Patent application number | Description | Published |
20130028008 | INTEGRATED CIRCUITS, SYSTEMS, AND METHODS FOR REDUCING LEAKAGE CURRENTS IN A RETENTION MODE - A memory array including at least one cross-latched pair of transistors for storing data. The memory array further includes a first power line for supplying a first reference voltage and a second power line for supplying a second reference voltage. The memory array further includes a first switch having a first output coupled with the at least one cross-latched pair of transistors for selectively connecting the at least one cross-latched pair of transistors to the first power line. The memory array further includes a second switch having a second output coupled with the at least one cross-latched pair of transistors for selectively connecting the at least one cross-latched pair of transistors to the second power line. The first output is coupled to the second output. | 01-31-2013 |
20130028040 | DUAL RAIL MEMORY - A memory array comprises a plurality of memory cells arranged in a plurality of rows and a plurality of columns. A column of the plurality of columns includes a first voltage circuit coupled to internal first nodes of memory cells in the one of the plurality of columns and a second voltage circuit coupled to internal second nodes of the memory cells in the one of the plurality of columns. The first voltage circuit is configured to provide one of a first supply voltage and a second supply voltage lower than the first supply voltage to the internal first nodes. The second voltage circuit is configured to provide one of a first reference voltage and a second reference voltage higher than the first reference voltage to the internal second nodes. | 01-31-2013 |
20130034944 | METHOD FOR MAKING A DISILICIDE - Methods for fabricating a semiconductor device are disclosed. A metal-rich silicide and/or a mono-silicide is formed on source/drain (S/D) regions. A millisecond anneal is provided to the metal-rich silicide and/or the mono-silicide to form a di-silicide with limited spikes at the interface between the silicide and substrate. The di-silicide has an additive which can lower the electron Schottky barrier height. | 02-07-2013 |
20130044556 | SENSE AMPLIFIER SCHEME FOR LOW VOLTAGE SRAM AND REGISTER FILES - In at least one embodiment, a sense amplifier circuit includes a pair of bit lines, a sense amplifier output, a keeper circuit, and a noise threshold control circuit. The keeper circuit is coupled to the pair of bit lines and includes an NMOS transistor coupled between a power node and a corresponding one of the pair of bit lines. The keeper circuit is sized to supply sufficient current to compensate a leakage current of the corresponding bit line and configured to maintain a voltage level of the corresponding bit line. The noise threshold control circuit is connected to the sense amplifier output and the pair of bit lines. The noise threshold control circuit comprises a half-Schmitt trigger circuit or a Schmitt trigger circuit. | 02-21-2013 |
20130049194 | SELF-ALIGNED PROTECTION LAYER FOR COPPER POST STRUCTURE - A semiconductor device including a semiconductor substrate and a conductive post overlying and electrically connected to the substrate. The semiconductor device further includes a manganese-containing protection layer on a surface of the conductive post. A method of forming a semiconductor device. The method includes forming a bond pad region on a semiconductor substrate. The method further includes forming a conductive post overlying and electrically connected to the bond pad region. The method further includes forming a protection layer on a surface of the conductive post, wherein the protection layer comprises manganese (Mn). | 02-28-2013 |
20130051130 | WEAK BIT COMPENSATION FOR STATIC RANDOM ACCESS MEMORY - A static random access memory (SRAM) is provided. The SRAM includes a data line, a data line bar, and a current path block. The current path block includes at least two transistors configured to provide a current path for the data line in transition from a first logic voltage to a second logic voltage, wherein the current path block is connected to the data line and the data line bar during an entire duration of operation of the SRAM. | 02-28-2013 |
20130070550 | ADAPTIVE WRITE BIT LINE AND WORD LINE ADJUSTING MECHANISM FOR MEMORY - A memory including a capacitor coupled to a write bit line or a word line and an initializer configured to initialize a voltage level at a first node between the capacitor and the write bit line or the word line. The memory further includes a controllable initial level adjuster configured to adjust a voltage level of a second node at one terminal of the capacitor in response to a pulse. The capacitor is configured to receive a boost signal at a third node at a terminal opposite the first node. The boost signal configured to change a voltage level of the write bit line or the word line in response to the boost signal. | 03-21-2013 |
20130093028 | INTEGRATED CIRCUITS HAVING DUMMY GATE ELECTRODES AND METHODS OF FORMING THE SAME - An integrated circuit includes at least one first gate electrode of at least one active transistor. The integrated circuit further includes at least one first dummy gate electrode and at least one second dummy gate electrode. The integrated circuit further includes at least one guard ring disposed around the at least one first gate electrode, the at least one first dummy gate electrode, and the at least one second dummy gate electrode. An ion implantation layer of the at least one guard ring substantially touches at least one of the at least one first dummy gate electrode or the at least one second dummy gate electrode. | 04-18-2013 |
20130097571 | METHOD FOR DUMMY METAL AND DUMMY VIA INSERTION - A method of inserting dummy metal and dummy via in an integrated circuit design. The method includes inserting, by a computer, dummy metals using a place and route tool, wherein the place and route tool has timing-awareness to improve a timing performance of the integrated circuit design. The method further includes inserting, by the computer, dummy vias using a design-rule-checking utility separately from the inserting of the dummy metals, wherein at least one of the dummy vias has a different size than at least another of the dummy vias. | 04-18-2013 |