Shuso
Shuso Fujii, Kawasaki-Shi JP
Patent application number | Description | Published |
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20080258256 | SEMICONDUCTOR ELECTRICALLY PROGRAMMABLE FUSE ELEMENT WITH AMORPHOUS SILICON LAYER AFTER PROGRAMMING AND METHOD OF PROGRAMMING THE SAME - A fuse link is formed between first and second terminals. The first and second terminals and fuse link have a polysilicon layer and a layer formed on the polysilicon layer and containing a metal element. At least a portion of the fuse link is an amorphous silicon layer. | 10-23-2008 |
20110032778 | SEMICONDUCTOR MEMORY DEVICE - A sense amplifier circuit senses and amplifies a signal read from memory cells arranged at intersections of word-lines and bit-lines. A write circuit reads first data held in a first memory cell of the memory cells, and writes second data corresponding to the first data in a second memory cell different from the first memory cell. A data latch circuit holds data read from the first memory cell. A logic operation circuit performs a logic operation using data read from the second memory cell and data held in the data latch circuit as input values and outputs third data as an operation value. A write-back circuit writes the third data back to the first memory cell. | 02-10-2011 |
Shuso Iyoshi, Hyogo JP
Patent application number | Description | Published |
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20110008577 | PROCESS FOR PRODUCTION OF FINE STRUCTURE - Disclosed is a process for the production of a fine structure through nanoimprinting a photocurable resin composition. The process includes the steps of (1) forming a photocurable resin composition for nanoimprint into a film on a support and transferring a pattern to the film by pressing the film with a nanostamper at a pressure of 5 to 100 MPa, in which the photocurable resin composition contains a curable compound component including at least one cationically polymerizable compound and/or at least one free-radically polymerizable compound; and (2) curing the patterned film to obtain the fine structure. | 01-13-2011 |
20120021180 | CURABLE COMPOSITION FOR NANOIMPRINTING AND CURED PRODUCT - Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds. | 01-26-2012 |
Shuso Iyoshi, Himeji-Shi JP
Patent application number | Description | Published |
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20120141738 | CURABLE RESIN COMPOSITION FOR NANOIMPRINT - Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms. | 06-07-2012 |