| Patent application number | Description | Published |
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| 20090146322 | METHOD OF ELIMINATING A LITHOGRAPHY OPERATION - Methods of semiconductor device fabrication are disclosed. An exemplary method includes processes of depositing a first pattern on a semiconductor substrate, wherein the first pattern defines wide and narrow spaces; depositing spacer material over the first pattern on the substrate; etching the spacer material such that the spacer material is removed from horizontal surfaces of the substrate and the first pattern but remains adjacent to vertical surfaces of a wide space defined by the first pattern and remains within narrow a space defined by the first pattern; and removing the first pattern from the substrate. In one embodiment, the first pattern can comprise sacrificial material, which can include, for example, polysilicon material. The deposition can comprise physical vapor deposition, chemical vapor deposition, electrochemical deposition, molecular beam epitaxy, atomic layer deposition or other deposition techniques. According to another embodiment, features for lines and logic device components having a width greater than that of the lines are formed in the spacer material in the same mask layer. | 06-11-2009 |
| 20090307649 | SYSTEM AND METHOD FOR MODIFYING A DATA SET OF A PHOTOMASK - The present invention provides a method for compensating, infidelities of a process that transfers a pattern to a layer of an integrated circuit, by minimizing, with respect to a photomask pattern, a cost function that quantifies the deviation between designed and simulated values of circuit parameters of the pattern formed on a semiconductor wafer. | 12-10-2009 |
| 20100037200 | SYSTEM AND METHOD FOR MODEL BASED MULTI-PATTERNING OPTIMIZATION - Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition. | 02-11-2010 |
| 20110014786 | METHOD, SYSTEM, AND PROGRAM PRODUCT FOR ROUTING AN INTEGRATED CIRCUIT TO BE MANUFACTURED BY DOUBLED PATTERNING - Disclosed are a method, apparatus, and program product for routing an electronic design using double patenting that is correct by construction. The layout that has been routed will by construction be designed to allow successful manufacturing with double patenting, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with double patterning. | 01-20-2011 |
| 20110113393 | METHOD, SYSTEM, AND PROGRAM PRODUCT FOR ROUTING AN INTEGRATED CIRCUIT TO BE MANUFACTURED BY SIDEWALL-IMAGE TRANSFER - Disclosed is a method, apparatus, and program product for routing an electronic design using sidewall image transfer that is correct by construction. The layout is routed by construction to allow successful manufacturing with sidewall image transfer, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with a two-mask sidewall image transfer. A layout is produced that can be manufactured by a two-mask sidewall image transfer method. In one approach, interconnections can be in arbitrary directions. In another approach, interconnections follow grid lines in x and y-directions. | 05-12-2011 |
| 20120102442 | SYSTEM AND METHOD FOR MODEL BASED MULTI-PATTERNING OPTIMIZATION - Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition. | 04-26-2012 |
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| 20090316824 | METHOD FOR TRANSMITTING A SEQUENCE OF SYMBOLS FOR EXPLOITING TRANSMIT DIVERSITY - An embodiment of a method for transmitting data through at least a channel in a wireless communication system, the method comprising at least the steps of:
| 12-24-2009 |
| 20110128842 | Method for Estimating a Received Signal and Corresponding Device - A method and apparatus for estimating a transmission channel in a receiver of an OFDMA signal formed by a plurality of carriers modulated by data elements and distributed in the time-frequency domain in successive symbols, the plurality of carriers including pilot carriers, modulated by reference data elements known by receivers. The method includes: receiving a signal comprising a series of n symbols covering at least one resource block; making an initial channel estimation by identifying the pilot carriers included in the series of n symbols; determining diagonal entries of p frequency domain channel matrices G | 06-02-2011 |
| 20120093246 | Channel Estimation Method - A channel estimating method is provided for a signal transmitted in an orthogonal frequency division multiplexing (OFDM) system, wherein an OFDM symbol of the signal has at least one null subcarrier set in its defined bandwidth. The method includes: obtaining at least one initial channel estimate over at least one OFDM symbol of a received signal; processing the at least one initial channel estimate for delivering at least one soft information in a form of a complete matrix; and updating the at least one initial channel estimate by performing a truncated singular value decomposition of a partial FFT matrix. The partial FFT matrix includes only the first L | 04-19-2012 |
| 20120140683 | METHOD OF EXPLOITATION OF CO-CHANNEL INTERFERENCE, APPARATUS AND COMPUTER PROGRAM - A method of canceling co-channel interference of a signal received by a mobile station having at least two receiving antennas, in a cellular OFDMA-TDD communication network having a serving base station and at least one interfering base station. The signal is a result of a serving signal transmitted by the serving base station which is distorted by at least one interfering signal transmitted by the interfering base station. The serving signal is transmitted with a first modulation scheme and the interfering signal is transmitted with a second modulation scheme. The method includes: a channel estimation phase delivering channel estimations of the serving signal and the interfering signal; and a MIMO detecting phase, detecting symbols by using the channel estimations of the serving signal and the interfering signal. The MIMO detection phase is realized using a non-linear method which uses the first modulation scheme and the second modulation scheme. | 06-07-2012 |
