Patent application number | Description | Published |
20090161083 | Lithographic apparatus and device manufacturing method - The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed. | 06-25-2009 |
20090161089 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. | 06-25-2009 |
20090168037 | Lithographic apparatus and device manufacturing method - An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface. | 07-02-2009 |
20090168042 | Lithographic apparatus and device manufacturing method - An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described. | 07-02-2009 |
20090207397 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 08-20-2009 |
20090213343 | RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY - A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal. | 08-27-2009 |
20090303455 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 12-10-2009 |
20100014060 | LITHOGRAPHIC APPARATUS, A METROLOGY APPARATUS AND A METHOD OF USING THE APPARATUS - A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system. | 01-21-2010 |
20100085545 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge. | 04-08-2010 |
20100141915 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. | 06-10-2010 |
20100149514 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 06-17-2010 |
20100157277 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted. | 06-24-2010 |
20100214544 | FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of openings for selectively allowing or preventing the flow of fluid through selected openings of the plurality of openings. | 08-26-2010 |
20100297561 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale. | 11-25-2010 |
20100302518 | LITHOGRAPHIC APPARATUS - The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets. | 12-02-2010 |
20110025995 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND A CONTROL SYSTEM - A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage. | 02-03-2011 |
20110069298 | SUPPORT OR TABLE FOR LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING SUCH SUPPORT OR TABLE AND LITHOGRAPHIC APPARATUS COMPRISING SUCH SUPPORT OR TABLE - A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm | 03-24-2011 |
20110085180 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object. | 04-14-2011 |
20110090474 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. | 04-21-2011 |
20110183257 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. | 07-28-2011 |
20110235008 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate. | 09-29-2011 |
20110242512 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. | 10-06-2011 |
20110273675 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 11-10-2011 |
20110273677 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 11-10-2011 |
20110273678 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. | 11-10-2011 |
20110310367 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 12-22-2011 |
20110317137 | LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS COOLING METHOD - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a cooling system to cool a part of the lithographic apparatus with increased cooling capabilities to reduce the heat transfer from the part to other parts of the apparatus. | 12-29-2011 |
20120086928 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. | 04-12-2012 |
20120267550 | THERMAL CONDITIONING SYSTEM FOR THERMAL CONDITIONING A PART OF A LITHOGRAPHIC APPARATUS AND A THERMAL CONDITIONING METHOD - A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal. | 10-25-2012 |
20130038854 | SUBSTRATE TABLE ASSEMBLY, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K. | 02-14-2013 |
20130077078 | Lithographic Apparatus and Substrate Handling Method - A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper. | 03-28-2013 |
20140014138 | GAS-LIQUID PHASE TRANSITION METHOD AND APPARATUS FOR CLEANING OF SURFACES IN SEMICONDUCTOR MANUFACTURING - A method and apparatus for cleaning an article in semiconductor manufacturing are provided. The method includes subjecting a first chamber containing the article to a vapor source while controlling a temperature of the article and a temperature of the vapor source such that vapor from the vapor source condenses on a surface of the article to form a liquid film. The method further includes evaporating the liquid film, whereby the evaporating liquid transports contaminants from the surface of the article. Evaporating includes exposing the first chamber to condensing surfaces having a temperature lower than a temperature of the article, whereby the evaporated liquid condenses on the condensing surfaces. The apparatus includes a first chamber for housing the article, a vapor source connected to the first chamber, a temperature controller, and a second chamber connected with the first chamber to collect the vapor evaporated from the article. | 01-16-2014 |
20140098357 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 04-10-2014 |
20140233004 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 08-21-2014 |
20140300883 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 10-09-2014 |
20140340659 | Lithographic Apparatus and Device Manufacturing Method - A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system. | 11-20-2014 |
20140368800 | Lithographic Apparatus With A Metrology System For Measuring A Position Of A Substrate Table - A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid. | 12-18-2014 |
20140368804 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack. | 12-18-2014 |
20150029485 | SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - An object holder ( | 01-29-2015 |