Stefan Wiesner, Lauchheim DE
Stefan Wiesner, Lauchheim DE
Patent application number | Description | Published |
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20090244508 | METHOD AND DEVICE FOR CONNECTING AN OPTICAL ELEMENT TO A FRAME - A method and a device for the material-fit connection of an optical element to a frame are disclosed. | 10-01-2009 |
20100007866 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 01-14-2010 |
20100071720 | METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE - Inside a vacuum chamber | 03-25-2010 |
20100261120 | MIRROR FOR GUIDING A RADIATION BUNDLE - A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved. | 10-14-2010 |
20110043774 | CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING THEREOF - In order to clean optical components ( | 02-24-2011 |
20110058147 | CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE - A cleaning module for an EUV lithography device with a supply ( | 03-10-2011 |
20110279799 | EUV Lithography Device and Method For Processing An Optical Element - An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device ( | 11-17-2011 |
20120086925 | METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM - A method for preventing contaminating gaseous substances ( | 04-12-2012 |
20130100426 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 04-25-2013 |