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Raaijmakers, NL
Adrianus Theodorus Anthonius Maria Raaijmakers, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20080211849 | Inkjet Device and Method for the Controlled Positioning of Droplets of a Substance Onto a Substrate - The invention provides a device for the controlled positioning of droplets of a substance onto a substrate, the device comprising at least a print head comprising a nozzle provided to eject the droplet, the inkjet device further comprising a control camera arranged such that after ejection of the droplet out of the nozzle, the droplet is detected by the control camera. In case either the droplet volume or velocity or flight path or viscosity or surface tension start to deviate from preset values, the software can correct for this in a closed loop manner. If the droplet is not ejected at all, the control software stops the printer and an operator can maintain the print head. | 09-04-2008 |
| 20080305969 | Ink Jet Device and Method for Producing a Biological Assay Substrate by Releasing a Plurality of Substances Onto the Substrate - The invention provides an ink jet device ( | 12-11-2008 |
Alexander Jan Eberhard Raaijmakers, Loevestraat 10 NL
| Patent application number | Description | Published |
|---|---|---|
| 20110316539 | ANTENNA ARRAY COMPRISING AT LEAST ONE DIPOLE ANTENNA FOR MAGNETIC RESONANCE IMAGING - An antenna array adapted for magnetic resonance imaging, wherein the antenna array comprises at least one antenna element, wherein each antenna element comprises:-a substrate with a first side and a second side, wherein the substrate comprises a dielectric material,-at least one dipole antenna, wherein the dipole antenna is attached to the second side of the substrate, wherein the dipole antenna comprises a first connection adapted for connecting the dipole antenna to a transmission line. | 12-29-2011 |
Antonius Henricus Maria Raaijmakers, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100115837 | TRAY FOR GROWING ORGANIC MATERIAL AND A NURSERY ASSEMBLY | 05-13-2010 |
Fransiscus Adrianus Raaijmakers, Langenboom NL
| Patent application number | Description | Published |
|---|---|---|
| 20080205977 | Operating Device For A Tool, For Example For Felling Trees As Well As An Auxiliary Tool Therefor - The invention relates to an operating device for a tool, comprising a frame to be coupled to the boom of an excavator or the like. at least one tool connected to the frame as well as adjusting means for positioning said at least one tool relative to the boom. The object of the invention is to provide a device of the kind referred to in the introduction, which enables a more versatile use and which, as a result of an improved maneuverability of the tool, is capable of carrying out operations also at places that were previously considered to be difficult to reach. According to the invention, the device is to that end characterized in that the adjusting means also comprise a ball and socket joint, which pivotally connects said at least one tool to the frame. | 08-28-2008 |
Ivo Raaijmakers, Bilthoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20080237048 | METHOD AND APPARATUS FOR SELECTIVE ELECTROFILLING OF THROUGH-WAFER VIAS - A device for electrodepositing a conductive material from a first solution into at least one feature formed on a wafer includes a hollow body, an electrode, and a moving mechanism. The hollow body includes a first opening and a second opening. The first solution is supplied to the second opening and injected from the first opening. The electrode is disposed within the hollow body. A potential difference is applicable between the first electrode and the surface of the wafer to electrodeposit the conductive material into the at least one feature. The moving mechanism is mechanically coupled to the hollow body. The moving mechanism is configured to position the first opening of the hollow body over the at least one feature. | 10-02-2008 |
| 20090068832 | THIN FILMS - Thin films are formed by formed by atomic layer deposition, whereby the composition of the film can be varied from monolayer to monolayer during cycles including alternating pulses of self-limiting chemistries. In the illustrated embodiments, varying amounts of impurity sources are introduced during the cyclical process. A graded gate dielectric is thereby provided, even for extremely thin layers. The gate dielectric as thin as 2 nm can be varied from pure silicon oxide to oxynitride to silicon nitride. Similarly, the gate dielectric can be varied from aluminum oxide to mixtures of aluminum oxide and a higher dielectric material (e.g., ZrO | 03-12-2009 |
| 20100006024 | EPITAXIAL SEMICONDUCTOR DEPOSITION METHODS AND STRUCTURES - Methods for depositing epitaxial films such as epitaxial Ge and SiGe films. During cooling from high temperature processing to lower deposition temperatures for Ge-containing layers, Si or Ge compounds are provided to the substrate. Smooth, thin, relatively defect-free Ge or SiGe layers result. Retrograded relaxed SiGe is also provided between a relaxed, high Ge-content seed layer and an overlying strained layer. | 01-14-2010 |
| 20100009080 | FLUIDIZED BED EVAPORATOR - Methods and systems for depositing a film on a substrate are disclosed. In one embodiment, a method includes converting a non-gaseous precursor into vapor phase. Converting the precursor includes: forming a fluidized bed by flowing gas at a sufficiently high flow rate to suspend and stir a plurality of solid particles, and converting the phase of the non-gaseous precursor into vapor phase in the fluidized bed. The method also includes transferring the precursor in vapor phase through a passage; and performing deposition on one or more substrates with the transferred precursor in vapor phase. | 01-14-2010 |
| 20100107978 | DEPOSITION FROM LIQUID SOURCES - A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber. | 05-06-2010 |
| 20100155859 | SELECTIVE SILICIDE PROCESS - A method of self-aligned silicidation on structures having high aspect ratios involves depositing a metal oxide film using atomic layer deposition (ALD) and converting the metal oxide film to metal film in order to obtain uniform step coverage. The substrate is then annealed such that the metal in regions directly overlying the patterned and exposed silicon reacts with the silicon to form uniform metal silicide at the desired locations. | 06-24-2010 |
| 20110256718 | THIN FILMS - Thin films are formed by formed by atomic layer deposition, whereby the composition of the film can be varied from monolayer to monolayer during cycles including alternating pulses of self-limiting chemistries. In the illustrated embodiments, varying amounts of impurity sources are introduced during the cyclical process. A graded gate dielectric is thereby provided, even for extremely thin layers. The gate dielectric as thin as 2 nm can be varied from pure silicon oxide to oxynitride to silicon nitride. Similarly, the gate dielectric can be varied from aluminum oxide to mixtures of aluminum oxide and a higher dielectric material (e.g., ZrO | 10-20-2011 |
| 20110269310 | SELECTIVE SILICIDE PROCESS - A method of self-aligned silicidation on structures having high aspect ratios involves depositing a metal oxide film using atomic layer deposition (ALD) and converting the metal oxide film to metal film in order to obtain uniform step coverage. The substrate is then annealed such that the metal in regions directly overlying the patterned and exposed silicon reacts with the silicon to form uniform metal silicide at the desired locations. | 11-03-2011 |
Johannes Antonius Maria Raaijmakers, Vianen NL
| Patent application number | Description | Published |
|---|---|---|
| 20100047250 | ACTIVATION EPITOPE OF FCY RII (CD32), BINDING MOLECULES THAT SPECIFICALLY BIND THE EPITOPE AND MEANS AND METHODS FOR THE DETECTION OF THE EPITOPE, AND USES OF SAID EPITOPE OR SAID BINDING MOLECULES - The present invention provides means and method for detecting an activation epitope on FcyRII (CD32) on Fcγ (CD32) expressing cells. The presence of epitope on FcγRII (CD32) correlates with priming of the cell containing FcγRII (CD32) expressing said epitope. The invention further provides binding molecules specific for said activation epitope on FcγRII (CD32), and uses thereof in the detection of activated cells. Further uses are the treatment of individuals suffering from inflammation or at risk of suffering thereof. Also provided, among others, are uses for detecting and/or following an inflammation in an individual. | 02-25-2010 |
Josephus Maria Raaijmakers, Rhenen NL
| Patent application number | Description | Published |
|---|---|---|
| 20110009290 | Methods for Identifying One or More Bioactive Genes - The present invention relates to methods for identifying one or more bioactive genes, comprising: (a) introducing an expressible genomic DNA library derived from a first organism or a group of first organisms into a second organism, wherein said genomic DNA library is comprised in a copy inducible vector in said second organism; (b) growing said multitude of clones of said second organism at a low copy number of said vector and at high copy number of said vector; (c) identifying one or more clones of said second organism wherein said identification comprises identifying altered growth characteristic; and (d) identifying in the one or more clones of said second organism identified in step (c) one or more genes of said first organism or said group of first organisms providing the altered growth characteristic, thereby identifying the one or more bioactive genes. | 01-13-2011 |
Stephan Alexander Raaijmakers, Amsterdam NL
| Patent application number | Description | Published |
|---|---|---|
| 20100280979 | MACHINE LEARNING HYPERPARAMETER ESTIMATION - A method of determining hyperparameters (HP) of a classifier ( | 11-04-2010 |
| 20110251989 | ELECTRONIC DOCUMENT CLASSIFICATION APPARATUS - The apparatus computes classification scores based on parameters that have been determined from documents. Each score is compared with a first and second threshold. Definite classifications are assigned when the score is above the highest threshold or below the lowest threshold and the documents are processed accordingly. If the score is between the thresholds the document is singled out for further inspection, for example by a human arbitrator, to assign a class. The first and second threshold are adapted automatically based on specified a minimum accuracy level for the classification and a training set. The apparatus uses this specified accuracy in a search for a combination of threshold values that optimizes classifier yield, in terms of a maximized fraction of patterns in a training set that need not be turned over for further inspection without definite classification. The search is subject to the condition that the combination of thresholds results in at least the specified accuracy over the training set. | 10-13-2011 |