Patent application number | Description | Published |
20130252406 | Techniques for drying and annealing thermoelectric powders - Embodiments of the invention include a method of producing a low contaminant, stoichiometrically controlled semiconductor material, the method comprising providing a colloidal suspension of a plurality of colloidally grown semiconductor nanocrystals, providing an inorganic ligand structure around a surface of the semiconductor nanocrystals of the plurality of semiconductor nanocrystals, drying the colloidal suspension into a powder, and pre-annealing the powder into a semiconductor material. | 09-26-2013 |
20130280843 | Method for a single precursor ionic exchange to prepare semiconductor nanocrystal n-type thermoelectric material - Herein disclosed is a method of forming a thermoelectric material having an optimized stoichiometry, the method comprising: reacting a precursor material including a population of nanocrystals with a first ionic solution and a second ionic solution to form a reacted mixture. | 10-24-2013 |
20130284989 | Method for preparing and use of Sb2Te3 nanocrystals in thermoelectric materials - Disclosed are a thermoelectric material and a method of forming a thermoelectric material having an optimal stoichiometry, the method including obtaining a first precursor material, wherein the first precursor material is an antimony precursor, and obtaining a second precursor material, wherein the second precursor is chosen from the group consisting of a tellurium precursor and a selenium precursor. The method further includes combining the precursor materials, heating the combination of precursor materials, and isolating a plurality of semiconductor nanocrystals from the heated precursor materials. | 10-31-2013 |
Patent application number | Description | Published |
20080246017 | LIGHT-EMITTING DEVICE HAVING SEMICONDUCTOR NANOCRYSTAL COMPLEXES - Light-emitting devices are provided that incorporate one or more underlying LED chips or other light sources and a layer having one or more populations of nanoparticles disposed over the light source. The nanoparticles may absorb some light emitted by the underlying source, and re-emit light at a different level. By varying the type and relative concentration of nanoparticles, different emission spectra may be achieved. White light and specialty-color emission may be achieved. Devices also may include multiple LED chips, with nanoparticles disposed over one or more underlying chips in an array. | 10-09-2008 |
20100135009 | CUSTOM COLOR LED REPLACEMENTS FOR TRADITIONAL LIGHTING FIXTURES - A system useful as a light bulb replacement fixture is presented comprising a light bulb replacement fixture; at least one light emitting diode connected to the light bulb replacement fixture; and at least one quantum dot for absorbing light of a first wavelength emitted by the at least one light emitting diode and emitting light of a second wavelength. | 06-03-2010 |
20100144231 | METHOD OF MATCHING COLOR IN LIGHTING APPLICATIONS - A method of matching a color of a light to the color of an object is presented which results in custom colored light emitting diodes. | 06-10-2010 |
20100177496 | CUSTOM COLOR LED REPLACEMENTS FOR TRADITIONAL LIGHTING FIXTURES - Light emitting diodes (LEDs) comprising semiconductor nanocrystals, or more specifically quantum dots, used as a stable phosphor are presented. The result is a color tunable LED with a lifetime of at least 1,000 hours, or at least 5,000 hours. | 07-15-2010 |
Patent application number | Description | Published |
20100284006 | ENVIRONMENTAL CONTROL OF FLUID SAMPLES, CALIBRATION, AND DETECTION OF CONCENTRATION LEVELS - According to example configurations herein, a system includes an inertial filter, a temperature controller, and analyzer. The inertial filter has multiple ports including a first port, a second port, and a third port. A sample gas flows between the first port and the third port of the inertial filter. The second port of the inertial filter outputs a portion of the gas flowing between the first port and the second port. The temperature controller controls a temperature of the inertial filter and/or the gas flowing through the inertial filter. The analyzer receives the portion of the gas flow outputted by the second port of the inertial filter and produces a value indicative of a concentration of sulfur trioxide in the portion of the gas flow. | 11-11-2010 |
20100284899 | GENERATION OF SULFUR TRIOXIDE AND SULFURIC ACID - Configurations herein include a novel process and apparatus for generating and maintaining sulfur trioxide gas. The generation system and process operate to provide sulfur trioxide calibration gas for calibrating sulfur trioxide detection devices. The system and process provides a known, concentration of sulfur trioxide gas via a heated catalyst, which enables accurate calibration of measurement equipment. The system functions in part by controlling temperature, amount of moisture, residence time, catalyst selection, diluting generated sulfur trioxide and by locating the sulfur trioxide generator at a point of injection of a sulfur trioxide detection system. | 11-11-2010 |
20110271739 | PARTICULATE MATTER MONITOR - A particulate monitoring system includes a conduit in which to a pass a fluid sample from an input port to an output port. The particulate monitoring system receives a fluid sample inputted to the conduit through the input port. The fluid sample can include different sizes of particulate matter. The particulate monitoring system controls a flow of the fluid sample through the conduit to age the particulate matter. Gravitational forces cause a portion of the particulate matter in the fluid sample to fall into a basin as opposed to being exhausted through the output port, which is disposed at a vertically higher level of the conduit than the input port. Thus, the particulate monitoring system outputs a portion of the original particulate matter in the fluid sample (e.g., particulate matter that does not drop into the basin out due to gravity) for analysis. | 11-10-2011 |
20120087856 | GENERATION OF SULFUR TRIOXIDE AND SULFURIC ACID - Configurations herein include a novel process and apparatus for generating and maintaining sulfur trioxide gas. The generation system and process operate to provide sulfur trioxide calibration gas for calibrating sulfur trioxide detection devices. The system and process provides a known, concentration of sulfur trioxide gas via a heated catalyst, which enables accurate calibration of measurement equipment. The system functions in part by controlling temperature, amount of moisture, residence time, catalyst selection, diluting generated sulfur trioxide and by locating the sulfur trioxide generator at a point of injection of a sulfur trioxide detection system. | 04-12-2012 |
Patent application number | Description | Published |
20090126705 | Heated fuel vaporizer for enhanced cold starting of an internal combustion engine - A heated fuel vaporizer is disposed in an intake component, such as a throttle valve or an intake manifold, of a fuel injected and spark-ignited internal combustion engine. The engine may be fueled by any liquid fuel, such as gasoline, diesel or by fuels much less volatile than gasoline, for example, alcohols such as ethanol, or mixtures of ethanol and gasoline. A configurable heating element is made from a single piece of sheet metal and includes one or two grids each formed by slots and segments. By controlling the geometry of the element, the power and surface area can be configured to any desired value. A single piece heater assembly is designed for installation in an intake component, such as throttle valve or intake manifold, of an internal combustion engine. The heater assembly includes a single-grid or dual-grid heating element that is over-molded with a high melting temperature polymer. | 05-21-2009 |
20100059005 | Method and apparatus for adjusting variable valve lift - An apparatus for adjusting individual valve lift comprising a control arm assembly disposed between the cam lobes and the valve rockers for a multi-valve train. The control arm at each valve includes a driven gear. An actuator shaft includes a mating drive gear at each driven gear for rotating each control arm to vary the overall lift of the valves. In the prior art, the mating drive gears are fixed to the actuator shaft at identical fixed orientations. In accordance with the present invention, each mating drive gear is rotatably adjustable on the actuator shaft to permit changing of the orientation of each gear with respect to the actuator shaft, thereby changing the contact point of the control arm with its respective cam lobe. The lifts of the individual valves may be individually adjusted to provide equal air flow through all the valves in a multi-valve train. | 03-11-2010 |
Patent application number | Description | Published |
20140041363 | CATALYTIC REDUCTION OF NOx WITH HIGH ACTIVITY CATALYSTS WITH ACETALDEHYDE REDUCTANT - Methods and systems are provided for selective catalytic reduction of NOx with a low molecular low molecular weight aldehyde, e.g., acetaldehyde, as a reductant using a catalyst system including two catalysts. An exhaust stream containing an amount of NO from a combustion operation is provided. A portion of the exhaust stream is introduced to a first catalyst to convert the NO to NO | 02-13-2014 |
20140041364 | CATALYTIC REDUCTION OF NOx WITH HIGH ACTIVITY CATALYSTS WITH NH3 REDUCTANT - Methods and systems for selective catalytic reduction of NOx with an ammonia reductant and a zeolite catalyst loaded with at least two metals selected from the group of tungsten, cobalt, and vanadium. An exhaust stream including NOx and a reductant stream including ammonia are provided to a catalytic reactor having the metal loaded zeolite catalyst at suitable operating temperatures for NOx reduction of at least 90%. | 02-13-2014 |
20140044633 | CATALYTIC REDUCTION OF NOx WITH HIGH ACTIVITY CATALYSTS WITH PROPYLENE REDUCTANT - Methods and systems are provided for selective catalytic reduction of NOx with a low molecular low molecular weight hydrocarbon, e.g., propylene, as a reductant using a catalyst system including two catalysts. An exhaust stream containing an amount of NOx from a combustion operation is provided. A portion of the exhaust stream and a reductant stream including a low molecular weight hydrocarbon is introduced to a first catalytic reactor, which comprises a first catalyst including alumina loaded with silver. The NOx-reduced exhaust stream from the first catalyst is then directed to a second catalyst including zirconia loaded with at least one metal. | 02-13-2014 |
20140044636 | CATALYTIC REDUCTION OF NOx WITH HIGH ACTIVITY CATALYSTS - Methods and systems for selective catalytic reduction of NOx with an activated-carbon-supported metal catalyst at an operating temperature of between about between about 500° C. and about 750° C. An exhaust stream including NOx is introduced to a catalytic reactor having the activated-carbon-supported metal catalyst for NOx reduction of at least 90%. A second catalyst reactor can be provided downstream to remove or convert nitrous oxide as desired. | 02-13-2014 |
Patent application number | Description | Published |
20090053621 | Source and Mask Optimization by Changing Intensity and Shape of the Illumination Source - An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum mask may be determined by changing the magnitude and phase of the diffraction orders to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. Primitive rectangles having a size set to a minimum feature size of a mask maker are assigned to the located minimum and maximum transmission areas ad centered at a desired location. The edges of the primitive rectangle are varied to match optimal diffraction orders O(m,n). The optimal CPL mask O | 02-26-2009 |
20110051114 | OPTIMIZED POLARIZATION ILLUMINATION - Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator. | 03-03-2011 |
20110075124 | Source and Mask Optimization By Changing Intensity and Shape of the Illumination Source - An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum mask may be determined by changing the magnitude and phase of the diffraction orders to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. Primitive rectangles having a size set to a minimum feature size of a mask maker are assigned to the located minimum and maximum transmission areas ad centered at a desired location. The edges of the primitive rectangle are varied to match optimal diffraction orders O(m,n). The optimal CPL mask O | 03-31-2011 |
20140247975 | SOURCE AND MASK OPTIMIZATION BY CHANGING INTENSITY AND SHAPE OF THE ILLUMINATION SOURCE AND MAGNITUDE AND PHASE OF MASK DIFFRACTION ORDERS - An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum mask may be determined by changing the magnitude and phase of the diffraction orders to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. Primitive rectangles having a size set to a minimum feature size of a mask maker are assigned to the located minimum and maximum transmission areas ad centered at a desired location. The edges of the primitive rectangle are varied to match optimal diffraction orders O(m,n). The optimal CPL mask O | 09-04-2014 |
Patent application number | Description | Published |
20090148783 | METHOD, PROGRAM PRODUCT AND APPARATUS FOR MODEL BASED GEOMETRY DECOMPOSITION FOR USE IN A MULTIPLE EXPOSURE PROCESS - A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defined in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multiexposure process the polygon is assigned. | 06-11-2009 |
20100021055 | METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING A MODEL BASED COLORING PROCESS FOR GEOMETRY DECOMPOSITION FOR USE IN A MULTIPLE EXPOSURE PROCESS - A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes
| 01-28-2010 |
20100086203 | METHOD, PROGRAM PRODUCT, AND APPARATUS FOR PERFORMING A MODEL BASED COLORING PROCESS FOR PATTERN DECOMPOSITION FOR USE IN A MULTIPLE EXPOSURE PROCESS - A method of decomposing a target pattern containing features to be imaged onto a substrate into a plurality of exposure patterns for use in a multi-exposure process. The method includes dividing the target pattern into fragments; associating the fragments with an exposure pattern; associating the fragments with image log slope (ILS) evaluation points; and maximizing ILS values. Maximizing the ILS values further includes calculating ILS values at the ILS evaluation points; determining a minimum ILS value; calculating changes in the ILS values as a result of associating fragments with a different exposure pattern; determining a maximum change of the ILS values; and associating fragments associated with the maximum change with a different exposure pattern. | 04-08-2010 |
20110219342 | Design Rule Optimization in Lithographic Imaging Based on Correlation of Functions Representing Mask and Predefined Optical Conditions - Methods, computer program products and apparatuses for optimizing design rules for producing a mask are disclosed, while keeping the optical conditions (including but not limited to illumination shape, projection optics numerical aperture (NA) etc.) fixed. A cross-correlation function is created by multiplying the diffraction order functions of the mask patterns with the eigenfunctions from singular value decomposition (SVD) of a TCC matrix. The diffraction order functions are calculated for the original design rule set, i.e., using the unperturbed condition. ILS is calculated at an edge of a calculated image of a critical polygon using the cross-correlation results and using translation properties of a Fourier transform. The use of the calculated cross-correlation of the mask and the optical system, and the translation property of the Fourier transform for perturbing the design reduces the computation time needed for determining required changes in the design rules. Once an optimum separation is calculated, it is incorporated into the design rule to optimize the mask layout for improved ILS throughout the mask, including critical and non-critical portions of the mask. | 09-08-2011 |
20120077114 | Method, Program Product and Apparatus for Model Based Geometry Decomposition for Use in a Multiple Exposure Process - A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: segmenting a plurality of the features into a plurality of polygons; determining the image log slope (ILS) value for each of the plurality of polygons; determining the polygon having the minimum ILS value, and defining a mask containing the polygon; convolving the defined mask with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and, assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multi-exposure process the polygon is assigned. | 03-29-2012 |
20140101625 | DESIGN RULE OPTIMIZATION IN LITHOGRAPHIC IMAGING BASED ON CORRELATION OF FUNCTIONS REPRESENTING MASK AND PREDEFINED OPTICAL CONDITIONS - Methods, computer program products and apparatuses for optimizing design rules for producing a mask are disclosed, while keeping the optical conditions (including but not limited to illumination shape, projection optics numerical aperture (NA) etc.) fixed. A cross-correlation function is created by multiplying the diffraction order functions of the mask patterns with the eigenfunctions from singular value decomposition (SVD) of a TCC matrix. The diffraction order functions are calculated for the original design rule set, i.e., using the unperturbed condition. ILS is calculated at an edge of a calculated image of a critical polygon using the cross-correlation results and using translation properties of a Fourier transform. Once an optimum separation is calculated, it is incorporated into the design rule to optimize the mask layout for improved ILS throughout the mask. | 04-10-2014 |
20150177166 | Inspection Method and Apparatus, Lithographic System and Device Manufacturing Method - An inspection method determines values of profile parameters of substrate patterns. A baseline substrate with a baseline pattern target (BP) is produced that has a profile described by profile parameters, for example CD (median critical dimension), SWA (side wall angle) and RH (resist height). Scatterometry is used to obtain first and second signals from first and second targets. Values of differential pattern profile parameters are calculated using a Bayesian differential cost function based on a difference between the baseline pupil and the perturbed pupil and dependence of the pupil on pattern profile parameters. For example, the difference is measured between a baseline process and a perturbed process for stability control of a lithographic process. Fed-forward differential stack parameters are also calculated from observations of stack targets on the same substrates as the pattern targets. | 06-25-2015 |