| Patent application number | Description | Published |
|---|
| 20080241402 | COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM - A coating and developing system includes processing blocks S | 10-02-2008 |
| 20080241403 | COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM - A coating and developing system has a first processing block, a second processing block, and a transfer block interposed between the first and the second processing block. A first direct carrying means carries substrates from a carrier block to the transfer block. The transfer block distributes the substrates to respective film forming unit blocks of the first and the second processing block. Substrates on which films have been formed by the first and the second processing block are collected temporarily in the transfer block. A second direct carrying means carries the substrate collected in the transfer block from the transfer block to an interface block. Use of the first and the second processing block can improve the throughput of the coating and developing system. Since a carrying route from the carrier block to the first processing block, and a carrying route from the carrier block to the second processing block are the same, a carrying program is easy to create. | 10-02-2008 |
| 20080266532 | COATER/DEVELOPER, COATING/DEVELOPING METHOD, AND STORAGE MEDIUM - A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that the rotational axles thereof are parallel to each other; a conveyance path member engaged with and extended between the rotary bodies so as to move along an orbit, the conveyance path member forming a part of the conveyance path of the substrate placed on the conveyance path member; a first transfer part provided at the upstream end of the conveyance path; a second transfer part provided at the downstream end of the conveyance path; and a heating part provided between the upstream end and the downstream end of the conveyance path and configured to heat the substrate. | 10-30-2008 |
| 20080268383 | COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM - A coating and developing system includes two rotating members | 10-30-2008 |
| 20080289715 | Complex pipe and coating/development processing apparatus equipped with complex pipe - In a complex pipe, a plurality of pipe members containing at least a pipe member for liquid and a pipe member for electricity are fixed in parallel arrangement. One end of the complex pipe is connected to a stationary equipment and the other end is connected to a movable member. The plurality of pipe members are integrally combined by a cover member having flexibility. A liquid supply pipe is inserted with a space in the pipe member for liquid. A fluid for temperature adjustment is supplied to the space between the pipe member for liquid and the liquid supply pipe. | 11-27-2008 |
| 20100063623 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD - A substrate processing system processes a plurality of substrates in a single-substrate processing mode by a plurality of processes and provided with a plurality of modules respectively for carrying out processes. When a defect is found in a substrate, a defective processing unit that caused the defect can be easily found out. The substrate processing system and a substrate processing method to be carried out by the substrate processing system can suppress the reduction of throughput when a large number of substrates are to be processed. The substrate processing system is provided with a plurality of modules for processing a plurality of substrates (W) in a single-substrate processing mode by a plurality of processes and includes a substrate carrying means (A | 03-11-2010 |
| 20100255204 | SUBSTRATE HEATING APPARATUS AND METHOD AND COATING AND DEVELOPING SYSTEM - Disclosed is a substrate heating apparatus including a hot plate that heats a substrate, and a cooling plate that supports the substrate and moves between a first position (home position) and the second position above the hot plate to transfer wafers between the two positions. A heat-radiating fin structure is connected to the cooling plate to move together with the cooling plate. The fin structure is thermally connected to the cooling plate via heat pipes. A suction port is arranged so as to locate adjacent to the fin structure when the cooling plate is in the home position. The fin structure is cooled by a gas passing therethrough before flown into the suction port, whereby the cooling plate is cooled through heat transfer from the cooling plate to the fin structure through the heat pipes. | 10-07-2010 |
| 20100300353 | COATING AND DEVELOPING APPARATUS - Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application. | 12-02-2010 |
| 20100326353 | COATING AND DEVELOPING APPARATUS - Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application. | 12-30-2010 |
| 20110032494 | APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT - A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group. | 02-10-2011 |
