Patent application number | Description | Published |
20080205745 | METHODS FOR ACCURATE IDENTIFICATION OF AN EDGE OF A CARE AREA FOR AN ARRAY AREA FORMED ON A WAFER AND METHODS FOR BINNING DEFECTS DETECTED IN AN ARRAY AREA FORMED ON A WAFER - Methods for identifying an edge of a care area for an array area formed on a wafer and/or for binning defects detected in the array area are provided. One method for identifying an edge of a care area for an array area formed on a wafer includes determining a value for a difference image as a function of position from a position known to be inside the array area to a position known to be outside of the array area. The method also includes identifying the position that is located closest to the inside of the array area and that has the value greater than a threshold as a position of the edge of the care area. | 08-28-2008 |
20110142327 | METHODS FOR ACCURATE IDENTIFICATION OF AN EDGE OF A CARE AREA FOR AN ARRAY AREA FORMED ON A WAFER AND METHODS FOR BINNING DEFECTS DETECTED IN AN ARRAY AREA FORMED ON A WAFER - Methods for identifying an edge of a care area for an array area formed on a wafer and/or for binning defects detected in the array area are provided. One method for identifying an edge of a care area for an array area formed on a wafer includes determining a value for a difference image as a function of position from a position known to be inside the array area to a position known to be outside of the array area. The method also includes identifying the position that is located closest to the inside of the array area and that has the value greater than a threshold as a position of the edge of the care area. | 06-16-2011 |
20110291566 | Multi-Wavelength Pumping to Sustain Hot Plasma - A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature. | 12-01-2011 |
20130181595 | Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma Light Source - A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma, the plasma bulb being substantially transparent to light emanating from a pump laser configured to sustain the plasma within the plasma bulb, wherein the plasma bulb is substantially transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma, and a filter layer disposed on an interior surface of the plasma bulb, the filter layer configured to block a selected spectral region of the illumination emitted by the plasma. | 07-18-2013 |
20140050389 | Automated Inspection Scenario Generation - Methods and systems for determining inspection scenarios without input from a user are presented. Inspection scenarios include at least one acquisition mode, defect detection parameter values, and classification parameter values. In one example, a number of defect events are determined by a hot inspection of a wafer surface. The defect events are classified and attributes associated with each defect event are identified. The defect events are labeled with this information. Based on the identified attributes and classification, inspection scenarios are determined. The inspection scenarios are solutions in a mathematical space formed by the identified attributes. In some examples, a plurality of inspection scenarios are determined and a desired inspection scenario is selected from the plurality based on the number of defects of interest and the number of nuisance events captured by the selected inspection scenario. | 02-20-2014 |
20140376802 | Wafer Inspection Using Free-Form Care Areas - Methods and systems for detecting defects on a wafer are provided. One method includes determining characteristics of care areas for a wafer based on wafer patterns. Determining the characteristics includes determining locations of care areas, identifying at least one pattern of interest (POI) in the wafer patterns for each of the care areas, allowing any of the care areas to have a free-form shape, allowing the care areas to be larger than frame images and selecting two or more POIs for at least one of the care areas. The method also includes searching for POIs in images generated for the wafer using an inspection system. In addition, the method includes detecting defects on the wafer by determining positions of the care areas in the images and applying one or more defect detection methods to the images based on the positions of the care areas in the images. | 12-25-2014 |
20150049778 | System and Method for Separation of Pump Light and Collected Light in a Laser Pumped Light Source - A system for separating plasma pumping light and collected broadband light includes a pump source configured to generate pumping illumination including at least a first wavelength, a gas containment element for containing a volume of gas, a collector configured to focus the pumping illumination from the pumping source into the volume of gas to generate a plasma within the volume of gas, wherein the plasma emits broadband radiation including at least a second wavelength and an illumination separation prism element positioned between a reflective surface of the collector and the pump source and arranged to spatially separate the pumping illumination including the first wavelength and the emitted broadband radiation including at least a second wavelength emitted from the plasma. | 02-19-2015 |
20150324964 | Inspection Recipe Setup from Reference Image Variation - Systems and methods for generating information for use in a wafer inspection process are provided. One method includes acquiring output of an inspection system for die(s) located on wafer(s), combining the output for the die(s) based on within die positions of the output, determining, on a within die position basis, a statistical property of variation in values of characteristic(s) of the combined output, and assigning the within die positions to different groups based on the statistical properties determined for the within die positions. The method also includes storing information for the within die positions and the different groups to which the within die positions are assigned in a storage medium that is accessible to the inspection system for performing the wafer inspection process, which includes applying defect detection parameter(s) to additional output of the inspection system generated for a wafer based on the information thereby detecting defects on the wafer. | 11-12-2015 |
20160061745 | Repeater Detection - Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. | 03-03-2016 |
20160061749 | Array Mode Repeater Detection - Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the at least the portion of the array region in the die(s) by subtracting the reference image from portion(s) of the test image(s) corresponding to the at least one cell. The method further includes detecting defects on the wafer in the at least one cell based on the difference image(s). | 03-03-2016 |
20160104600 | Defect Detection Using Structural Information - Systems and methods for detecting defects on a specimen based on structural information are provided. One system includes one or more computer subsystems configured for separating the output generated by a detector of an inspection subsystem in an array area on a specimen into at least first and second segments of the output based on characteristic(s) of structure(s) in the array area such that the output in different segments has been generated in different locations in the array area in which the structure(s) having different values of the characteristic(s) are formed. The computer subsystem(s) are also configured for detecting defects on the specimen by applying one or more defect detection methods to the output based on whether the output is in the first segment or the second segment. | 04-14-2016 |
20160140412 | System and Method for Enhanced Defect Detection with a Digital Matched Filter - Enhanced defect detection of a sample includes acquiring two or more inspection images from a sample from two or more locations of the sample for a first optical mode. The defection detection also generating an aggregated defect profile based on the two or more inspection images from the two or more locations for the first optical mode for a selected defect type and calculating one or more noise correlation characteristics of the two or more inspection images acquired from the two or more locations for the first optical mode. Defect detection further includes the generation of a matched filter for the first optical mode based on the generated aggregated defect profile and the calculated one or more noise correlation characteristics. | 05-19-2016 |
Patent application number | Description | Published |
20080200809 | ULTRASOUND TRANSMIT BEAMFORMER INTEGRATED CIRCUIT AND METHOD - The invention provides a novel method of transmit beamforming, which allows compact analog implementation of complex digital algorithms without compromising their features. It is aimed to support envelope shaping, apodization, and phase rotation per channel and per firing. Each of three embodiments represents a complete transmit channel driven by pulse-width modulated (PWM) waveforms stored in a conventional sequence memory. PWM signals controls the transmit pulse envelope (shape) by changing the duty cycle of the carrier. Beamformation data are loaded prior to a firing via serial interface. Under the direction of a controller, the circuitry allows high precision (beyond sampling rate) phase rotation of the carrier. It also provides transmit apodization (aperture weighting), which maintains an optimal trade-off among low sidelobe level and widening of the mainlobe. Implementing such an IC, the manufacturing cost of a high-end ultrasound system can be reduced. Equally, the proposed solution makes the benefits of digital transmit beamformers available to midrange and entry-level machines since it merely requires a modified programming of the sequence memory. | 08-21-2008 |
20080242987 | Method and Apparatus for Transducer Excitation in Medical Ultrasound Imaging - A method of transducer excitation in medical ultrasound imaging. Based on a stepped approximation of Gaussian modulated cosines, the transmit waveform provides bandlimited spectrum and low level of second order harmonics while retaining the duration of the transmitting within two carrier cycles. The waveform is constructed as a linear composition of four unipolar, rectangle pulses of unity amplitude. Furthermore, the described embodiment supports digitally controlled transmit apodization and focusing. | 10-02-2008 |
20100123520 | Low Noise Binary-Coded Gain Amplifier and Method for Time-Gain Compensation in Medical Ultrasound Imaging - A low noise variable gain amplifier and method for processing received signals in an ultrasound medical imaging system is disclosed. Unlike solutions known from the prior art, the signals are amplified by a binary-coded gain amplifier having its amplification factor progressively increased during the penetration of the transmitted pulse into a patient's body. This allows enhancing both the system dynamic range and Signal to Noise Ratio. | 05-20-2010 |
20110133841 | Low Noise Binary-Coded Gain Amplifier And Method For Time-Gain Compensation In Medical Ultrasound Imaging - A low noise variable gain amplifier and method for processing received signals in an ultrasound medical imaging system is disclosed. Unlike solutions known from the prior art, the signals are amplified by a binary-coded gain amplifier having its amplification factor progressively increased during the penetration of the transmitted pulse into a patient's body. This allows enhancing both the system dynamic range and Signal to Noise Ratio. | 06-09-2011 |