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Roel Daamen

Roel Daamen, Leuven BE

Patent application numberDescriptionPublished
20110097896Method for fabrication of in-laid metal interconnects - The present invention relates to a method for fabrication of in-laid metal interconnects. The method comprises the steps of providing a substrate with a dielectric material (04-28-2011

Roel Daamen, Herkenbosch NL

Patent application numberDescriptionPublished
20100029076METHOD OF MAKING AN INTERCONNECT STRUCTURE - A damascene process is described using a copper fill process to fill a trench (02-04-2010
20100105202METHOD OF FORMING AN INTERCONNECT STRUCTURE - A method of forming an interconnect structure in a semiconductor device in which via holes (04-29-2010
20110018097INTEGRATED CIRCUIT AND MANUFACTURING METHOD THEREFOR - Disclosed is an integrated circuit (IC) comprising a substrate (01-27-2011
20110079649SENSOR - A sensor comprising a silicon substrate having a first and a second surface, integrated circuitry provided on the first surface of the silicon substrate, and a sensor structure provided on the second surface of the silicon substrate. The sensor structure and the integrated circuitry are electrically coupled to each other.04-07-2011
20110146400CAPACITIVE SENSOR - A capacitive sensor for detecting the presence of a substance includes a plurality of upstanding conductive pillars arranged within a first layer of the sensor, a first electrode connected to a first group of the pillars, a second electrode connected to a second, different group of the pillars, and a dielectric material arranged adjacent the pillars, for altering the capacitance of the sensor in response to the presence of said substance.06-23-2011

Roel Daamen, Ab Herkenbosch NL

Patent application numberDescriptionPublished
20090267166METHOD OF MANUFACTURING A DEVICE WITH A CAVITY - The invention relates to a micro-device with a cavity (10-29-2009
20100006957MICROSCOPIC STRUCTURE PACKAGING METHOD AND DEVICE WITH PACKAGED MICROSCOPIC STRUCTURE - A method of packaging a micro electromechanical structure is disclosed. The method comprises the steps of forming the structure on a substrate, depositing a sacrificial layer over the structure, patterning the sacrificial layer, depositing a porous layer over the patterned sacrificial layer, removing the patterned sacrificial layer through the porous layer, treating the porous layer with a plasma and depositing a capping layer over the plasma-treated porous layer. The plasma treatment step ensures that the capping layer material cannot enter the cavity formed by the removal of the sacrificial layer through the porous layer. A device formed by this method is also disclosed.01-14-2010

Roel Daamen, Posterholt NL

Patent application numberDescriptionPublished
20090127537ELECTRIC DEVICE WITH PHASE CHANGE RESISTOR - An electric device has an electrically switchable resistor (05-21-2009