Patent application number | Description | Published |
20080316471 | DETERMINING AZIMUTH ANGLE OF INCIDENT BEAM TO WAFER - A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle. | 12-25-2008 |
20090002721 | WAFER AND STAGE ALIGNMENT USING PHOTONIC DEVICES - A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided. | 01-01-2009 |
20090009763 | FLIPPING STAGE ARRANGEMENT FOR REDUCED WAFER CONTAMINATION CROSS SECTION AND IMPROVED MEASUREMENT ACCURACY AND THROUGHPUT - A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided. | 01-08-2009 |
20090021236 | Alignment Correction System and Method of Use - A system and method for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool comprising at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact. The method comprises measuring current on each branch of a circuit and calculating an angle of a wafer based on a difference in the current on each branch of the circuit. | 01-22-2009 |
20090027660 | OPTICAL SPOT GEOMETRIC PARAMETER DETERMINATION USING CALIBRATION TARGETS - A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot. | 01-29-2009 |
20090182529 | DETERMINING SIGNAL QUALITY OF OPTICAL METROLOGY TOOL - A method, system and computer program product for determining a signal quality of an optical metrology tool are disclosed. A method comprises: collecting a data pool regarding measurements of a target made by the optical metrology tool, the data pool including a wavelength of incident light used in a measurement; and statistically analyzing the data pool to obtain a wavelength specific signal quality of the optical metrology tool. | 07-16-2009 |
20090185168 | OPTICAL MEASUREMENT USING FIXED POLARIZER - Optical measurement method and systems employing a fixed polarizer are disclosed. In one embodiment, the method includes providing at least one optical detection system having a fixed polarizer having a first type polarization; providing a first target on a substrate and a second target on the substrate; optically measuring the first target and the second target using the at least one optical detection system with the first target being positioned at a right angle relative to the second target to obtain a first measurement with the first type polarization and a second measurement with a second type-equivalent polarization; and combining the first measurement and the second measurement to obtain the optical measurement. | 07-23-2009 |
20090185183 | MONITORING STAGE ALIGNMENT AND RELATED STAGE AND CALIBRATION TARGET - Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence. | 07-23-2009 |
20090186427 | CHARACTERIZING FILMS USING OPTICAL FILTER PSEUDO SUBSTRATE - A system and method of characterizing a parameter of an ultra thin film, such as a gate oxide layer. A system is disclosed that includes a structure having a pseudo substrate positioned below an ultra thin film, wherein the pseudo substrate includes an optical mirror for enhancing an optical response; and a system for characterizing the ultra thin film by applying a light source to the ultra thin film and analyzing the optical response. | 07-23-2009 |