blanket and a relief printing plate including a convex portion having a pattern corresponding to a reverse pattern of the protrusion portion to face each other and pressure-contacting them so that a portion on the transfer layer corresponding to the convex portion is selectively eliminated, and transferring the print pattern layer onto a substrate to be printed by causing the print pattern layer on the blanket and the substrate to be printed to face each other and pressure-contacting them. | 07-08-2010 |
20100197102 | FILM DEPOSITION METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A film deposition method includes the steps of: coating a solution containing a polysilane compound on a substrate to form a coating film and then carrying out a first thermal treatment in an inert atmosphere, thereby forming the coating film into a silicon film; forming a coating film containing a polysilane compound on the silicon film and then carrying out a second thermal treatment in an inert atmosphere or a reducing atmosphere, thereby forming the coating film into a silicon oxide precursor film; and carrying out a third thermal treatment in an oxidizing atmosphere, thereby forming the silicon oxide precursor film into a silicon oxide film and simultaneously densifying the silicon film. | 08-05-2010 |
20100220270 | METHOD FOR FORMING REFLECTION ELECTRODE, DRIVE SUBSTRATE, AND DISPLAY DEVICE - A method for forming a reflection electrode is provided which includes the steps of: forming a first catalytic layer in a first region of an electrode forming region of a substrate; forming a first plating layer on the first catalytic layer by performing a first electroless plating treatment; forming a second catalytic layer at least in a region (second region) of the electrode forming region other than the first region; and forming a second plating layer on the second catalytic layer by performing a second electroless plating treatment, so that the reflection electrode is formed to have a concave-convex surface. | 09-02-2010 |
20120000382 | METHOD FOR PRODUCING METAL THIN FILM - A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate. | 01-05-2012 |
20120103222 | METHOD FOR PRODUCING METAL THIN FILM - A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate. | 05-03-2012 |
20120244279 | POLARIZER, METHOD OF MANUFACTURING POLARIZER AND LIQUID CRYSTAL PROJECTOR - A polarizer capable of being manufactured in simple steps, and a method of manufacturing the polarizer, as well as a liquid crystal projector are provided. The polarizer includes a substrate having light permeability, and a plurality of linear projections being arranged on the substrate and extending along one direction within a plane thereof. Each of the linear projections having a base layer and a plating layer in the named order from the substrate, the base layer containing a catalyst material for electroless plating process, and the plating layer being deposited by using the base layer as a catalyst. | 09-27-2012 |