Patent application number | Description | Published |
20090208855 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus is configured to project a pattern of an original onto a substrate using a projection optical system, thereby exposing the substrate, and comprises a substrate stage configured to hold the substrate, a first detector configured to detect positions of marks on the substrate in a first direction and a second direction orthogonal to each other in a plane perpendicular to an optical-axis direction of the projection optical system, and a controller configured to control the first detector to detect the position of a mark on the substrate while moving the substrate stage substantially along the first direction, and control the first detector to detect the position of a mark on the substrate while moving the substrate stage substantially along the second direction, thereby controlling positioning and exposure of the substrate based on the detection results obtained by the first detector. | 08-20-2009 |
20100002208 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - At least one exemplary embodiment is directed to a method of exposing a substrate to light, including a measurement step of measuring position of a mark arranged on one of a substrate and a stage configured to hold the substrate and to move; a detection step of detecting a foreign particle on the mark based on a process performed in the measurement step; a removing step of removing the foreign particle on the mark in accordance with detection of the foreign particle in the detection step; a moving step of moving the stage based on the position of the mark measured in the measurement step; and an exposure step of exposing the substrate moved in the moving step to light. | 01-07-2010 |
20100104960 | EXPOSURE APPARATUS - An exposure apparatus includes a controller configured to calculate a position of an alignment mark detected by a detector, to approximate a deformation of a substrate by using an approximation equation, to calculate a correction amount of each of the plurality of shots, and to control driving of a stage in exposing each shot based on a correction amount that is calculated. The approximation equation is defined as a sum of a first term representative of a deformation of the entire substrate, and at least one of a second term representative of a distortion of a shot arrangement and a third term representative of a shot shape. | 04-29-2010 |
20100104962 | PATTERNING METHOD, EXPOSURE SYSTEM, COMPUTER READABLE STORAGE MEDIUM, AND METHOD OF MANUFACTURING DEVICE - A method includes measuring a line width of a pattern formed on a first substrate through forming a first edge and a second edge of the pattern on the first substrate, and determining, based on the measured line width, a correction value which corrects information for positioning the first substrate in the forming of the second edge so as to reduce variations in line width. The second edge is formed on a second substrate when positioning thereof in accordance with the information corrected by using the determined correction value. | 04-29-2010 |
20100259741 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus sequentially transfers a pattern of an original to a plurality of shot regions on a substrate, wherein each shot region includes a chip region and a scribe line region surrounding the chip region. The apparatus comprises a detector configured to detect light beams from a first mark and a second mark arranged in a first scribe line region and a second scribe line region, respectively, adjacent to each other on the substrate driven in a measurement scanning direction by substantially simultaneously observing the first scribe line region and the second scribe line region, and a processor configured to process detection signals output from the detector to determine positions of the first mark and the second mark, wherein the substrate is positioned based on the positions of the first mark and the second mark and is exposed. | 10-14-2010 |
20100309486 | PATTERN TRANSFER APPARATUS AND METHOD OF MANUFACTURING DEVICE - An apparatus performs an alignment measurement for a mark of each of at least two shots selected from a plurality of shots on a substrate, and positions the substrate based on the alignment measurements to transfer a pattern to each the plurality of shots. The apparatus comprises a detector configured to detect the mark and a controller configured to control the alignment measurements. The controller is configured to cause the detector to detect two of the mark, and decide whether the alignment measurements include an erroneous measurement based on whether a distance between the two of the mark detected by the detector is outside a tolerance. | 12-09-2010 |
20110032506 | EXPOSURE APPARATUS, SYSTEM, UPDATING METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus comprises a first interface connected to a communication network to which a control apparatus for performing a control operation of the exposure apparatus is connected, a second interface connected, not via the communication network, to an information processing apparatus which updates a software installed on the exposure apparatus, and a controller configured to control the first interface and the second interface so that communication of the first interface with the communication network is disabled, and thereupon communication of the second interface with the information processing apparatus is enabled to enable the information processing apparatus to update the software. | 02-10-2011 |
20110290136 | LITHOGRAPHIC APPARATUS AND MANUFACTURING METHOD OF COMMODITIES - The present invention provides a lithographic apparatus includes a first detection unit for detecting a first mark formed on an original and a second mark formed in each of a plurality of shot regions on a substrate, a second detection unit for detecting the second mark, and a processing unit for performing a process of detecting the second mark by the second detection unit to obtain an array of the shot regions, a process of obtaining a positional relationship between the first mark and the second mark, which are detected by the first detection unit, for each of the shot regions upon moving the substrate using the result of obtaining the array of the shot regions, and a process of transferring a pattern of the original onto each of the shot regions upon aligning the original and the substrate for each of the shot regions based on the positional relationship. | 12-01-2011 |
20150022793 | LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD - Provided is a lithography apparatus that includes a plurality of patterning devices each of which is configured to perform patterning for a substrate supplied from a preprocessing apparatus; and a controller configured to control the plurality of patterning devices such that a plurality of substrates respectively belonging to a plurality of lots is subjected to parallel processings by the plurality of patterning devices based on a plurality of recipe information respectively corresponding to the plurality of lots, and transmit information regarding a schedule of the parallel processings to the preprocessing apparatus. | 01-22-2015 |
20150049317 | LITHOGRAPHY APPARATUS, ALIGNMENT METHOD, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a lithography apparatus for transferring a pattern formed on an original to each of a plurality of shot regions on a substrate, comprising a detection unit configured to detect a mark provided in the shot region and a mark provided on the original, and a control unit configured to control alignment between a target shot region and the pattern of the original such that the mark in the target region detected by the detection unit and the mark on the original are shifted by a positional shift amount which is generated between each mark in the shot region and each mark on the original when an overlay error between the shot region and the pattern of the original falls within an allowable range. | 02-19-2015 |