Patent application number | Description | Published |
20080284293 | FREESTANDING WORKSTATION - A freestanding workstation includes a desk assembly and a supported hutch assembly, wherein the desk assembly includes a privacy screen that is telescopingly adjustable, thereby allowing adjustment of the overall length thereof and use within desk assemblies of varying lengths. The hutch assembly includes a drop-in tackboard extending along a rear wall thereof, and wire routing assemblies extending along support members for supporting a storage bin, and for housing communication and electrical lines associated with the workstation. | 11-20-2008 |
20100288168 | DUAL HEIGHT WORKSTATION CONFIGURATION - A worksurface arrangement comprising at least a first support member, a first worksurface forming member supported by the first support member at a first vertical height and extending to a first side from the first support member, a second worksurface forming member supported by the first support member at a second vertical height and extending to a second side opposite the first side of the first support member and a housing including, a front cover extending below the first worksurface forming member, a substantially vertical upper back cover extending downward from the first worksurface forming member substantially to the second vertical height proximate the second worksurface forming member and spaced from the front cover wherein the upper back cover and the front cover bound an upper housing cavity width and a lower back cover extending below the second worksurface forming member and spaced from the front cover wherein the lower back cover and the front cover bound a lower housing cavity width that is larger than the upper housing cavity width. | 11-18-2010 |
20120222587 | Dual Height Workstation Configuration - A worksurface arrangement comprising at least a first support member, a first worksurface forming member supported by the first support member at a first vertical height, a second worksurface forming member supported by the first support member at a second vertical height and extending to a first side of the first support member where the second vertical height is different than the first vertical height, the second worksurface forming member including an undersurface, a first cover extending downward below the first worksurface forming member to a lower edge below the second vertical height, a second cover extending downward from a height proximate the undersurface of the second worksurface forming member and spaced from the first cover wherein the first and second covers bound a housing cavity width. | 09-06-2012 |
20130291765 | DUAL HEIGHT WORKSTATION CONFIGURATION - A work surface arrangement comprising a support structure extending upward from a base end, a first work surface forming member supported by the support structure at a first vertical height, a second work surface forming member supported by the support structure at a second vertical height and extending to a first side of the support structure where the second vertical height is lower than the first vertical height, the second member including an undersurface, a first cover supported by the support structure and extending downward below the first member to a lower edge below the second vertical height, a second cover supported by the support structure and extending downward from a height proximate the undersurface of the second member and spaced from the first cover to bound a cavity, at least one horizontal channel supported by the support structure between the first and second work surface forming members to face the first side. | 11-07-2013 |
20150091425 | DUAL HEIGHT WORKSTATION CONFIGURATION - A work surface arrangement comprising a support structure extending upward from a base end, a first work surface forming member supported by the support structure at a first vertical height, a second work surface forming member supported by the support structure at a second vertical height and extending to a first side of the support structure where the second vertical height is lower than the first vertical height, the second member including an undersurface, a first cover supported by the support structure and extending downward below the first member to a lower edge below the second vertical height, a second cover supported by the support structure and extending downward from a height proximate the undersurface of the second member and spaced from the first cover to bound a cavity, at least one horizontal channel supported by the support structure between the first and second work surface forming members to face the first side. | 04-02-2015 |
Patent application number | Description | Published |
20080214563 | Benzimidazole Thiophene Compounds As Plk Modulators - The present invention provides 5-heteroaryl substituted benzimidazole thiophene compounds pharmaceutical compositions containing the same, processes for preparing the same and their use as pharmaceutical agents. | 09-04-2008 |
20080300247 | Benzimidazole Thiophene Compounds - The present invention provides benzimidazole thiophene compounds pharmaceutical compositions containing the same, processes for preparing the same and their use as pharmaceutical agents. | 12-04-2008 |
20090124615 | Benzimidazole Thiophene Compounds - The present invention provides benzimidazole thiophene compounds pharmaceutical compositions containing the same, processes for preparing the same and their use as pharmaceutical agents. | 05-14-2009 |
20090298815 | Benzene Sulfonamide Thiazole and Oxazole Compounds - The present invention provides thiazole sulfonamide and oxazole sulfonamide compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 12-03-2009 |
20100056525 | 5- AND 6- SUBSTITUTED BENZIMIDAZOLE THIOPHENE COMPOUNDS - The present invention provides 5- and 6-substituted benzimidazole thiophene compounds pharmaceutical compositions containing the same, processes for preparing the same and their use as pharmaceutical agents. | 03-04-2010 |
20100075960 | BENZIMIDAZOLE THIOPHENE COMPOUNDS - The present invention provides bezimidazole thiophene compounds pharmaceutical compositions containing the same, processes for preparing the same and their use as pharmaceutical agents. | 03-25-2010 |
20110098296 | Thiazole And Oxazole Kinase Inhibitors - The present invention provides thiazole and oxazole compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 04-28-2011 |
20110172215 | Benzene Sulfonamide Thiazole And Oxazole Compounds - The present invention provides thiazole sulfonamide and oxazole sulfonamide compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 07-14-2011 |
20110190280 | Thiazole And Oxazole Kinase Inhibitors - The present invention provides thiazole and oxazole compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 08-04-2011 |
20130144055 | Benzene Sulfonamide Thiazole And Oxazole Compounds - The present invention provides thiazole sulfonamide and oxazole sulfonamide compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 06-06-2013 |
20140080851 | Benzene Sulfonamide Thiazole and Oxazole Compounds - The present invention provides thiazole sulfonamide and oxazole sulfonamide compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 03-20-2014 |