Patent application number | Description | Published |
20080311823 | Apparatus for heating or cooling a polishing surface of a polishing appratus - The present invention provides an apparatus for heating or cooling a polishing surface. This apparatus includes a heat exchanger arranged so as to face the polishing surface when the workpiece is polished. The heat exchanger includes a medium passage through which a heat-exchanging medium flows, and a bottom surface facing the polishing surface. At least a part of the bottom surface is inclined with an upward gradient above the polishing surface such that a polishing liquid on the polishing surface generates a lift exerted on the bottom surface during movement of the polishing surface. | 12-18-2008 |
20090092469 | SUBSTRATE PROCESSING UNIT, SUBSTRATE TRANSFER METHOD, SUBSTRATE CLEANSING PROCESS UNIT, AND SUBSTRATE PLATING APPARATUS - To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit | 04-09-2009 |
20110094442 | SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS - A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section. | 04-28-2011 |
20120086147 | METHOD FOR PRODUCING POLYGLYCOLIC ACID FIBER - A method for producing a polyglycolic acid fiber, including: obtaining undrawn yarns by melt spinning a polyglycolic acid resin; keeping the undrawn yarns under a temperature condition of 1 to 20° C.; obtaining drawn yarns by drawing the kept undrawn yarns; and, if necessary obtaining a staple fiber by cutting the drawn yarns. | 04-12-2012 |
20120130024 | POLYGLYCOLIC ACID-BASED FIBERS AND METHOD FOR PRODUCING SAME - A method for producing a polyglycolic acid-based fiber, includes a spinning process of obtaining undrawn yarns by melt spinning a polyglycolic acid-based resin composition, which comprises a polyglycolic acid resin and a polylactic acid resin having a weight average molecular weight of 10×10 | 05-24-2012 |
20120141246 | SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS - A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section. | 06-07-2012 |
20120156473 | LAMINATE AND STRETCHED LAMINATE USING THE SAME - A laminate includes: a crystallized polyglycolic acid-based resin layer containing 100 parts by mass of a crystallized polyglycolic acid-based resin having a spherulite diameter of 1 to 30 μm and 0.0075 to 0.20 parts by mass of at least one nucleating agent selected from the group consisting of boron nitride particles, molybdenum sulfide particles, and tungsten sulfide particles; and a thermoplastic resin layer adjacent to the crystallized polyglycolic acid-based resin layer. | 06-21-2012 |
20130230725 | LAMINATE FOR STRETCH-FORMING AND STRETCHED LAMINATE USING THE SAME - A laminate for stretch-forming includes: a polyglycolic acid-based resin layer containing 100 parts by mass of a polyglycolic acid-based resin and 0.5 parts by mass or more and 10 parts by mass or less of at least one thermoplastic elastomer selected from the group consisting of polyester-based thermoplastic elastomers and polyurethane-based thermoplastic elastomers; and a thermoplastic resin layer adjacent to the polyglycolic acid-based resin layer, as well as a stretched laminate is obtained by stretching the same. | 09-05-2013 |