Shimbori
Hiroshi Shimbori, Kawasaki-Shi JP
Patent application number | Description | Published |
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20090023102 | POSITIVE RESIST COMPOSITION FOR FORMING THICK-FILM RESIST, THICK-FILM RESIST LAMINATE, AND METHOD OF FORMING RESIST PATTERN - A positive resist composition for forming a thick-film resist having a film thickness of 1 to 15 μm, the composition comprising: a resin component (A) that includes a polymer compound (A1), which has a weight average molecular weight of 20,000 to 50,000, and includes a structural unit (a1) derived from a hydroxystyrene and a structural unit (a2) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid generator component (B) that generates acid upon exposure and includes an onium salt-based acid generator having an anion moiety represented by general formula (I): R | 01-22-2009 |
20090068594 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN - A positive resist composition for producing MEMS using an electron beam, the composition comprising a resin component (A) that displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon irradiation, wherein the resin component (A) is a resin prepared by protecting a portion of all the hydroxyl groups within an alkali-soluble novolak resin with acid-dissociable, dissolution-inhibiting groups. | 03-12-2009 |
20090081590 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS - A negative resist composition is provided wherein the composition has the sensitivity to g-rays, i-rays, KrF excimer lasers and electron rays, and can be used for mix and match wherein exposure is conducted using at least two exposure light sources selected form g-rays, i-rays, KrF excimer lasers and electron rays. Furthermore, a negative resist composition and a resist pattern forming method are also proposed wherein a resist pattern having excellent high resolution and excellent plating resistance can be formed, and they can be used for manufacturing MEMS. That is, the present invention proposes: a negative resist composition which is used for a process in which at least two exposure light sources selected from g-rays, i-rays, KrF excimer lasers and electron rays are used and comprises an alkali-soluble resin component (A), acid generator component (B), which generates acid due to exposure to g-rays, i-rays, KrF excimer lasers and electron rays, and a crosslinking agent (C); and a negative resist composition which is used for manufacturing MEMS and comprises an alkali-soluble novolak resin (A), an acid generator component (B) which generates an acid due to the exposure of radiation and a crosslinking agent component (C). | 03-26-2009 |
Takao Shimbori, San Diego, CA US
Patent application number | Description | Published |
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20130266825 | ULTRACAPACITOR AND BATTERY DEVICE WITH STANDARD FORM FACTOR - This disclosure provides systems, methods and apparatus for a battery system. The battery system includes an enclosure, a battery disposed within the enclosure; and at least one ultracapacitor. The ultracapacitor is disposed within the enclosure and coupled to the battery to provide electrical energy via battery terminals. The enclosure conforms to a standard form factor for a battery that comprises one or more conventional storage cells without an ultracapacitor. | 10-10-2013 |
20130266826 | ULTRACAPACITOR/BATTERY COMBINATION AND BUS BAR SYSTEM - This disclosure provides systems, methods and apparatus for a combined battery/capacitor energy storage device. The energy storage device includes an energy storage device housing, with a battery housing portion, a capacitor housing portion, and a housing lid. The energy storage device includes a battery disposed within the battery housing portion. The battery includes a first battery terminal extending through a battery lid enclosing the battery housing portion. The energy storage device includes a capacitor disposed within the capacitor housing portion and connected in parallel with the battery. The capacitor includes a first capacitor terminal. The energy storage device includes a first bus bar electrically connecting the first battery terminal and the first capacitor terminal. The energy storage device includes a first external device terminal extending through the energy storage device housing and configured to electrically connect to the first battery terminal and the bus bar. | 10-10-2013 |
Takeo Shimbori, San Diego, CA US
Patent application number | Description | Published |
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20130266824 | ULTRACAPACITOR AND INTEGRATED BATTERY COMBINATION - This disclosure provides systems, methods and apparatus for a combined battery/capacitor energy storage device. In one aspect, the device includes a housing with an integrated battery housing portion, a capacitor housing portion, and a housing lid. A plurality of battery electrodes and electrolyte are contained directly within the integrated battery housing portion and are configured to form an integrated battery within the integrated battery housing portion. The capacitor is connected in parallel with the battery and contained within the capacitor housing portion. A first device terminal and a second device terminal extending through the housing. | 10-10-2013 |