Patent application number | Description | Published |
20100195075 | PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS - An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements having a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element. | 08-05-2010 |
20120134015 | MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY HAVING SUCH MIRROR AND PROJECTION EXPOSURE APPARATUS HAVING SUCH PROJECTION OBJECTIVE - EUV mirror with a layer arrangement on a substrate. The layer arrangement includes a plurality of layer subsystems each consisting of a periodic sequence of at least one period of individual layers. The periods include two individual layers composed of different material for a high refractive index layer and a low refractive index layer and have within each subsystem a constant thickness that deviates from a period thickness of an adjacent layer subsystem. The subsystem most distant from the substrate has (i) a number of periods greater than the number of periods for the layer subsystem that is second most distant from the substrate and/or (ii) a thickness of the high refractive index layer that deviates by more than 0.1 nm from that of the high refractive index layer of the subsystem that is second most distant from the substrate. | 05-31-2012 |
20120212810 | MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE - EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P″, P′″) each consisting of a periodic sequence of at least two periods (P | 08-23-2012 |
20120224160 | REFLECTIVE OPTICAL IMAGING SYSTEM - An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ | 09-06-2012 |
20120229784 | MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS - A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror. | 09-13-2012 |
20120320348 | REFLECTIVE MASK FOR EUV LITHOGRAPHY - To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate configured for a working wavelength in the EUV range and having stacks with layers of at least two materials with different real parts of the refractive index at the working wavelength, wherein the multilayer system (V) is configured such that, as it is irradiated with EUV radiation at a fixed wavelength and an angle interval between the smallest and the largest angle of incidence of up to 21°, the apodization is less than 30%. | 12-20-2012 |
20130010352 | PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS - An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element. | 01-10-2013 |
20130038929 | MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY COMPRISING SUCH A MIRROR OR SUCH A SUBSTRATE, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE | 02-14-2013 |
20140368801 | IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTION LITHOGRAPHY COMPRISING SUCH AN IMAGING OPTICAL UNIT - An imaging optical unit ( | 12-18-2014 |