Patent application number | Description | Published |
20080280048 | Single wafer processing unit - This invention relates to a thermal processing method including: a placing step of placing an object to be processed onto a stage arranged in a processing container that can be vacuumed; and a heating step of heating the object to be processed to a predetermined temperature. The object to be processed is heated under a state in which a temperature distribution is maintained in such a manner that a temperature at a central portion of the object to be processed is high while a temperature at a peripheral portion of the object to be processed is low, during at least a part of the heating step. | 11-13-2008 |
20080309239 | MAGNETRON CONTROL METHOD, MAGNETRON SERVICE LIFE JUDGMENT METHOD, MICROWAVE GENERATION DEVICE, MAGNETRON SERVICE LIFE JUDGMENT DEVICE, PROCESSING DEVICE, COMPUTER PROGRAM, AND STORAGE MEDIUM - A microwave generation device includes: a magnetron having a cathode containing a filament and an anode containing a hollow resonator arranged to oppose to each other; a filament current measuring unit; and an application voltage measuring unit for measuring voltage applied to the filament. Based on the current and the voltage obtained by the current measuring unit and the voltage measuring unit, a resistance value calculation unit obtains a resistance value of the filament. A temperature calculation unit calculates the filament temperature from the resistance value and the resistance-temperature dependent characteristic. A filament power source is controlled by a power control unit so that the filament temperature is within a predetermined temperature range. | 12-18-2008 |
20090041640 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted. | 02-12-2009 |
20090133755 | Gas supply system and proessing system - A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. | 05-28-2009 |
20090151639 | Gas processing apparatus and gas processing method - A gas processing apparatus | 06-18-2009 |
20090159214 | MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS - A microwave plasma source ( | 06-25-2009 |
20090178614 | FILM-FORMING APPARATUS - A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, which has a large number of gas-discharging holes, a gas-supplying mechanism that supplies a process gas into the chamber through the showerhead, and a showerhead-temperature controlling unit that controls a temperature of the showerhead. | 07-16-2009 |
20100107977 | FILM FORMING APPARATUS - A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, which has a large number of gas-discharging holes, a gas-supplying mechanism that supplies a process gas into the chamber through the showerhead, and a showerhead-temperature controlling unit that controls a temperature of the showerhead. | 05-06-2010 |
20100224324 | PLASMA GENERATING APPARATUS, PLASMA GENERATING METHOD AND REMOTE PLASMA PROCESSING APPARATUS - A compact plasma generating apparatus providing high efficiency of plasma excitation is presented. A plasma generating apparatus ( | 09-09-2010 |
20110048034 | PROCESSING EQUIPMENT FOR OBJECT TO BE PROCESSED - Processing equipment for an object to be processed is provided with a process container, the internal of which can be evacuated, a gas introducing means for introducing a prescribed gas into the process container, a supporting table provided in the process container, a ring-shaped supporting part provided on the supporting table for supporting the object to be processed, a plurality of thermoelectric conversion elements provided on an upper plane of the supporting table on an inner side of the supporting part, an element storing space evacuating means for evacuating inside the element storing space formed by a lower plane of the object to be treated, which is supported by the supporting part, an upper plane of the supporting table and the supporting part. | 03-03-2011 |
20120067523 | TUNER AND MICROWAVE PLASMA SOURCE - A tuner matching an impedance of a load in the chamber to a characteristic impedance of the microwave power source is provided. The tuner includes: a body having a tubular outer conductor and a tubular inner conductor coaxially provided in the outer conductor, the body forming a part of the microwave transmission path; an annular dielectric slug provided between the outer conductor and the inner conductor, the slug being movable along a longitudinal direction of the inner conductor; and a drive mechanism for moving the slug and including a drive part for applying a driving force; a drive transmission part for transmitting the driving force to the slug; a drive guide part for guiding movement of the slug; and a holding part for holding the slug at the drive transmission part. The drive transmission part, the drive guide part and the holding part are accommodated in the inner conductor. | 03-22-2012 |
20120247390 | FILM FORMATION APPARATUS - Disclosed is a film formation apparatus ( | 10-04-2012 |
20120279944 | ANNEALING APPARATUS - Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber | 11-08-2012 |