Sidelnikov
Vasily Vasiljevitch Sidelnikov, Moscow RU
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20080292853 | Composite Laminated Material and Article Made Thereof - The invention relates to laminated hybrid alumopolymer materials comprising alternating sheets of aluminium alloys and layers of reinforced polymer composite material, such laminated materials are intended for use as structural sheet material for loaded parts of airframe (skins, partitions, stringers of fuselage and wings, floor panels, etc.) and for the repair thereof, and also for surface transport parts. There is suggested the composite laminated material comprising the alternating Al sheets and layers of glass fibre-reinforced plastic including the thermosetting binder and reinforcing filler, said composite material is characterized in that the aluminium sheets comprise at least two layers, one of which is made of high-modular Al—Li alloy of reduced density with Li content of more than 1.5%, and the other one is made of the alloy of Al—Mg—Si system, with layers' thicknesses ratio being (70-12):1. In the composite material the layer of Al—Mg—Si alloy appears to be outer with respect to the composite material and has the ultimate strength not less than 260 MPa, yield strength not less than 220 MPa, elongation not less than 10% and stationary electrochemical potential not less than 20 mV more negative than that of Al—Li alloy. The article fabricated from said composite material is also suggested. | 11-27-2008 |
Vladimir N. Sidelnikov, Novosibirsk RU
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20110210057 | MULTICAPILLARY COLUMN FOR CHROMATOGRAPHY AND SAMPLE PREPARATION - A multicapillary column especially useful for liquid chromatography and sample preparation comprising a plurality of uniform capillaries coated with an insoluble stationary phase, wherein the thickness of the stationary phase is correlated with the radius of the individual capillaries for high efficiency. | 09-01-2011 |
Yurii Victorovitch Sidelnikov, Moscow Region RU
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20110020752 | EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about 1 Pa and about 10 Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium. | 01-27-2011 |
Yurii Victorovitch Sidelnikov, Troitsk RU
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20090173360 | Lithographic Apparatus, and Device Manufacturing Method - A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface. | 07-09-2009 |
20100002211 | LITHOGRAPHIC APPARATUS - A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy. | 01-07-2010 |
20110013167 | APPARATUS WITH PLASMA RADIATION SOURCE AND METHOD OF FORMING A BEAM OF RADIATION AND LITHOGRAPHIC APPARATUS - An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap. | 01-20-2011 |
20130070218 | SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE - A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes. | 03-21-2013 |