Patent application number | Description | Published |
20100034349 | METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING THE RESIDUAL GAS ATMOSPHERE AND THE CONTAMINATION AND EUV LITHOGRAPHY DEVICE - Components ( | 02-11-2010 |
20100045948 | EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINATION STATUS OF AN EUV-REFLECTIVE OPTICAL SURFACE - The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (λm). The invention further relates to a method for determining the contamination status of at least one EUV-reflective optical surface arranged in an EUV lithography apparatus for at least one contaminating substance comprising determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (λm) using a cavity ringdown reflectometer. | 02-25-2010 |
20110043774 | CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING THEREOF - In order to clean optical components ( | 02-24-2011 |
20110211179 | DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS - An EUV (extreme ultraviolet) lithography apparatus ( | 09-01-2011 |
20110279799 | EUV Lithography Device and Method For Processing An Optical Element - An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device ( | 11-17-2011 |
20120086925 | METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM - A method for preventing contaminating gaseous substances ( | 04-12-2012 |
20120224153 | OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY - An optical arrangement, in particular in a projection exposure apparatus for EUV lithography. In an aspect an optical arrangement has a housing ( | 09-06-2012 |
20120281196 | PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection lens of a projection exposure apparatus, for imaging a mask which can be positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane, includes a housing, in which at least one optical element is arranged, at least one partial housing which is arranged within said housing and which at least regionally surrounds light passing from the object plane as far as the image plane during the operation of the projection lens, and a reflective structure, which reduces a light proportion which reaches the image plane after reflection at the at least one partial housing, by comparison with an analogous arrangement without said reflective structure. | 11-08-2012 |
20130077064 | ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT - An arrangement for use in a projection exposure tool ( | 03-28-2013 |
20140176921 | OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION - An optical assembly including: a beam generating system generating radiation ( | 06-26-2014 |