Patent application number | Description | Published |
20110078427 | TRAP HANDLER ARCHITECTURE FOR A PARALLEL PROCESSING UNIT - A trap handler architecture is incorporated into a parallel processing subsystem such as a GPU. The trap handler architecture minimizes design complexity and verification efforts for concurrently executing threads by imposing a property that all thread groups associated with a streaming multi-processor are either all executing within their respective code segments or are all executing within the trap handler code segment. | 03-31-2011 |
20110196723 | Virtual Arbitration System and Method - A three-dimensional virtual world is provided and includes an avatar representing an accusing party in an infringement case over one or more three-dimensional game objects, an avatar representing an accused party in the infringement case, a virtual space arena containing the objects in dispute, a jury box containing avatars representing a jury assembled to preside over the infringement case, and an avatar representing a judge for instructing the jury and for rendering a judgment in the case based on jury input. The jury observes the objects and object functionalities through demonstration of the objects in the virtual arena and supplies an opinion relative to the likeness of the objects to one another according to instruction given by the judge and wherein the judge renders a verdict based on statistical analysis of the opinions collected from the jury. | 08-11-2011 |
20140067901 | SYSTEM AND METHOD FOR CONTEXTUAL MESSAGING IN A LOCATION-BASED NETWORK - Systems and methods are provided that presents interesting local content to users at times when the content is most actionable and engaging without the user explicitly entering a search term or expressing intent. In one implementation, the system uses contextual signals about a user to rank local content. Signals may include, for example, who they (one or more users) are, what kinds of places they like, where they are, how familiar they are with the area, the time of day, where the user's friends have been nearby, among other information related to the one or more users. A system may be provided that uses contextual rules and machine learning to target content to users. The system learns which of these contextual signals are most important and alters its ranking function to optimize user engagement in terms of conversions. | 03-06-2014 |
Patent application number | Description | Published |
20080202588 | METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER - A method and apparatus for delivering gases to a semiconductor processing system are provided. In one embodiment, an apparatus for delivering gases to a semiconductor processing system includes a plurality of gas input and output lines having inlet and outlet ports. Connecting lines couple respective pairs of the gas input and gas output lines. Connecting valves are arranged to control flow through the respective connecting lines. Mass gas flow controllers are arranged to control flow into respective inlet ports. In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets, flowing one or more gases through the manifold to a vacuum environment by-passing the processing chamber prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during substrate processing. | 08-28-2008 |
20080202609 | METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER - A method and apparatus for delivering gases to a semiconductor processing system are provided. In one embodiment, an apparatus for delivering gases to a semiconductor processing system includes a plurality of gas input and output lines having inlet and outlet ports. Connecting lines couple respective pairs of the gas input and gas output lines. Connecting valves are arranged to control flow through the respective connecting lines. Mass gas flow controllers are arranged to control flow into respective inlet ports. In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets, flowing one or more gases through the manifold to a vacuum environment by-passing the processing chamber prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during substrate processing. | 08-28-2008 |
20080202610 | METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESSING CHAMBER - A method and apparatus for delivering gases to a semiconductor processing system are provided. In one embodiment, an apparatus for delivering gases to a semiconductor processing system includes a plurality of gas input and output lines having inlet and outlet ports. Connecting lines couple respective pairs of the gas input and gas output lines. Connecting valves are arranged to control flow through the respective connecting lines. Mass gas flow controllers are arranged to control flow into respective inlet ports. In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets, flowing one or more gases through the manifold to a vacuum environment by-passing the processing chamber prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during substrate processing. | 08-28-2008 |
Patent application number | Description | Published |
20080257261 | PLASMA PROCESSING APPARATUS - Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly. | 10-23-2008 |
20080260966 | PLASMA PROCESSING METHOD - Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a method of controlling a plasma in a process chamber includes providing a chamber for processing a substrate and having a processing volume defined therein wherein a plasma is to be formed during operation, the chamber further having a plasma control magnet assembly comprising a plurality of magnets that provide a magnetic field having a magnitude is greater than about 10 Gauss in an upper region of the processing volume and less than about 10 Gauss in a lower region of the processing volume proximate a substrate to be processed; supplying a process gas to the chamber; and forming a plasma in the processing volume from the process gas. | 10-23-2008 |
20090032522 | ZONE CONTROL HEATER PLATE FOR TRACK LITHOGRAPHY SYSTEMS - A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires. | 02-05-2009 |
20110094683 | RF FEED STRUCTURE FOR PLASMA PROCESSING - Apparatus for plasma processing are provided. In some embodiments, an RF feed structure includes a first RF feed to couple RF power to a plurality of symmetrically arranged stacked first RF coil elements; a second RF feed coaxially disposed about the first RF feed and electrically insulated therefrom, the second RF feed to couple RF power to a plurality of symmetrically arranged stacked second RF coil elements coaxially disposed with respect to the first RF coil elements. In some embodiments, a plasma processing apparatus includes a first RF coil; a second RF coil coaxially disposed with respect to the first RF coil; a first RF feed coupled to the first RF coil to provide RF power thereto; and a second RF feed coaxially disposed with respect to the first RF feed and electrically insulated therefrom, the second RF feed coupled to the second RF coil to provide RF power thereto. | 04-28-2011 |
20110094994 | INDUCTIVELY COUPLED PLASMA APPARATUS - Methods and apparatus for plasma processing are provided herein. In some embodiments, a plasma processing apparatus includes a process chamber having an interior processing volume; a first RF coil disposed proximate the process chamber to couple RF energy into the processing volume; and a second RF coil disposed proximate the process chamber to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil, wherein the first and second RF coils are configured such that RF current flowing through the first RF coil is out of phase with RF current flowing through the RF second coil. | 04-28-2011 |
20110097901 | DUAL MODE INDUCTIVELY COUPLED PLASMA REACTOR WITH ADJUSTABLE PHASE COIL ASSEMBLY - Embodiments of dual mode inductively coupled plasma reactors and methods of use of same are provided herein. In some embodiments, a dual mode inductively coupled plasma processing system may include a process chamber having a dielectric lid and a plasma source assembly disposed above the dielectric lid. The plasma source assembly includes a plurality of coils configured to inductively couple RF energy into the process chamber to form and maintain a plasma therein, a phase controller for adjusting the relative phase of the RF current applied to each coil in the plurality of coils, and an RF generator coupled to the phase controller and the plurality of coils. | 04-28-2011 |
20110265831 | METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROCESS CHAMBERS - A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line. | 11-03-2011 |
20110265887 | APPARATUS FOR RADIAL DELIVERY OF GAS TO A CHAMBER AND METHODS OF USE THEREOF - Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange. | 11-03-2011 |
20110265951 | TWIN CHAMBER PROCESSING SYSTEM - Methods and apparatus for twin chamber processing systems are disclosed, and, in some embodiments, may include a first process chamber and a second process chamber having independent processing volumes and a plurality of shared resources between the first and second process chambers. In some embodiments, the shared resources include at least one of a shared vacuum pump, a shared gas panel, or a shared heat transfer source. | 11-03-2011 |
20110269314 | PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF - Process chambers having shared resources and methods of use are provided. In some embodiments, substrate processing systems may include a first process chamber having a first substrate support disposed within the first process chamber, wherein the first substrate support has a first heater and a first cooling plate to control a temperature of the first substrate support; a second process chamber having a second substrate support disposed within the second process chamber, wherein the second substrate support has a second heater and a second cooling plate to control a temperature of the second substrate support; and a shared heat transfer fluid source having an outlet to provide a heat transfer fluid to the first cooling plate and the second cooling plate and an inlet to receive the heat transfer fluid from the first cooling plate and the second cooling plate. | 11-03-2011 |
20130134129 | INDUCTIVELY COUPLED PLASMA APPARATUS - Methods and apparatus for plasma processing are provided herein. In some embodiments, a plasma processing apparatus includes a process chamber having an interior processing volume; a first RF coil disposed proximate the process chamber to couple RF energy into the processing volume; and a second RF coil disposed proximate the process chamber to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil, wherein the first and second RF coils are configured such that RF current flowing through the first RF coil is out of phase with RF current flowing through the RF second coil. | 05-30-2013 |
Patent application number | Description | Published |
20120222813 | VACUUM CHAMBERS WITH SHARED PUMP - Embodiments of the present disclosure generally relate to vacuum processing chambers having different pumping requirements and connected to a shared pumping system through a single foreline. In one embodiment, the vacuum processing chambers include a high conductance pumping conduit and a low conductance pumping conduit coupled to a single high conductance foreline. In another embodiment, a plurality of unbalanced chamber groups may be connected to a common pumping system by a final foreline. | 09-06-2012 |
20130224953 | ABATEMENT AND STRIP PROCESS CHAMBER IN A LOAD LOCK CONFIGURATION - Embodiments of the present invention a load lock chamber including two or more isolated chamber volumes, wherein one chamber volume is configured for processing a substrate and another chamber volume is configured to provide cooling to a substrate. One embodiment of the present invention provides a load lock chamber having at least two isolated chamber volumes formed in a chamber body assembly. The at least two isolated chamber volumes may be vertically stacked. A first chamber volume may be used to process a substrate disposed therein using reactive species. A second chamber volume may include a cooled substrate support. | 08-29-2013 |
20130334199 | THIN HEATED SUBSTRATE SUPPORT - Embodiments of the present invention provide an apparatus heating and supporting a substrate in a processing chamber. One embodiment of the present invention provides a substrate support assembly. The substrate support assembly includes a heated plate having a substrate supporting surface on a front side and a cantilever arm extending from a backside of the heated plate. The heated plate is configured to support and heat a substrate on the substrate supporting surface. The cantilever arm has a first end attached to the heated plate near a central axis of the heated plate, and a second end extending radially outwards from the central axis. | 12-19-2013 |
20130337655 | ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION - Embodiments of the present invention provide a dual load lock chamber capable of processing a substrate. In one embodiment, the dual load lock chamber includes a chamber body defining a first chamber volume and a second chamber volume isolated from one another. Each of the lower and second chamber volumes is selectively connectable to two processing environments through two openings configured for substrate transferring. The dual load lock chamber also includes a heated substrate support assembly disposed in the second chamber volume. The heated substrate support assembly is configured to support and heat a substrate thereon. The dual load lock chamber also includes a remote plasma source connected to the second chamber volume for supplying a plasma to the second chamber volume. | 12-19-2013 |
Patent application number | Description | Published |
20090214798 | APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEANING - Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a showerhead configured to provide a purge gas to a front side of a substrate during a backside etch processing. The showerhead comprises a body configured to be disposed over the front side of the substrate. The body has a process surface configured to face the front side of the substrate. The process surface has an outer circular region, a central region, a middle region between the outer central region and the central region. The first plurality of holes are distributed in the outer circular region and configured to direct the purge gas towards an edge area of the front side of the substrate. No gas delivery hole is distributed within a substantial portion of the middle region. | 08-27-2009 |
20110048644 | PLASMA REACTOR WITH TILTABLE OVERHEAD RF INDUCTIVE SOURCE - Correction of skew in plasma etch rate distribution is performed by tilting the overhead RF source power applicator about a tilt axis whose angle is determined from skew in processing data. Complete freedom of movement is provided by incorporating exactly three axial motion servos supporting a floating plate from which the overhead RF source power applicator is suspended. | 03-03-2011 |
20110120505 | APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEANING - Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a showerhead configured to provide a purge gas to a front side of a substrate during a backside etch processing. The showerhead comprises a body configured to be disposed over the front side of the substrate. The body has a process surface configured to face the front side of the substrate. The process surface has an outer circular region, a central region, a middle region between the outer central region and the central region. The first plurality of holes are distributed in the outer circular region and configured to direct the purge gas towards an edge area of the front side of the substrate. No gas delivery hole is distributed within a substantial portion of the middle region. | 05-26-2011 |
20130105085 | PLASMA REACTOR WITH CHAMBER WALL TEMPERATURE CONTROL | 05-02-2013 |
20130105088 | THERMAL MANAGEMENT OF EDGE RING IN SEMICONDUCTOR PROCESSING | 05-02-2013 |
20130206594 | PLASMA REACTOR WITH TILTABLE OVERHEAD RF INDUCTIVE SOURCE - Correction of skew in plasma etch rate distribution is performed by tilting the overhead RF source power applicator about a tilt axis whose angle is determined from skew in processing data. Complete freedom of movement is provided by incorporating exactly three axial motion servos supporting a floating plate from which the overhead RF source power applicator is suspended. | 08-15-2013 |
20130284287 | APPARATUS FOR UNIFORM PUMPING WITHIN A SUBSTRATE PROCESS CHAMBER - Substrate supports for use in process chambers having limited physical space for configuring chamber components are disclosed. In some embodiments, a substrate support may include a body having a support surface; a utilities feed coupled to the body and comprising a second portion coupled to and extending laterally away from the body beyond a diameter of the body, and first portion coupled to the second portion and extending perpendicularly away from the body; and a cover plate movably disposable beneath and with respect to the body between a first position disposed completely beneath the body, and a second position wherein the cover plate is disposed over the first portion of the utilities feed and includes a first portion disposed beneath the body, and wherein the first portion has a curved edge having a radius equal to the distance from a central axis of the support surface to the curved edge. | 10-31-2013 |
20140076850 | METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROCESS CHAMBERS - A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line. | 03-20-2014 |
20150063405 | SUBSTRATE PLACEMENT DETECTION IN SEMICONDUCTOR EQUIPMENT USING THERMAL RESPONSE CHARACTERISTICS - Methods and apparatus for determining proper placement of a substrate upon a substrate support in a process chamber are disclosed. In some embodiments, a method for detecting substrate placement in a process chamber includes placing a substrate on a support surface of a substrate support with the process chamber; modifying a pressure within the chamber to create a detection pressure within the chamber; sensing a first temperature of the substrate support; monitoring a thermal response characteristic of the substrate support after placing the substrate on the substrate support; comparing the thermal response characteristic to a predetermined response characteristic; and determining whether the substrate is placed correctly based upon the comparison of the thermal response characteristic to the predetermined response characteristic. | 03-05-2015 |
Patent application number | Description | Published |
20090106200 | Methods and Systems of Content Mobilization, Mobile Search, and Video Editing through a Web Interface - This invention relates to computer implemented methods and systems for content mobilization, and in particular, methods and systems for mobilization of video, music, photos and other media, including processes for mobile search, mobile messaging, building a mobile content library, and combinations thereof. Content mobilization may be initiated by entry of search parameters or keywords and followed by retrieval of search results (e.g. videos, images, audio files) from online source(s). Upon selection of a content item by user, the process dynamically retrieves the media from online source. Further, the media file may be dynamically edited and then dynamically transcoded and sent to a mobile device. | 04-23-2009 |
20100262489 | Mobile enabled advertising and marketing methods for computer games, simulations, demonstrations, and the like - A system and method for promotion and sale of products within computer games or simulations wherein at least one promoted product is brought to the attention of a player. Upon performing at least one action, the player may select a promoted product, receive information about the promoted product, achieve enhanced performance during game play, and/or purchase the promoted product. The various embodiments illustrate the promoted product may be anything from goods and services to contracts to interests in real property. | 10-14-2010 |
20120204107 | Methods and Systems of Content Mobilization, Mobile Search, and Video Editing through a Web Interface - This invention relates to computer implemented methods and systems for content mobilization, and in particular, methods and systems for mobilization of video, music, photos and other media, including processes for application in mobile search, mobile messaging, mobile editing of media, and combinations thereof. Upon a user of a mobile device selecting a web content item corresponding to a media file, the media file is dynamically transcoded based on the mobile device to receive the media and sent to the mobile device. | 08-09-2012 |
20140164921 | Methods and Systems of Augmented Reality on Mobile Devices - This invention relates to computer implemented methods and systems for augmented reality on mobile devices, and in particular, methods and systems for mobilization of video, music, photos and other media as augmented reality. Upon a user's selection of a map marker or other object corresponding to a place in a 2-D or 3-D view, a video or other media item is dynamically encoded for the user's specific device and carrier and played on the user's phone or mobile device or sent to another phone or mobile device. The 2-D or 3-D view may be viewed from within a browser or a separate application. | 06-12-2014 |
Patent application number | Description | Published |
20120101575 | APPARATUS AND METHODS FOR NIPPLE AND BREAST FORMATION - Apparatus and methods for nipple and breast formation are described where devices precondition or expand a target nipple tissue to reduce the pressure exerted by the skin on an eventual implant. Generally, the apparatus comprises a mold having a contact surface which is curved in conformance with a breast upon which the mold is positionable, the contact surface having an adhesive for securement upon the breast, and the mold defining a cavity along the contact surface which conforms to a size of a nipple to be formed upon the breast and where the cavity further comprises the adhesive for securement to the nipple. A breast enlargement device comprises a cup larger than the target breast and further defines an inner surface which adheres to the breast when contacted. | 04-26-2012 |
20120226214 | DEVICES AND METHODS FOR SKIN TIGHTENING - The methods, procedures, kits, and devices described herein assist with the healing process of tissue that was previously or simultaneously treated for a therapeutic or cosmetic effect. The methods, procedures, kits, and devices described herein can also provide temporary simulated results of a cosmetic procedure to allow for visual assessment to select the type of procedure or for treatment planning in advance of the surgical procedure. | 09-06-2012 |
20130116782 | APPARATUS AND METHODS FOR NIPPLE FORMATION VIA COLLAPSIBLE DEVICES - Apparatus and methods for nipple and breast formation are described where devices precondition or expand a target nipple tissue to reduce the pressure exerted by the skin on an eventual implant. Generally, the apparatus comprises a mold having a contact surface which is curved in conformance with a breast upon which the mold is positionable, the contact surface having an adhesive for securement upon the breast, and the mold defining a cavity along the contact surface which conforms to a size of a nipple to be formed upon the breast and where the cavity further comprises the adhesive for securement to the nipple. A breast enlargement device comprises a cup larger than the target breast and further defines an inner surface which adheres to the breast when contacted. | 05-09-2013 |
20130190673 | DEVICES AND METHODS FOR SKIN TIGHTENING - The methods, procedures, kits, and devices described herein assist with the healing process of tissue that was previously or simultaneously treated for a therapeutic or cosmetic effect. The methods, procedures, kits, and devices described herein can also provide temporary simulated results of a cosmetic procedure to allow for visual assessment to select the type of procedure or for treatment planning in advance of the surgical procedure. | 07-25-2013 |
20140148829 | CATHETER SYSTEM FOR VASCULAR RE-ENTRY FROM A SUB-INTIMAL SPACE - A catheter system and corresponding methods are provided for accessing a blood vessel true lumen from a sub-intimal plane of the vessel. The catheter system includes visualization elements for determining the orientation of the true lumen with respect to the sub-intimal plane at an identified entry site from a position in the sub-intimal plane. The entry site is distal to a chronic total occlusion (CTO). The catheter system also includes a system for physically securing tissue of the sub-intimal plane at the entry site to the catheter system. The attaching system reduces or eliminates catheter float within the sub-intimal space. The catheter system further includes re-entry devices to establish and maintain a path from the sub-intimal plane back into the vessel true lumen. | 05-29-2014 |
20140277124 | TISSUE ANCHORING AND DEPLOYMENT SYSTEMS - Tissue anchoring and deployment systems are described herein. Generally, an anchor housing may define a receiving channel within or along its periphery. A securement member which is adjustably slidable relative to the receiving channel and further defining a suture receiving channel along a portion of the member may also be used such that the suture receiving channel is aligned with an opening defined along a first surface. The securement member and a compression surface along the receiving channel are spaced apart from one another and form a suture compression interface. Additionally, a length of suture may also be used where the suture has a first portion positioned along the suture compression interface and a second portion passed through the suture receiving channel and opening along the first surface. The compression interface has a height which is sized to be relatively smaller than a diameter of the first portion of suture. | 09-18-2014 |
20140277131 | TISSUE ANCHORING AND DEPLOYMENT SYSTEMS - Tissue anchoring and deployment systems are described herein. Generally, an anchor housing may define a receiving channel within or along its periphery. A securement member which is adjustably slidable relative to the receiving channel and further defining a suture receiving channel along a portion of the member may also be used such that the suture receiving channel is aligned with an opening defined along a first surface. The securement member and a compression surface along the receiving channel are spaced apart from one another and form a suture compression interface. Additionally, a length of suture may also be used where the suture has a first portion positioned along the suture compression interface and a second portion passed through the suture receiving channel and opening along the first surface. The compression interface has a height which is sized to be relatively smaller than a diameter of the first portion of suture. | 09-18-2014 |