| Patent application number | Description | Published |
|---|
| 20090255808 | TARGET FOR EFFICIENT USE OF PRECIOUS DEPOSITION MATERIAL - Aspects comprise sputtering targets comprising a base material carrier provided with a recessed pattern, such as a looping trench, to receive a more precious material to be sputtered during deposition processes. The looping trench can have a cross-section of varying depth based on an expected variation in the magnetic field. The more precious material is provided at least in the trench, for example by hot pressing, and also can be pressed into a layer across an entirety of a surface of the carrier. During operation, the desired deposition of the precious material can occur from the trench area. Thus, a higher percentage of the precious material in the target is used, reducing inventory costs. The base material can be selected based on characteristics of the more precious material, and based on goals including reducing diffusion of base material into precious material and galvanic reactions. | 10-15-2009 |
| 20100009218 | RUTHENIUM (Ru)/RUTHENIUM OXIDE (RuOx) DOPING OF GRAIN BOUNDARIES OF GRANULAR RECORDING MEDIA FOR ENHANCED CORROSION RESISTANCE/GREATER ADHESION - The invention relates to a perpendicular magnetic recording medium comprising a substrate and a granular magnetic layer comprising ruthenium or ruthenium oxide in the grain boundaries. | 01-14-2010 |
| 20100018855 | INLINE CO-SPUTTER APPARATUS - Disclosed is an apparatus and process within a pass-by sputtering chamber, in which standard cathodes and two or more specially-sized cathodes within the sputtering chamber, mounted colinear with the direction of travel of substrates within the sputtering chamber, enabling performance of rapid adjustment of material deposited on a substrate. | 01-28-2010 |
| 20100021773 | HEAD MEDIA SPACING REDUCTION THROUGH DATA ZONE LUBE REMOVAL - The present invention is a manufacturing method of improving the signal-to-medium noise ratio of a magnetic media disk through closer head-to-media spacing, and the resulting disk, by evenly lubricating a magnetic media disk, increasing the viscosity of a selected region of the disk, and removing at least a portion of the lower viscosity region of the lubrication layer, thereby decreasing the thickness of the lubrication layer in the portion of the lower viscosity region, producing a magnetic media disk capable of closer head-to-media spacing in the portion of the lower viscosity region of the lubrication layer. | 01-28-2010 |
| 20100101938 | METHOD FOR PRODUCING LOW COST MEDIA - Disclosed is a method for the low cost manufacturing a plurality of rigid sputtered magnetic media disks of one or more sizes from a rigid sheet, in which one or more initial steps of preparing the media are performed while the media is in sheet form. The individual disks are then removed from the sheet, and final processing is performed individually on the disks. | 04-29-2010 |
| 20100282413 | MULTICHAMBER PROCESSING WITH SIMULTANEAOUS WORKPIECE TRANSPORT AND GAS DELIVERY - A method for treating/processing substrates/workpieces in a multi-chamber treatment/processing apparatus, comprising:
| 11-11-2010 |
| 20110143171 | DATA ZONE LUBE REMOVAL - In an embodiment, a magnetic disk comprising a substrate having a non-data zone region and a data zone region and a lubrication layer on the substrate, wherein a portion of the lubrication layer on the non-data zone region has a greater thickness of higher viscosity than a portion of the lubrication layer on the data zone region. | 06-16-2011 |
| 20110223445 | METHOD & APPARATUS FOR MULTI-STAGE SPUTTER DEPOSITION OF UNIFORM THICKNESS LAYERS - A method of forming a uniform thickness layer of a selected material on a surface of a substrate comprises steps of:
| 09-15-2011 |
| Patent application number | Description | Published |
|---|
| 20080233366 | STRUCTURE AND METHOD FOR SiCOH INTERFACES WITH INCREASED MECHANICAL STRENGTH - Disclosed is a structure and method for forming a structure including a SiCOH layer having increased mechanical strength. The structure includes a substrate having a layer of dielectric or conductive material, a layer of oxide on the layer of dielectric or conductive material, the oxide layer having essentially no carbon, a graded transition layer on the oxide layer, the graded transition layer having essentially no carbon at the interface with the oxide layer and gradually increasing carbon towards a porous SiCOH layer, and a porous SiCOH (pSiCOH) layer on the graded transition layer, the porous pSiCOH layer having an homogeneous composition throughout the layer. The method includes a process wherein in the graded transition layer, there are no peaks in the carbon concentration and no dips in the oxygen concentration. | 09-25-2008 |
| 20100009161 | STRUCTURE AND METHOD FOR SiCOH INTERFACES WITH INCREASED MECHANICAL STRENGTH - Disclosed is a structure and method for forming a structure including a SiCOH layer having increased mechanical strength. The structure includes a substrate having a layer of dielectric or conductive material, a layer of oxide on the layer of dielectric or conductive material, the oxide layer having essentially no carbon, a graded transition layer on the oxide layer, the graded transition layer having essentially no carbon at the interface with the oxide layer and gradually increasing carbon towards a porous SiCOH layer, and a porous SiCOH (pSiCOH) layer on the graded transition layer, the porous pSiCOH layer having an homogeneous composition throughout the layer. The method includes a process wherein in the graded transition layer, there are no peaks in the carbon concentration and no dips in the oxygen concentration. | 01-14-2010 |
