Patent application number | Description | Published |
20120318805 | INSULATED CONTAINER - A container is formed to include an interior region and a mouth opening into the interior region. The container includes a floor and a side wall coupled to the floor to define the interior region between the floor and the side wall | 12-20-2012 |
20120318806 | INSULATED CONTAINER WITH MOLDED BRIM - A container is formed to include an interior region and a mouth opening into the interior region. The container includes a floor and a side wall coupled to the floor to define the interior region between the floor and the side wall. | 12-20-2012 |
20120318807 | PROCESS FOR FORMING AN INSULATED CONTAINER HAVING ARTWORK - A container is formed to include and interior region and a mouth opening into the interior region. The container includes a floor, a side wall coupled to the floor to define the interior region between the floor and the side wall, and artwork on the side wall. | 12-20-2012 |
20120318859 | PROCESS FOR FORMING AN INSULATED CONTAINER HAVING ARTWORK - A container is formed to include and interior region and a mouth opening into the interior region. The container includes a floor, a side wall coupled to the floor to define the interior region between the floor and the side wall, and artwork on the side wall. | 12-20-2012 |
20140041785 | CUP-FORMING PROCESS AND MACHINE - A cup-forming machine includes having a male mandrel and a female receiver. The male mandrel uses a cup body blank and a floor blank to form a body of a cup. The female receive receives the body and forms a rolled brim on the body to establish a cup. | 02-13-2014 |
20140120288 | POLYMERIC MATERIAL FOR AN INSULATED CONTAINER - A formulation includes a polymeric material, a nucleating agent, a blowing, and a surface active agent. The formulation can be used to form a container. | 05-01-2014 |
20140131430 | PROCESS FOR FORMING AN INSULATED CONTAINER HAVING ARTWORK - A container is formed to include and interior region and a mouth opening into the interior region. The container includes a floor, a side wall coupled to the floor to define the interior region between the floor and the side wall, and artwork on the side wall. | 05-15-2014 |
20150051302 | POLYMERIC MATERIAL FOR AN INSULATED CONTAINER - A formulation includes a base resin, a nucleating agent, and a blowing agent. The formulation can be used to form a container. | 02-19-2015 |
Patent application number | Description | Published |
20110062080 | BIO-DENITRIFICATION APPARATUS AND METHOD FOR MAKING AND USING SAME - A denitrification system is disclosed, where a plurality of biological regenerated adsorptive cells or units. Each cell includes a counterflowing absorptive media and waste water to achieve a two or three zone biomass nitrate/nitrite degradation environment. The system includes a backwash water recirculation loop and a media recirculation loop, where the media recirculation loop subjects the media a sufficient shear to dislodge dead microbes and/or weakly bound microbial films from the media surface, but insufficient to substantially reduce the particle size of the friable media. Nutrient supply and distribution and gas controls are used regulate cell characteristics. | 03-17-2011 |
20120318734 | SYSTEMS, APPARATUSES AND METHODS FOR TREATING WASTE WATER - A system of treating high nitrogen content waste water is disclosed, where the system includes a precipitation and conditioning subsystem, an ammonia stripper subsystem, and a denitrification subsystem. The system is adapted to reduce nitrogen contamination to level below about 10 ppm and in certain embodiments below 3 ppm. | 12-20-2012 |
20140083935 | SYSTEMS, APPARATUSES AND METHODS FOR TREATING WASTE WATER - A system of treating high nitrogen content waste water is disclosed, where the system includes a precipitation and conditioning subsystem, an ammonia stripper subsystem, and a denitrification subsystem. The system is adapted to reduce nitrogen contamination to level below about 10 ppm and in certain embodiments below 3 ppm. | 03-27-2014 |
20140083938 | SYSTEMS, APPARATUSES AND METHODS FOR TREATING WASTE WATER - A system of treating high nitrogen content waste water is disclosed, where the system includes a precipitation and conditioning subsystem, an ammonia stripper subsystem, and a denitrification subsystem. The system is adapted to reduce nitrogen contamination to level below about 10 ppm and in certain embodiments below 3 ppm. | 03-27-2014 |
Patent application number | Description | Published |
20090022574 | WORKPIECE LOADING SYSTEM - A wafer loading system accommodates sufficient wafer carriers to substantially maximize the processing speed capability of wafer processing systems. Wafer carriers are placed into and removed from the loading system by one or two overhead carrier loading elements, such as overhead track systems. Carriers may be loaded or removed while other carriers are in work. One or more transfer robots may move wafers from the carriers to buffers. Methods of operating the loading system allow delivery and removal of wafers to and from the processing systems to meet or exceed the processing speeds of the processing systems. | 01-22-2009 |
20090024244 | HIGH THROUGHPUT SEMICONDUCTOR WAFER PROCESSING - A wafer processing system has a wafer loading system accommodating sufficient wafer carriers to substantially maximize the processing speed capability of the processing system. Wafer carriers are placed into and removed from the loading system by one or two overhead carrier loading tracks. Carriers may be loaded or removed while other carriers are in work. One or more transfer robots may move wafers from the carriers to buffers. One or more process robots in a process module move wafers from buffers, or other locations, to processors in the process module. | 01-22-2009 |
20130134035 | CONTACT RING FOR AN ELECTROCHEMICAL PROCESSOR - An electro-processing apparatus includes a rotor in a head, and a contact ring assembly on the rotor. The contact ring assembly may have one or more strips of contact fingers on a ring base, with contact fingers clamped into position on the ring base. The strips may have spaced apart projection openings, with the projections on the ring base extending into or through the projection openings. A shield ring may be attached to the ring base, to clamp the contact fingers in place, and/or to provide an electric field shield over at least part of the contact fingers. The contact fingers may be provided as a plurality of adjoining forks, with substantially each fork including at least two contact fingers. | 05-30-2013 |
20130299343 | ELECTROPLATING PROCESSOR WITH GEOMETRIC ELECTROLYTE FLOW PATH - An electroplating processor includes an electrode plate having a continuous flow path formed in a channel. The flow path may optionally be a coiled flow path. One or more electrodes are positioned in the channel. A membrane plate is attached to the electrode plate with a membrane in between them. Electrolyte moves through the flow path at a high velocity, preventing bubbles from sticking to the bottom surface of membrane. Any bubbles in the flow path are entrained in the fast moving electrolyte and carried away from the membrane. The electroplating processor may alternatively have a wire electrode extending through a tubular membrane formed into a coil or other shape, optionally including shapes having straight segments. | 11-14-2013 |
20140083862 | ELECTROPLATING APPARATUS WITH CONTACT RING DEPLATING - An electroplating apparatus has a rotor in a head, with a contact ring on the rotor. A lift/rotate actuator may move the head to position a sector of the contact ring into a deplate channel of a deplating station. Electrical current and a deplate liquid are applied directly onto the contacts of the contact ring, from a position radially inward of the contacts. Electrical current and a deplate liquid may also be separately applied onto the back side of the ring contact, from a position radially to the outside of the contact ring. A seal on the deplating station makes sliding contact with the contact ring as the contact ring rotates through the deplate channel, with the seal associated with an exhaust or vacuum opening that pulls deplating and rinse liquid through openings in the contact ring. | 03-27-2014 |
20140262795 | ELECTROPLATING PROCESSOR WITH VACUUM ROTOR - A substrate processor uses pressurized gas to create a vortex for lifting and holding a wafer, and to create a vacuum to prevent the wafer from adhering to a contact ring seal after electroplating the wafer. A processor head has a rotor movable into and out of an electrolyte vessel. A backing plate on the rotor includes vortex outlets which create the vortex in the rotor. A vacuum channel adjacent to the perimeter of the rotor applies vacuum to the wafer edges to hold the wafer onto the backing plate. A solenoid or switch in the head has a first position to supply gas flow to the vortex outlets, and a second position to supply gas flow to an aspirator which creates the vacuum in the vacuum channel. | 09-18-2014 |
20150075976 | ELECTROPLATING PROCESSOR WITH GEOMETRIC ELECTROLYTE FLOW PATH - An electroplating processor includes an electrode plate having a continuous flow path formed in a channel. The flow path may optionally be a coiled flow path. One or more electrodes are positioned in the channel. A membrane plate is attached to the electrode plate with a membrane in between them. Electrolyte moves through the flow path at a high velocity, preventing bubbles from sticking to the bottom surface of membrane. Any bubbles in the flow path are entrained in the fast moving electrolyte and carried away from the membrane. The electroplating processor may alternatively have a wire electrode extending through a tubular membrane formed into a coil or other shape, optionally including shapes having straight segments. | 03-19-2015 |