Patent application number | Description | Published |
20100321661 | METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimisation criterion. These control commands are applied to the optical elements, before the mask is illuminated. | 12-23-2010 |
20120019796 | ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY - An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (Δ | 01-26-2012 |
20130057844 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings. | 03-07-2013 |
20130258303 | METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimisation criterion. These control commands are applied to the optical elements, before the mask is illuminated. | 10-03-2013 |
20140111785 | ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY - An illumination optical unit for projection lithography has a first polarization mirror device to reflect and polarize of illumination light. A second mirror device, which is disposed downstream of the polarization mirror device reflects an illumination light beam. At least one drive device is operatively connected to at least one of the two mirror devices. The two mirror devices are displaceable relative to one another via the drive device between a first relative position, which leads to a first beam geometry of the illumination light beam after reflection at the second mirror device, and a second relative position, which leads to a second beam geometry of the illumination light beam after reflection at the second mirror device, which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination. | 04-24-2014 |
20140132942 | OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE - The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element, which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray and a second partial ray, with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element for generating a desired polarized illumination setting from the first partial ray and the second partial ray, wherein the ray-splitting optical element is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one. | 05-15-2014 |
20140192339 | COLLECTOR - A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum. | 07-10-2014 |
20140285788 | OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD - The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement comprises at least one first array of first polarization-influencing elements and a second array of second polarization-influencing elements, wherein the first and second arrays are arranged successively in the light propogation direction, wherein the first and second polarization-influencing elements in each case have a birefringence that is dependent on the presence of an electric field, and wherein the first polarization-influencing elements and the second polarization-influencing elements are transverse Pockels cells. | 09-25-2014 |
20140313498 | POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A polarization-influencing optical arrangement comprises a first retardation element and a second retardation element. | 10-23-2014 |
20140347646 | METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPTICAL SYSTEM - The invention relates to a method for compensating at least one defect of an optical system which comprises introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated. | 11-27-2014 |
20150015862 | ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY - An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light. | 01-15-2015 |
20150017589 | APPARATUS AND METHOD FOR COMPENSATING A DEFECT OF A CHANNEL OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM - The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising (a) a plurality of channels, each channel guiding a partial beam and at least one channel comprising at least one defect, and (b) at least one optical element arranged within the at least one channel having the at least one defect, the optical element being adapted to at least partially compensate the at least one defect of the partial beam of the channel. | 01-15-2015 |
20150022798 | ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY - A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system. | 01-22-2015 |
20150029480 | OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical system of a microlithographic projection exposure apparatus comprises at least one mirror arrangement, having a plurality of mirror elements which are adjustable independently of one another for varying an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement, by which, for a light beam passing through during the operation of the projection exposure apparatus, different polarization states can be set via the light beam cross section, and a retarder arrangement, which is arranged upstream of the polarization-influencing optical arrangement in the light propagation direction and at least partly compensates for a disturbance of the polarization distribution that is present elsewhere in the projection exposure apparatus, wherein the polarization-influencing optical arrangement has optical components which are adjustable in their relative position with respect to one another, wherein different output polarization distributions can be produced by this adjustment in conjunction with the mirror arrangement. | 01-29-2015 |
20150085272 | OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a second reflection surface, wherein the first reflection surface and the second reflection surface are arranged at an angle of 0°±10° or at an angle of 90°±10° relative to one another, wherein light incident on the first reflection surface during the operation of the optical system forms an angle of 45°±5° with the first reflection surface, and wherein the polarization-influencing arrangement is rotatable about a rotation axis running parallel to the light propagation direction of light incident on the first reflection surface during the operation of the optical system. | 03-26-2015 |
Patent application number | Description | Published |
20100113073 | Methods and Systems for Disabling Text Messaging while Driving - Methods and systems are provided for disabling text messaging while driving. In one embodiment, a mobile station makes a first determination that it is moving at greater than a threshold rate. The mobile station makes a second determination that, while it is moving at greater than the threshold rate, an outgoing text message reflects more than a threshold degradation in typing proficiency. In response to making the first and second determinations, the mobile station disables a text-message-sending capability. | 05-06-2010 |
20130003610 | WIRELESS COMMUNICATIONS DURING A WIRELESS COMMUNICATIONS DEVICE REBOOT - A wireless communication device has first processing circuitry and second processing circuitry that are separate from one another. The wireless communication device transfers first wireless communications to a wireless network using the first processing circuitry. The wireless communication device identifies a reboot condition for the first processing circuitry and responsively provides a geographic location of the wireless communication device to the second processing circuitry and displays a user interface for communications using the second processing circuitry. The wireless communication device reboots the first processing circuitry while the user interface for communications is displayed. The wireless communication device transfers second wireless communications to the wireless network using the second processing circuitry while rebooting the first processing circuitry. The second wireless communications may comprise emergency communications including the geographic location of the wireless communication device. | 01-03-2013 |
20140033316 | TRUSTED SECURITY ZONE ACCESS TO PERIPHERAL DEVICES - A method of trusted data communication. The method comprises executing a data communication application in a trusted security zone of a processor, wherein the processor is a component of a computer, commanding a controller of a peripheral device to execute a control application in a trusted security zone of the controller, wherein the controller is a component of the computer, commanding at least one of another peripheral device or a user interface device to not access a data bus of the computer, verifying that the controller is executing the control application in the trusted security zone of the controller, sending data from the processor to the controller over the data bus of the computer, and the controller one of transmitting the data sent by the processor on an external communication link, reading a memory storage disk, or writing to a memory storage disk. | 01-30-2014 |
20140047548 | Systems and Methods for Provisioning and Using Multiple Trusted Security Zones on an Electronic Device - A method of provisioning a subordinate trusted security zone in a processor having a trusted security zone. The method comprises receiving by a master trusted application executing in a master trusted security zone of the processor a request to provision a subordinate trusted security zone in the processor, wherein the request comprises a master trusted security zone key, wherein the request designates the subordinate trusted security zone, and wherein the request defines an independent key. The method further comprises provisioning by the master trusted application the subordinate trusted security zone to be accessible based on the independent key. | 02-13-2014 |
20140281544 | Trusted Security Zone Containers for the Protection and Confidentiality of Trusted Service Manager Data - Embodiments relate generally to systems and methods for providing access to a trusted security zone container within a trusted security zone of a mobile device. An application may receive trusted service manager validation data from a trusted service manager. The application may also receive a trusted security zone master key, wherein the trusted security zone master key provides access to a plurality of trusted security zone containers within the trusted security zone. The application may hash the trusted service manager validation data with the trusted security zone master key. The application may generate the trusted security zone sub key based on hashing to access one or more containers. One or more signal may be transmitted to provision the set of one or more trusted security zone containers with the trusted security zone sub key. The application may provide the sub key to the trusted service manager to access a container. | 09-18-2014 |