Patent application number | Description | Published |
20110034882 | Stoppers Used in Pre-filled Syringes - A stopper adapted for attachment with a plunger rod for use within a syringe barrel is disclosed. The stopper includes a main body defining an open rearward end and a closed front end. The open rearward end is adapted to receive a front forward end attachment portion of the plunger rod. The stopper also includes a core member integrally formed with the main body adjacent the closed front end. The core member includes a nose portion having a conical tip configured for entering an outlet opening of the syringe barrel. The closed front end of the stopper has a profile configured to cooperate with an internal surface of the syringe barrel wall to prevent reflux and reduce dead space within the barrel. | 02-10-2011 |
20110160675 | SAFETY PEN NEEDLE ASSEMBLY - In one aspect, a safety pen needle assembly is provided herein which includes a hub with a needle fixed to the hub, the needle having a distal end, formed for insertion into a patient, and a proximal end. The assembly further includes a shield and a biasing member disposed between the hub and the shield configured to urge the shield distally. A protrusion extends from at least one of the hub and the shield with a channel being formed in at least the other of the hub and the shield. The channel is formed to accommodate the protrusion. The shield is movable from a first position to a second position. In the first position, the shield is spaced from the distal end of the needle such that the distal end of the needle is exposed. In the second position, the shield covers the distal end of the needle. The channel guides the protrusion as the shield moves from the first position to the second position. With this arrangement, a shield may be directed to move in a desired path with stability. In addition, the distal end of the needle may be initially exposed to permit visual confirmation of priming, while allowing the shield to cover a majority of the needle to minimize any needle-related anxiety. | 06-30-2011 |
20110257603 | SAFETY PEN NEEDLE ASSEMBLY HAVING SHIELDING FOR PATIENT AND NON-PATIENT ENDS - A safety pen needle assembly is provided herein which includes a hub and a needle fixed to the hub. Further, a first shield is provided, along with a second shield which has a biasing element disposed to urge the second shield proximally towards a proximal end of the needle. The assembly further includes a releasable retaining assembly for releasably retaining the second shield in an initial position against the force of the biasing element. A predetermined extent of movement of the first shield causes the retaining assembly to release the second shield, and, wherein, with the second shield being released, the second shield is urged proximally by the biasing element to a second position where the second shield covers the proximal end of the needle. Advantageously, with the subject invention, an assembly is provided which allows for passive activation of a shield on a non-patient end of a pen needle assembly by a patient-end shield. | 10-20-2011 |
20120143145 | SAFETY PEN NEEDLE ASSEMBLY HAVING SHIELD FOR NON-PATIENT END - A safety pen needle assembly is provided herein which includes a hub; a needle fixed to the hub having a distal end, formed for insertion into a patient, and a proximal end; a shield; a biasing means disposed to urge the shield from a first position to a second position; and, at least one adjustable tab or locking finger on the hub, the tab or finger being adjustable from a first state to a second state. With the tab or finger being in a first state, the tab or finger interferingly engages the shield so as to restrict movement thereof. The tab or finger in the first state retains the shield in its first position with the proximal end of the needle being exposed. With the tab or finger being in the second state, the tab or finger does not interferingly engage with the shield. As such, the shield is permitted to be urged proximally to the second position by the biasing means. In the second position, the shield covers the proximal end of the needle. Advantageously, with the subject invention, a mechanism is provided for shielding a proximal, or non-patient, end of a pen needle, particularly after use. | 06-07-2012 |
20120253291 | Plastic Stopper - A stopper adapted for attachment with a plunger rod for use within a syringe barrel includes a main body portion defining an open rearward end configured to receive the plunger rod. The main body portion is manufactured from a rigid or semi-rigid polymeric material having an elastic modulus in the range of about 0.01 GPa to about 5 GPa. When fluid pressure is increased inside the syringe barrel during an injection, at least one of the following actions occurs: a) a flexible roof of the main body portion expands in a radial direction toward an inner wall of the syringe barrel; b) a first perimetrical skirt extending around an outer circumference of the main body portion is forced against an inner wall of the syringe barrel; and c) an engagement between the plunger rod and an engagement portion provided along an inner circumference of the main body portion. | 10-04-2012 |
20120253292 | Plastic Stopper - A stopper includes a main body portion defining an open rearward end configured to receive the plunger rod, an engagement portion provided along an inner circumference of the main body portion configured to engage at least a top portion of the plunger rod, a closed front end forming a flexible roof, and a first perimetrical skirt extending around an outer circumference of the main body portion toward the closed front end of the main body portion. When fluid pressure is increased inside the syringe barrel during an injection, the flexible roof expands in a radial direction toward an inner wall of the syringe barrel, the first perimetrical skirt is forced against the inner wall of the syringe barrel, and an engagement between the plunger rod and the engagement portion forces the main body portion to expand in the radial direction toward the inner wall of the syringe barrel. | 10-04-2012 |
20130253436 | Positive Displacement Stopper for a Pre-Filled Syringe - A stopper adapted for attachment with a plunger rod for use within a syringe barrel is disclosed. The stopper includes a main body defining an open rearward end and a closed front end. The open rearward end is adapted to receive a front forward end attachment portion of the plunger rod. The stopper also includes a core member integrally formed with said main body adjacent the closed front end. The core member includes a nose portion having a profile adapted to create a positive seal with an outlet opening of such syringe barrel. | 09-26-2013 |
20140107586 | SAFETY PEN NEEDLE ASSEMBLY HAVING SHIELDING FOR PATIENT AND NON-PATIENT ENDS - A safety pen needle assembly is provided herein which includes a hub and a needle fixed to the hub. Further, a first shield is provided, along with a second shield which has a biasing element disposed to urge the second shield proximally towards a proximal end of the needle. The assembly further includes a releasable retaining assembly for releasably retaining the second shield in an initial position against the force of the biasing element. A predetermined extent of movement of the first shield causes the retaining assembly to release the second shield. With the second shield being released, the second shield is urged proximally by the biasing element to a second position where the second shield covers the proximal end of the needle. Advantageously, an assembly is provided which allows for passive activation of a shield on a non-patient end of a pen needle assembly by a patient-end shield. | 04-17-2014 |
20140207081 | Stoppers Used in Pre-Filled Syringes - A stopper adapted for attachment with a plunger rod for use within a syringe barrel is disclosed. The stopper includes a main body defining an open rearward end and a closed front end. The open rearward end is adapted to receive a front forward end attachment portion of the plunger rod. The stopper also includes a core member integrally formed with the main body adjacent the closed front end. The core member includes a nose portion having a conical tip configured for entering an outlet opening of the syringe barrel. The closed front end of the stopper has a profile configured to cooperate with an internal surface of the syringe barrel wall to prevent reflux and reduce dead space within the barrel. | 07-24-2014 |
20150126939 | Telescoping Safety Shield for Needles - A safety shield adapted for use with a syringe having a syringe barrel for protecting a needle after use in a medical procedure is disclosed. The safety shield includes a first portion disposed at least partially about the barrel and axially movable from a retracted position surrounding at least a portion of the syringe barrel to an extended position wherein at least the distal end of the first portion extends beyond the distal end of the syringe barrel. The shield further includes a second portion associated with the first portion and axially movable with respect to the first portion from a retracted position to an extended position extending beyond the distal end of the first portion. First and second locking members are provided for locking the first and second portions in an extended position upon axial movement thereof. | 05-07-2015 |
Patent application number | Description | Published |
20090017190 | Movable injectors in rotating disc gas reactors - A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation. | 01-15-2009 |
20100087050 | Chemical vapor deposition with energy input - Methods of depositing compound semiconductors onto substrates are disclosed, including directing gaseous reactants into a reaction chamber containing the substrates, selectively supplying energy to one of the gaseous reactants in order to impart sufficient energy to activate that reactant but insufficient to decompose the reactant, and then decomposing the reactant at the surface of the substrate in order to react with the other reactants. The preferred energy source is microwave or infrared radiation, and reactors for carrying out these methods are also disclosed. | 04-08-2010 |
20100310766 | Roll-to-Roll Chemical Vapor Deposition System - A roll-to-roll CVD system includes at least two rollers that transport a web through a deposition chamber during CVD processing. The deposition chamber defines a passage for the web to pass through while being transported by the at least two rollers. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources is coupled to the gas input port of each of the plurality of process chambers. | 12-09-2010 |
20100310769 | Continuous Feed Chemical Vapor Deposition System - A continuous feed CVD system includes a wafer transport mechanism that transport a wafer through a deposition chamber during CVD processing. The deposition chamber defines a passage for the wafer to pass through while being transported by the wafer transport mechanism. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources are coupled to the gas input port of each of the plurality of process chambers. | 12-09-2010 |
20110215071 | WAFER CARRIER WITH SLOPED EDGE - A wafer carrier includes a body defining a central axis, a generally planar top surface perpendicular to the central axis, and pockets recessed below the top surface for receiving wafers. The body can include a lip projecting upwardly around the periphery of the top surface. The lip can define a lip surface sloping upwardly from the planar top surface in a radially outward direction away from the central axis. The body can be adapted for mounting on a spindle of a processing apparatus so that the central axis of the body is coaxial with the spindle. The lip can improve the pattern of gas flow over the top surface of the wafer carrier. | 09-08-2011 |
20110297076 | APPARATUS AND METHOD FOR BATCH NON-CONTACT MATERIAL CHARACTERIZATION - An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon. | 12-08-2011 |
20110300645 | APPARATUS AND METHOD FOR BATCH NON-CONTACT MATERIAL CHARACTERIZATION - An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon. | 12-08-2011 |
20120058630 | Linear Cluster Deposition System - A linear cluster deposition system includes a plurality of reaction chambers positioned in a linear horizontal arrangement. First and second reactant gas manifolds are coupled to respective process gas input port of each of the reaction chambers. An exhaust gas manifold having a plurality of exhaust gas inputs is coupled to the exhaust gas output port of each of the plurality of reaction chambers. A substrate transport vehicle transports at least one of a substrate and a substrate carrier that supports at least one substrate into and out of substrate transfer ports of each of the reaction chambers. At least one of a flow rate of process gas into the process gas input port of each of the reaction chambers and a pressure in each of the reaction chambers being chosen so that process conditions are substantially the same in at least two of the reaction chambers. | 03-08-2012 |
20120070916 | MOVABLE INJECTORS IN ROTATING DISC GAS REACTORS - A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation. | 03-22-2012 |
20120156363 | Gas Injection System for Chemical Vapor Deposition Using Sequenced Valves - A gas injection system for a chemical vapor deposition system includes a gas manifold comprising a plurality of valves where each of the plurality of valves has an input that is coupled to a process gas source and an output for providing process gas. Each of a plurality of gas injectors has an input that is coupled to the output of one of the plurality of valves and an output that is positioned in one of a plurality of zones in a chemical vapor deposition reactor. A controller having a plurality of outputs where each of the plurality of outputs is coupled to a control input of one of the plurality of valves. The controller instructs at least some of the plurality of valves to open at predetermined times to provide a desired gas flow to each of the plurality of zones in the chemical vapor deposition reactor. | 06-21-2012 |
20120156374 | SECTIONAL WAFER CARRIER - A structure for a chemical vapor deposition reactor includes a support element defining oppositely-facing substantially planar upper and lower surfaces and a vertical rotational axis substantially perpendicular to the upper and lower surfaces, and a plurality of carrier sections releasably engaged with the support element. Each carrier section can include oppositely-facing substantially planar top and bottom surfaces and at least one aperture extending between the top and bottom surfaces. The carrier sections can be disposed on the support element with the bottom surfaces of the carrier sections facing toward the upper surface of the support element, so that wafers can be held in the apertures of the carrier sections with one surface of each wafer confronting the support element and an opposite surface exposed at the top surface of the carrier sections. | 06-21-2012 |
20120248336 | Apparatus and Method for Batch Non-Contact Material Characterization - An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon. | 10-04-2012 |
20120304926 | HEATED WAFER CARRIER PROFILING - An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates. | 12-06-2012 |
20120307233 | HEATED WAFER CARRIER PROFILING - A method for characterizing a surface comprises rotating a carrier about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer with a major surface of the wafer extending generally transverse to the axis of rotation. A surface characterization tool is moved over a plurality of positions relative to the top surface of the carrier, where a measurement location over the top surface of the carrier is changed while said top surface of the carrier is heated to a predetermined temperature. Characterization signals over the plurality of positions with the surface characterization tool are produced and contain information about the heated top surface of the carrier, or when semiconductor wafers are held on the carrier, information about the semiconductor wafer can also be obtained. | 12-06-2012 |
20140060153 | APPARATUS AND METHOD FOR IMPROVED ACOUSTICAL TRANSFORMATION - An acoustical transformer having a last matching section that includes a protective barrier of low permeability. The protective barrier is in contact with a test medium. In one embodiment, the protective barrier comprises one or more low permeability layers, such as a metallic foil or metallic coating(s) disposed on a low impedance layer such as polyimide, so that the low impedance layer and the protective barrier constitute the last matching section of the acoustical transformer. In other embodiments, the protective barrier comprises a fluoropolymer. A method for determining the thicknesses of the various layers of the acoustical transformer for enhanced performance is also disclosed. | 03-06-2014 |
20140318453 | CHEMICAL VAPOR DEPOSITION WITH ENERGY INPUT - Methods of depositing compound semiconductors onto substrates are disclosed, including directing gaseous reactants into a reaction chamber containing the substrates, selectively supplying energy to one of the gaseous reactants in order to impart sufficient energy to activate that reactant but insufficient to decompose the reactant, and then decomposing the reactant at the surface of the substrate in order to react with the other reactants. The preferred energy source is microwave or infrared radiation, and reactors for carrying out these methods are also disclosed. | 10-30-2014 |
20150140832 | HIGH VACUUM OLED DEPOSITION SOURCE AND SYSTEM - Sources, devices, and techniques for deposition of organic layers, such as for use in an OLED, are provided. A vaporizer may vaporize a material between cooled side walls and toward a mask having an adjustable mask opening. The mask opening may be adjusted to control the pattern of deposition of the material on a substrate, such as to correct for material buildup that occurs during deposition. Material may be collected from the cooled side walls for reuse. | 05-21-2015 |
20150144890 | Structure to Enhance Light Extraction and Lifetime of OLED Devices - A device having high index layers is provided. The device includes an organic light emissive device, an air interface, a first planarization layer, and a first barrier layer. The first planarization layer is disposed between the air interface and the organic light emissive device and has an index of refraction of at least 1.6. The first barrier layer is disposed between the first planarization layer and the organic emissive device and has an index of refraction of at least 1.6. | 05-28-2015 |
20150214507 | THIN-FORM LIGHT-ENHANCED SUBSTRATE FOR OLED LUMINAIRE - Devices and techniques are provided in which a transparent substrate is scored to provide a non-planar surface on one side of the substrate. An OLED is then disposed on the other side of the scored substrate and optically coupled to the substrate. The scored surface provides improvements to outcoupling of light generated by the OLED, with little or no additional thickness relative to the OLED alone. | 07-30-2015 |
20150225875 | DENSITY-MATCHING ALKYL PUSH FLOW FOR VERTICAL FLOW ROTATING DISK REACTORS - In a rotating disk reactor for growing epitaxial layers on substrate or other CVD reactor system, gas directed toward the substrates at gas inlets at different radial distances from the axis of rotation of the disk has both substantially the same gas flow rate/velocity and substantially the same gas density at each inlet. The gas directed toward portions of the disk remote from the axis may include a higher concentration of a reactant gas than the gas directed toward portions of the disk close to the axis, so that portions of the substrate surfaces at different distances from the axis receive substantially the same amount of reactant gas per unit area, and a combination of carrier gases with different relative molecular weights at different radial distances from the axis of rotation are employed to substantially make equal the gas density in each region of the reactor. The system may be applied with a combination or carrier gases at multiple gas inlets, a combination of carrier and reactant gases at multiple inlets, and may be used with an arbitrarily large number of gases, when at least two gases of different molecular weights are provided. A linear flow pattern is achieved within the reactor, avoiding laminar recirculation areas, and permitting uniform deposition and growth of epitaxial layers on the substrate. | 08-13-2015 |
20150280170 | HERMETICALLY SEALED ISOLATED OLED PIXELS - A novel thin film encapsulated OLED panel architecture and a method for making the panels with improved shelf life is disclosed. The OLED panel consists of a plurality of OLED pixels; each OLED pixel is individually hermetically sealed and isolated from its neighboring pixels. The organic stack of the OLED pixel is contained within its own hermetically sealed structure, achieved by making the structure on a barrier coated substrate and using a first barrier material as the grid and a second barrier for encapsulating the entire OLED pixel. The first barrier material provides the edge seal while the second barrier disposed over the pixel provides protection from top down moisture diffusion. By isolating and hermetically sealing individual pixels; any damage such as moisture and oxygen ingress due to defects or particles, delamination, cracking etc. can be effectively contained within the pixel thereby protecting other pixels in the panel. | 10-01-2015 |
20150340410 | Top Emission AMOLED Displays using Two Emissive Layers - Full-color pixel arrangements for use in devices such as OLED displays are provided, in which multiple sub-pixels are configured to emit different colors of light, with each sub-pixel having a different optical path length than some or all of the other sub-pixels within the pixel. | 11-26-2015 |
20150376787 | SPATIAL CONTROL OF VAPOR CONDENSATION USING CONVECTION - Embodiments of the disclosed subject matter provide a device including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, and a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel. | 12-31-2015 |
20150380648 | SYSTEMS AND METHODS OF MODULATING FLOW DURING VAPOR JET DEPOSITION OF ORGANIC MATERIALS - Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle. | 12-31-2015 |