Patent application number | Description | Published |
20080252865 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region. | 10-16-2008 |
20090015807 | Exposure apparatus and device manufacturing method - An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting electromagnetic radiation onto an object plane; a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece. The immersion medium is supplied through at least one orifice arranged in the immersion optics. | 01-15-2009 |
20090218653 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus. | 09-03-2009 |
20110051106 | Exposure apparatus and device manufacturing method - An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. In addition, at least one bubble recovery mechanism recovers bubbles in the liquid in an upstream side of the liquid flow with respect to the projection optical system. | 03-03-2011 |
20110279794 | Exposure apparatus and device manufacturing method - An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage, a supply mechanism, a recovery mechanism and an auxiliary recovery mechanism. The substrate stage mounts the substrate and moves within a two-dimensional plane while holding the substrate. The supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. The recovery mechanism recovers the liquid, and the auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism. | 11-17-2011 |
20120224154 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid. | 09-06-2012 |
20130308113 | EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WITH LIGHT AMOUNT DISTRIBUTION HAVING LIGHT LARGER IN FOUR AREAS - An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on ten same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas. | 11-21-2013 |
20130308114 | EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WITH LIGHT AMOUNT DISTRIBUTION HAVING LIGHT LARGER IN FOUR AREAS - An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on ten same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas. | 11-21-2013 |