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Sohda, JP
Hiroshi Sohda, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20080236498 | VACUUM FILM DEPOSITION APPARATUS - There is provided a vacuum film deposition apparatus which forms a film on a substrate by a vacuum film deposition technique, include: substrate holding means for holding the substrate; a deposition preventing member for preventing film deposition at undesired positions within the apparatus; and contacting means for bringing the substrate or the substrate holding means and the deposition preventing member into contact with each other. | 10-02-2008 |
| 20090000548 | SUBSTRATE HOLDER AND VACUUM FILM DEPOSITION APPARATUS - A substrate holder includes a holding unit which holds a substrate, a temperature measurement unit which is provided at a surface on a substrate side of the holding unit and is brought into contact with the substrate to measure a temperature of the substrate and a signal output unit which outputs temperature measurement signals from the temperature measurement unit. A vacuum film deposition apparatus has at least one vacuum film deposition unit including the substrate holder a vacuum chamber, a holder support portion provided within the vacuum chamber, connected to a connection portion of the substrate holder and supporting the substrate holder, a film deposition device forming a film by vacuum film deposition on the substrate held in the substrate holder and a signal receiving unit connected to the signal output unit and receiving the temperature measurement signals. | 01-01-2009 |
| 20090000552 | SUBSTRATE HOLDER AND VACUUM FILM DEPOSITION APPARATUS - A vacuum film deposition apparatus in which a film is formed on a substrate by a vacuum film deposition process includes a holder which has a substrate supporting surface which is in a curved shape and is brought into contact with the substrate. A substrate holder for holding the substrate includes a base having the substrate supporting surface. The apparatus and the substrate holder further include a contact detection mechanism which detects a state of contact between the substrate and the substrate supporting surface, a load applying mechanism which is provided outside the substrate supporting surface and supports the substrate by applying a load to end faces of the substrate and a control unit which controls the load the load applying mechanism applies to the substrate based on output from the contact detection mechanism. | 01-01-2009 |
Hiroshi Sohda, Odawara-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080236496 | VACUUM EVAPORATION APPARATUS - The vacuum evaporation apparatus includes a vacuum chamber, a substrate holder which is disposed in the vacuum chamber and holds a substrate, and an evaporation source which is disposed in the vacuum chamber and evaporates a film-forming material. The substrate holder has a substrate holding portion which is made of a first material having a heat conductivity of at least 100 W/m·K and a specific gravity of up to 4.0×10 | 10-02-2008 |
Masaki Sohda, Funabashi-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120217707 | OIL SEAL - An oil seal ( | 08-30-2012 |
Masaki Sohda, Chiba-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20090085301 | OIL SEAL - An oil seal ( | 04-02-2009 |
Takashi Sohda, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20110034518 | Pharmaceutical composition - Pharmaceutical composition which comprises an insulin sensitivity enhancer in combination with other antidiabetics differing from the enhancer in the mechanism of action, which shows a potent depressive effect on diabetic hyperglycemia and is useful for prophylaxis and treatment of diabetes. | 02-10-2011 |
Takeshi Sohda, Kanagawa-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20110289347 | RECOVERY FROM MEDIUM ERROR ON TAPE ON WHICH DATA AND METADATA ARE TO BE STORED BY USING MEDIUM TO MEDIUM DATA COPY - A copy export application implemented in a computational device receives a request to perform a copy export operation of data and metadata to a selected tape in a tape library coupled to the computational device. The copy export application copies the data from the computational device to the selected tape. The copy export application determines a medium error on the selected tape while copying the metadata from the computational device to the selected tape, subsequent to completion of the copying of the data from the computational device to the selected tape. The copy export application sends a request to a tape control application to replace the selected tape by a new tape and copy the data from the selected tape to the new tape. The copy export application copies the metadata to the new tape. | 11-24-2011 |
| 20120239967 | RECOVERY FROM MEDIUM ERROR ON TAPE ON WHICH DATA AND METADATA ARE TO BE STORED BY USING MEDIUM TO MEDIUM DATA COPY - A copy export application implemented in a computational device receives a request to perform a copy export operation of data and metadata to a selected tape in a tape library coupled to the computational device. The copy export application copies the data from the computational device to the selected tape. The copy export application determines a medium error on the selected tape while copying the metadata from the computational device to the selected tape, subsequent to completion of the copying of the data from the computational device to the selected tape. The copy export application sends a request to a tape control application to replace the selected tape by a new tape and copy the data from the selected tape to the new tape. The copy export application copies the metadata to the new tape. | 09-20-2012 |
Takeshi Sohda, Sagamihara JP
| Patent application number | Description | Published |
|---|---|---|
| 20120151133 | SAVING LOG DATA USING A DISK SYSTEM AS PRIMARY CACHE AND A TAPE LIBRARY AS SECONDARY CACHE - Various embodiments are provided for saving a plurality of log data in a hierarchical storage management system using a disk system as a primary cache with a tape library as a secondary cache. The user data is stored in the primary cache and written into the secondary cache at a subsequent period of time. The plurality of blank tapes in the secondary cache is prepared for storing the user data and the plurality of log data based on priorities. At least one of the plurality of blank tapes is selected for copying the plurality of log data and the user data from the primary cache to the secondary cache based on priorities. The plurality of log data is stored in the primary cache. The selection of at least one of the plurality of blank tapes completely filled with the plurality of log data is delayed for writing additional amounts of the user data. | 06-14-2012 |
Yasunari Sohda, Kawasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20080203285 | Charged particle beam measurement equipment, size correction and standard sample for correction - Correction of widths obtained by measurement of a sample with the use of a scanning electron microscope is executed with greater precision. Use is made of a standard sample | 08-28-2008 |
| 20080210867 | Scanning Electron Microscope and Calibration of Image Distortion - In method and apparatus for obtaining a scanning electron microscope image devoid of distortion by measuring a scanning distortion and calibrating the scanning distortion, there occurs a problem that an error takes place in dimension control owing to a scanning distortion of an electron beam. To cope with this problem, an image is obtained by scanning a predetermined region with the electron beam, a plurality of regions are selected from the image, the pattern pitch is measured in each of the regions and a scanning distortion amount is calculated from the result of measurement and then corrected. | 09-04-2008 |
| 20080251868 | Standard component for calibration and electron-beam system using the same - The invention provides a standard component for calibration that enables a calibration position to be easily specified in order to calibrate accurately a scale factor in the electron-beam system, and provides an electron-beam system using it. High-accuracy metrology calibration capable of specifying a calibration position can be realized by forming a mark pattern or labeled material for identifying the calibration position in proximity of a superlattice pattern of the standard component for system calibration. The standard component for calibration is one that calibrates a scale factor of an electron-beam system based on a signal of secondary charged particles detected by irradiation of a primary electron beam emitted from the electron-beam system on a substrate having a cross section of a superlattice of a multi-layer structure in which different materials are deposited alternately. The substrate have linear patterns that are on the substrate surface parallel to the multi-layer and are arranged at a fixed interval in a direction crossing the cross section of the superlattice pattern, and is so configured that the cross sections of the linear patterns may exist on substantially the same plane of the superlattice cross section, so that the linear patterns enable a position of the superlattice pattern to be identified. | 10-16-2008 |
| 20090136116 | Method and apparatus for inspecting reticle - The present invention provides a reticle inspection technology that enables a relative position between patterns to be evaluated for a pattern that may become a defect at the time of exposure to a sample, such as a wafer, in the double patterning technology on the same layer. An apparatus for inspecting a reticle for inspecting two reticles that are used in order to form patterns in the same layer on a substrate using the double patterning technology has: a coordinate information input unit for inputting coordinate information of a pattern of a measuring object; an image input unit for acquiring images of patterns of the two reticles based on the obtained coordinate information; an image overlay unit for overlaying the images of the two reticles at the same coordinates; a relative position calculation unit for finding the relative position between the patterns on the two reticles; an evaluation unit for assigning an index of the overlaying accuracy based on the relative position and evaluates whether the two reticles need repair; and an evaluation result output unit for outputting an evaluation result. | 05-28-2009 |
| 20090146057 | ELECTRON BEAM MEASUREMENT APPARATUS - The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns. | 06-11-2009 |
| 20090206252 | Defect inspection method and its system - A method for enabling management of fatal defects of semiconductor integrated patterns easily, the method enables storing of design data of each pattern designed by a semiconductor integrated circuit designer, as well as storing of design intent data having pattern importance levels ranked according to their design intents respectively. The method also enables anticipating of defects to be generated systematically due to the characteristics of the subject exposure system, etc. while each designed circuit pattern is exposed and delineated onto a wafer in a simulation carried out beforehand and storing those defects as hot spot information. Furthermore, the method also enables combining of the design intent data with hot spot information to limit inspection spots that might include systematic defects at high possibility with respect to the characteristics of the object semiconductor integrated circuit and shorten the defect inspection time significantly. | 08-20-2009 |
| 20110095183 | ELECTRON BEAM MEASUREMENT APPARATUS - The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns. | 04-28-2011 |
| 20110133065 | Standard Member for Correction, Scanning Electron Microscope Using Same, and Scanning Electron Microscope Correction Method - Disclosed is a standard specimen, used with an electron microscope to correct the magnification with high precision. A standard member used for correction corrects a scanning electron microscope that measures a pattern within an observation region based on information about the secondary electrons generated by scanning incident electron lines on the observation region on a measurement specimen, or information about the reflected electron intensity. The standard member has a first pattern region that corrects the magnification and that comprises a concavo-convex pattern (line/space pattern) in the cross section of a multilayer film that has been laminated, and a second pattern region near the first pattern at almost the same height that does not contain a pattern with the same periodicity as the pattern pitch size of the first region and that is used for beam adjustment. | 06-09-2011 |
| 20110147586 | Charged Particle Beam Device - The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction. | 06-23-2011 |
| 20110249110 | SCANNING ELECTRON MICROSCOPE - Provided is a scanning electron microscope including: an image recording unit ( | 10-13-2011 |
| 20110274341 | CHARGED BEAM DEVICE - In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun ( | 11-10-2011 |
| 20120217393 | Electron Microscope - A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample. | 08-30-2012 |
Yukihiko Sohda, Yamato JP
| Patent application number | Description | Published |
|---|---|---|
| 20120209411 | Abnormality Detection for Isolating a Control System - A mechanism is provided for effectively detecting an abnormality occurring in a control system and isolating the control system in which abnormality is acknowledged. The mechanism receives, from one or more control systems in the plurality of control systems, respective abnormality notifications for respective counter control systems to be monitored by the plurality of control systems. The mechanism adds up abnormality notifications transmitted from respective monitoring sections of the plurality of control systems so as to evaluate the reputation of a control system suspected to have an abnormality. The mechanism causes a protected area for operating the control system suspected to have an abnormality to restrict outbound traffic from at least the inside of the protected area, when an indication is identified that the control system is abnormal according to criteria from a result of the evaluation. | 08-16-2012 |
| 20120210158 | Anomaly Detection to Implement Security Protection of a Control System - An anomaly detection mechanism is provided that detects an anomaly in a control network, and includes an identifying unit to receive event information on an event that occurs, and to identify a group including a resource related to the event information by referring to a configuration management database for retaining dependence relationships between processes and resources including a control system; a policy storing unit to store one or more policies each of which associates one or more actions with a condition defining a situation suspected to have an anomaly; an adding unit to acquire group-related information needed for application to the one or more policies, and to add the acquired information to the event information; and a determining unit to apply the event information to the one or more policies and to determine the one or more actions associated with the matched condition as one or more actions to be taken. | 08-16-2012 |
Yukihiko Sohda, Kanagawa-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20080270772 | Reduced data transfer during processor context switching - Data transfer during processor context switching is reduced, particularly in relation to a time-sharing microtasking programming model. Prior to switching context of a processor having local memory from a first to a second process, a portion of the local memory that does not require transfer to system memory for proper saving of data associated with the first process is determined. The context of the processor is then switched from the first to the second process, including transferring all of the local memory as the data associated with the first process, to system memory—except for the portion of the local memory that has been determined as not requiring saving to the system memory for proper saving of the data associated with the first process. Therefore, switching the context from the first to the second process results in a reduction of data transferred from the local memory to the system memory. | 10-30-2008 |
Yukihiko Sohda, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20120254951 | PROVIDING PROTECTION AGAINST UNAUTHORIZED NETWORK ACCESS - A system includes a detection unit configured to detect unauthorized access to one or more information processing apparatuses that are virtually implemented by virtual machines executed by a computer; an authorized network configured to transfer authorized access to the one or more information processing apparatuses from an external network; a honeypot network configured to transfer unauthorized access to the information processing apparatuses from the external network; and a control unit configured to connect the information processing apparatuses for which no unauthorized access has been detected to the authorized network, and connect the information processing apparatuses for which unauthorized access has been detected to the honeypot network; wherein the control unit shifts, in response to detecting unauthorized access by the detection unit, the corresponding information processing apparatus into a decoy mode in which the detected unauthorized access is disconnected from a normal operation. | 10-04-2012 |