Patent application number | Description | Published |
20100094024 | ACTIVE ENERGY RAY CURABLE LIQUID COMPOSITION AND LIQUID CARTRIDGE - The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I): | 04-15-2010 |
20100252529 | PRODUCTION PROCESS FOR STRUCTURE AND PRODUCTION PROCESS FOR LIQUID DISCHARGE HEAD - A production process for a structure comprising: preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold which is a part of a mold member serving as a mold for forming the structure from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure. | 10-07-2010 |
20100255424 | LIQUID DISCHARGE HEAD MANUFACTURING METHOD - Provided is a method for manufacturing a liquid discharge head including a flow path forming member connected to a discharge port on or above a substrate, the method including: providing a layer containing a photosensitive resin on or above the substrate; providing a mask layer that enables reduction of transmission of light with a photosensitive wavelength of the photosensitive resin, at an area on the layer containing the photosensitive resin, the area corresponding to the flow path; performing exposure for the layer containing the photosensitive resin using the mask layer to make the layer containing the photosensitive resin be a pattern having the shape of the flow path; providing a layer that becomes the flow path forming member, so as to cover the pattern; forming the discharge port at a part of the layer that becomes the flow path forming member; and forming the flow path by removing the pattern. | 10-07-2010 |
20120058433 | PROCESS FOR PRODUCING INK JET HEAD - A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent. | 03-08-2012 |
20120105546 | INKJET HEAD AND METHOD OF MANUFACTURING INKJET HEAD - Provided is an inkjet head, including: a substrate having an energy generating element for generating energy to be used for ejecting liquid; and a liquid flow path forming member, which forms patterns of an ejection orifice for ejecting the liquid and a liquid flow path communicating with the ejection orifice and which has a surface subjected to water-repellent treatment, in which the inkjet head includes, in a surface having the ejection orifice, multiple water-repellent areas subjected to water-repellent treatment, and multiple recesses each having a bottom in the liquid flow path forming member and having a surface not subjected to water-repellent treatment. Also provided is a method of manufacturing an inkjet head. | 05-03-2012 |
20120115985 | PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD - A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof. | 05-10-2012 |
20130244183 | PROCESS FOR PRODUCING INK JET RECORDING HEAD - Provided is a process for producing an ink jet recording head, including: forming, on a substrate, a resin composition layer including a cationically polymerizable epoxy resin composition containing a specific compound; carrying out a first pattern exposure and a first heat treatment at the resin composition layer; carrying out a second pattern exposure and a second heat treatment at an unexposed portion of the resin composition layer; and, removing an unexposed portion in the first pattern exposure and in the second pattern exposure by a development treatment, thereby forming an ejection orifice for ejecting ink and an ejection portion having a taper shape in which an inner diameter reduces toward the ejection orifice. | 09-19-2013 |
20150060398 | PROCESS FOR PRODUCING A LIQUID EJECTION HEAD - A process for producing a liquid ejection head including a silicon substrate having a supply port to supply a liquid to a flow path, and an ejection-orifice-forming member forming the flow path between the ejection-orifice-forming member and the silicon substrate and having an ejection orifice to eject the liquid in the flow path. The process includes forming an etching protection film so as to cover the ejection-orifice-forming member; forming the supply port passing through the silicon substrate by anisotropic etching using an alkaline aqueous solution; and removing the etching protection film. The etching protection film includes an organic polymer material having a storage modulus at 80° C. of 1.0×10 | 03-05-2015 |