Patent application number | Description | Published |
20140052713 | HARDWARE IMPLEMENTATION OF THE AGGREGATION/GROUP BY OPERATION: FILTER METHOD - Techniques are described for performing grouping and aggregation operations. In an embodiment, a request is received to aggregate data grouped by a first column. In response to receiving the request, values are loaded from the first column into an input cache. The values include values, from the first column, from a set of rows. A filter unit is programmed with logic to perform a comparison between a particular value, from the first column of a first row, and values in the first column of a plurality of rows, of the set of rows. Based on the comparison, a predicate result is generated that identifies rows, within the plurality of rows, that have a valued in the first column that matches the particular value. An aggregate value for a second column is generated by aggregating values, from the second column, of each of the rows identified by the predicate result. | 02-20-2014 |
20140052726 | HARDWARE IMPLEMENTATION OF THE AGGREGATION/GROUP BY OPERATION: HASH-TABLE METHOD - Techniques are described for performing grouping and aggregation operations. In one embodiment, a request is received to aggregate data grouped by a first column. In response to receiving the request, a group value in a row of a first column is mapped to an address. A pointer is stored for a first group at a first location identified by the address. The pointer identifies a second location of a set of aggregation data for the first group. An aggregate value included in the set of aggregation data is updated based on a value in the row of a second column. | 02-20-2014 |
20140052743 | HARDWARE IMPLEMENTATION OF THE FILTER/PROJECT OPERATIONS - Techniques are described for performing filter and project operations. In an embodiment, a set of predicates that specify criteria for filtering results to a query is received. Based on a particular predicate of the set of predicates, a predicate result for at least one portion of a particular column is generated. The predicate result identifies rows within the first column that satisfy the particular predicate. Rows are selected and returned as results to the query based at least in part on the predicate result. In an embodiment, the predicate result is a bitvector where each bit of the bitvector corresponds to a particular row within the particular column and identify whether the particular row satisfies the particular predicate. | 02-20-2014 |
Patent application number | Description | Published |
20090193295 | VOLTAGE MARGIN TESTING FOR PROXIMITY COMMUNICATION - A method of testing a proximity communication system for voltage margin by impressing a voltage upon the data link between the transmitter on one chip and the receiver on the other chip coupled to the transmitter through a capacitively coupling circuit formed by juxtaposed capacitor pads on the respective two chips. The impressed voltage is varied and the output of the receiver is monitored to determine an operational voltage margin. The floating inputs on the receiver may be continuously biased by connecting them to variable biasing supply voltages through high impedances. When the floating inputs are periodically refreshed to a refresh voltage during a quiescent data period, the refresh voltage is varied between successive refresh cycles. The variable test voltage may be applied to transmitter output when it is in a high-impedance state, and the output of the receiver is measured. | 07-30-2009 |
20100060299 | DETERMINING CHIP SEPARATION BY COMPARING COUPLING CAPACITANCES - A semiconductor die includes proximity connectors proximate to a surface of the semiconductor die. This semiconductor die is configured to communicate signals with another semiconductor die via proximity communication through one or more of the proximity connectors. In particular, the proximity connectors include a first group of proximity connectors that is configured to facilitate determining a first separation between the semiconductor die and the other semiconductor die by comparing coupling capacitances between the semiconductor die and the other semiconductor die. Note that the first group of proximity connectors includes a first proximity connector and a second proximity connector, and the second proximity connector at least partially encloses an in-plane outer edge of the first proximity connector. | 03-11-2010 |
20100171554 | OFFSET CANCELLATION FOR DC ISOLATED NODES - Offset voltages developed on floating nodes on inputs to high-performance amplifiers that are DC isolated from the data signals input to amplifiers are cancelled by connecting a highly resistive element between the input node and a predetermined potential, particularly useful in proximity communication systems in which two chips are connected through capacitive or inductive coupling circuits formed jointly in the two chips. The resistive element may be an off MOS transistor connected between the node and a desired bias voltage or a MOS transistor with its gate and drain connected to the potential. Multiple bias voltages may be distributed to all receivers and locally selected by a multiplexer for application to one or two input nodes of the receiver. The receiver output can also serve as a predetermined potential when the resistive element has a long time constant compared to the data rate or the resistive element is non-linear. | 07-08-2010 |
20140099892 | OFFSET CANCELLATION FOR DC ISOLATED NODES - Offset voltages developed on floating nodes on inputs to high-performance amplifiers that are DC isolated from the data signals input to amplifiers are cancelled by connecting a highly resistive element between the input node and a predetermined potential, particularly useful in proximity communication systems in which two chips are connected through capacitive or inductive coupling circuits formed jointly in the two chips. The resistive element may be an off MOS transistor connected between the node and a desired bias voltage or a MOS transistor with its gate and drain connected to the potential. Multiple bias voltages may be distributed to all receivers and locally selected by a multiplexer for application to one or two input nodes of the receiver. The receiver output can also serve as a predetermined potential when the resistive element has a long time constant compared to the data rate or the resistive element is non-linear. | 04-10-2014 |
Patent application number | Description | Published |
20090033941 | METHODS AND APPARATUS FOR IDENTIFYING THIN FILMS ON A SUBSTRATE - The present invention provides systems, apparatus and methods for detecting a film in an electronic device disposed in an electronic device processing tool. The invention includes a mounting member adapted to couple the apparatus to a view port of the electronic device processing tool, an optical energy source disposed within the mounting member and adapted to illuminate the electronic device within the electronic device processing tool, an optical system adapted to pass wavelengths indicative of a presence of the film, and an optical detector positioned to receive optical energy reflected from the substrate and passing through the optical system adapted to detect a presence or absence of the film. Numerous other features are disclosed. | 02-05-2009 |
20100106992 | METHOD AND APPARATUS FOR DETECTING AN IDLE MODE OF PROCESSING EQUIPMENT - Methods and apparatus for detecting an idle mode of processing equipment are provided herein. In some embodiments, an apparatus for monitoring a processing system may include a first system adapter for monitoring a first process chamber and determining a state thereof; and a first support adapter for communicating with the first system adapter and a first support system coupled to the first process chamber, the support adapter configured to communicate a readiness to operate the first support system at a low power mode to a controller of the support system in response to the state of the first process chamber being in an idle mode. | 04-29-2010 |
20100138583 | REMOTE ACCESS GATEWAY FOR SEMICONDUCTOR PROCESSING EQUIPMENT - An apparatus for providing an interface for semiconductor processing equipment is disclosed. In some embodiments, an apparatus for providing an interface for semiconductor processing equipment having an interface card includes a display logic subsystem to provide an interface to one or more devices such as video and information displays, light pens, keyboards, computer mice, and warning light networks and alarms via a data and control bus; a bridge to provide access to the data and control bus; and a local computer subsystem coupled to the bridge and the display logic subsystem, wherein the local computer subsystem provides access to one or more remote devices. | 06-03-2010 |
20100198550 | SENSOR SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS - A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states. | 08-05-2010 |
20100285724 | MODULAR INPUT/OUTPUT BRIDGE SYSTEM FOR SEMICONDUCTOR PROCESSING EQUIPMENT - Apparatus and methods for providing an interface for a semiconductor processing tool are provided. In some embodiments, the apparatus may include an input/output bridge for receiving analog and state command system control signals from, and sending return data and status information to, a system controller, wherein the analog and state command system control signals are intended to control an analog device, and for converting the analog and state command system control signal into a digital system control signal intended to control a digital device; and an upper pneumatic assembly coupled to the input/output bridge for providing pressure control to one or more pressure zones located on a polishing apparatus coupled to the upper pneumatic assembly for the polishing of semiconductor wafers. | 11-11-2010 |
20110198417 | PROCESS CHAMBER GAS FLOW IMPROVEMENTS - Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber. | 08-18-2011 |
20120136622 | SENSOR SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS - A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states. | 05-31-2012 |
20130044326 | METHODS AND APPARATUS FOR SENSING A SUBSTRATE IN A CHAMBER - The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed. | 02-21-2013 |
20130237129 | Detecting Membrane Breakage in a Carrier Head - A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line. | 09-12-2013 |
20140139838 | METHODS AND APPARATUS FOR SENSING A SUBSTRATE IN A CHAMBER - The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed. | 05-22-2014 |
20140152103 | ENHANCED RE-HOSTING CAPABILITY FOR LEGACY HARDWARE AND SOFTWARE - Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components. | 06-05-2014 |
20140374509 | PROCESS CHAMBER GAS FLOW IMPROVEMENTS - Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber. | 12-25-2014 |