Patent application number | Description | Published |
20080265320 | COMPONENT ARRANGEMENT INCLUDING A POWER SEMICONDUCTOR COMPONENT HAVING A DRIFT CONTROL ZONE - A component arrangement including a MOS transistor having a field electrode is disclosed. One embodiment includes a gate electrode, a drift zone and a field electrode, arranged adjacent to the drift zone and dielectrically insulated from the drift zone by a dielectric layer a charging circuit, having a rectifier element connected between the gate electrode and the field electrode. | 10-30-2008 |
20090130806 | POWER SEMICONDUCTOR COMPONENT WITH CHARGE COMPENSATION STRUCTURE AND METHOD FOR THE FABRICATION THEREOF - A semiconductor component with charge compensation structure has a semiconductor body having a drift path between two electrodes. The drift path has drift zones of a first conduction type, which provide a current path between the electrodes in the drift path, while charge compensation zones of a complementary conduction type constrict the current path of the drift path. For this purpose, the drift path has two alternately arranged, epitaxially grown diffusion zone types, the first drift zone type having monocrystalline semiconductor material on a monocrystalline substrate, and a second drift zone type having monocrystalline semiconductor material in a trench structure, with complementarily doped walls, the complementarily doped walls forming the charge compensation zones. | 05-21-2009 |
20090218621 | SEMICONDUCTOR COMPONENT WITH A DRIFT REGION AND A DRIFT CONTROL REGION - A semiconductor component with a drift region and a drift control region. One embodiment includes a semiconductor body having a drift region of a first conduction type in the semiconductor body. A drift control region composed of a semiconductor material, which is arranged, at least in sections, is adjacent to the drift region in the semiconductor body. An accumulation dielectric is arranged between the drift region and the drift control region. | 09-03-2009 |
20090321804 | SEMICONDUCTOR COMPONENT INCLUDING A DRIFT ZONE AND A DRIFT CONTROL ZONE - A semiconductor component including a drift zone and a drift control zone. One embodiment provides a transistor component having a drift zone, a body zone, a source zone and a drain zone. The drift zone is arranged between the body zone and the drain zone. The body zone is arranged between the source zone and the drift zone. | 12-31-2009 |
20090325361 | METHOD FOR PRODUCING A SEMICONDUCTOR INCLUDING A MATERIAL LAYER - A method for producing a semiconductor including a material layer. In one embodiment a trench is produced having two opposite sidewalls and a bottom, in a semiconductor body. A foreign material layer is produced on a first one of the two sidewalls of the trench. The trench is filled by epitaxially depositing a semiconductor material onto the second one of the two sidewalls and the bottom of the trench. | 12-31-2009 |
20100078710 | Semiconductor component with a drift zone and a drift control zone - A semiconductor component has a drift zone and a drift control zone, a drift control zone dielectric, which is arranged in sections between the drift zone and the drift control zone, and has a first and a second connection zone, which are doped complementarily with respect to one another and which form a pn junction between the drift control zone and a section of the drift zone. | 04-01-2010 |
20100273307 | METHOD OF MAKING A DEVICE INCLUDING A CAPACITIVE STRUCTURE - A method for making a device including a capacitive structure is disclosed. One embodiment provides a carrier layer having a surface. A first dielectric layer is formed on the surface. A silicon layer including silicon grains is formed on the first dielectric layer using a deposition process. A second dielectric layer is formed on the second silicon layer. A layer of an electrically conductive material is formed on the dielectric layer. A temperature process for heating at least the first dielectric layer is performed. The temperature and duration of the temperature process is selected such that the first dielectric layer is modified so that the silicon layer is electrically connected to the carrier layer. | 10-28-2010 |
20120132956 | SEMICONDUCTOR COMPONENT WITH HIGH BREAKTHROUGH TENSION AND LOW FORWARD RESISTANCE - A semiconductor component having a semiconductor body is disclosed. In one embodiment, the semiconductor component includes a drift zone of a first conductivity type, a drift control zone composed of a semiconductor material which is arranged adjacent to the drift zone at least in places, a dielectric which is arranged between the drift zone and the drift control zone at least in places. A quotient of the net dopant charge of the drift control zone, in an area adjacent to the accumulation dielectric and the drift zone, divided by the area of the dielectric arranged between the drift control zone and the drift zone is less than the breakdown charge of the semiconductor material in the drift control zone. | 05-31-2012 |
20140001528 | SEMICONDUCTOR COMPONENT WITH A DRIFT REGION AND A DRIFT CONTROL REGION | 01-02-2014 |