Shundo
Ken Shundo, Keller, TX US
Patent application number | Description | Published |
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20140271182 | SOFT IN-PLANE AND STIFF OUT-OF-PLANE ROTOR SYSTEM - A rotor assembly includes a yoke operably associated with a rotor blade. The yoke includes a first device and a second device that attach the rotor blade to the yoke. The first device is configured to allow transverse movement of the rotor blade about a chord axis and rotational movement about a pitch-change axis. The second device is configured to allow rotational movement of the rotor blade solely about the pitch-change axis. The method includes rotating rotor assembly about a first plane of rotation, while retaining a relatively stiff out-of-plane rotation and a relatively soft in-plane rotation during flight. | 09-18-2014 |
20140271204 | Tiltrotor Control System With Two Rise/Fall Actuators - A rotor system for rotor aircraft comprises a rotor hub comprising a plurality of rotor blades, a rotatable rotor mast coupled to the rotor hub, a swashplate assembly comprising a non-rotating ring engaged with a rotatable ring, a plurality of pitch links mechanically coupling the rotatable ring to the plurality of rotor blades, and a swashplate actuator system. The rotatable ring is configured to rotate with the rotor mast, and the non-rotating ring is configured to engage and guide the rotatable ring. The pitch links are configured to control the pitch angle of each rotor blade. The swashplate actuator system consists of: a first actuator and a second actuator, where the first actuator and the second actuator are mechanically coupled to a stationary surface and the non-rotating ring. | 09-18-2014 |
Ryushi Shundo US
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20100304148 | Polymerizable liquid crystal compound, polymerizable liquid crystal composition, and polymer thereof - A compound represented by the formula (1) is provided. A polymerizable liquid crystal composition containing the compound can be controlled in birefringence and is excellent in stability of a liquid crystal phase. An anisotropic polymer excellent in uniformity of alignment is obtained by coating and polymerizing the composition on a supporting substrate. In the formula (1), at least one of R | 12-02-2010 |
Ryushi Shundo, Chiba JP
Patent application number | Description | Published |
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20100193736 | POLYMERIZABLE LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION AND POLYMER - The compound of the present invention is represented by the formula (1). In the formula (1), R | 08-05-2010 |
20100264367 | Polymerizable liquid crystal compound, liquid crystal composition, and polymer - The compound of the present invention is represented by the formula (1). In the formula (1), R | 10-21-2010 |
20140183409 | LIQUID CRYSTAL COMPOSITION, ANTIOXIDANT AND LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal composition including an antioxidant, and a liquid crystal display device containing this composition are described. The liquid crystal composition has a nematic phase, has a high solubility in a liquid crystal composition, and includes a specific antioxidant useful for preventing deterioration of the composition. The liquid crystal composition may also include a specific compound having a high maximum temperature or a small viscosity as a first component, a specific compound having a high maximum temperature or a large dielectric anisotropy as a second component, and a specific compound having a large negative dielectric anisotropy as a third component. | 07-03-2014 |
Takeshi Shundo, Mie JP
Patent application number | Description | Published |
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20120238099 | METHOD OF MANUFACTURING ELECTRONIC PART - According to one embodiment, a process target above a substrate is processed in order to produce a wiring pattern including dense wirings and sparse wirings. Next, a sacrificial film filled between wirings is formed in a region where the dense wirings are formed, and then an insulation film is formed above the substrate. A mask is formed such that a part of the region where the dense wirings are formed is exposed and a region where the sparse wirings are formed is exposed, and the insulation film is etched using the mask. Then, the sacrificial film is removed through a part of the region where the dense wirings are formed. Thereafter, an embedded insulation film is formed above the substrate to fill a gap between adjacent wirings in the region where the sparse wirings are formed. | 09-20-2012 |
Takeshi Shundo, Yokkaichi-Shi JP
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20140367767 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device according to the present embodiment includes a semiconductor substrate. An insulating film is provided on the semiconductor substrate. A gate electrode is provided on the insulating film. An SiOCN film covers side surfaces of the gate electrode. A silicon oxide film may be provided between the respective side surfaces of the gate electrode and the SiOCN film. | 12-18-2014 |