Putkonen
Aki Putkonen, Tampere FI
Patent application number | Description | Published |
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20090299707 | System for Evaluating the Productivity of a Working Machine and its Driver - A system and method for evaluating the productivity of a working machine and its driver in a real or virtual operating environment is controlled by means of a control system to perform work, and in which the work cycles relating to the work performed by the working machine are determined by means of continuous measurements directed to the working machine when it is controlled by the driver. Characteristic values relating to the performance of the determined work cycles are collected on the basis of the continuous measurements for the purpose of evaluating the performance of the work or for comparison. | 12-03-2009 |
20100065155 | SYSTEM FOR MEASURING THE PERFORMANCE OF A FOREST MACHINE - A system and a method for monitoring the performance of a subsystem of a forest machine. The method comprises the steps of: collecting data relating to the function of said subsystem or the performing of said function; determining one or more characteristic values to describe the performance continually according to data; and monitoring the variation of said one or more characteristic values in time, wherein, for example, the variation of said one or more characteristic values in time is displayed in the form of a graphic presentation to the user. | 03-18-2010 |
Matti Putkonen, Espoo FI
Patent application number | Description | Published |
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20110041556 | GLASS SURFACE MODIFICATION PROCESS - Process for improving the chemical durability of glass by modifying at least one surface of a glass substrate. The modification process utilizes crystalline metal oxide particles with a mean aerodynamic particle diameter of less than 1000 nm, which are at least partially embedded on and into the glass surface. Apparatus for depositing crystalline metal oxide particles on glass surface. | 02-24-2011 |
20110099798 | FORMATION OF A LITHIUM COMPRISING STRUCTURE ON A SUBSTRATE BY ALD - The present invention discloses a method for the formation of lithium comprising layer on a substrate using an atomic layer deposition method. The method comprises the sequential pulsing of a lithium precursor through a reaction chamber for deposition upon a substrate. Using further oxidising pulses and or other metal containing precursor pulses, an electrolyte suitable for use in thin film batteries may be manufactured. | 05-05-2011 |
20110111175 | METHOD FOR INCREASING THE DURABILITY OF GLASS AND A GLASS PRODUCT - A method for increasing the durability of glass ( | 05-12-2011 |
20120177903 | MULTILAYER COATING, METHOD FOR FABRICATING A MULTILAYER COATING, AND USES FOR THE SAME - A multilayer coating and a method for fabricating a multilayer coating on a substrate ( | 07-12-2012 |
20120307193 | STRENGTHENED STRUCTURAL MODULE AND METHOD OF FABRICATION - A strengthened structural module ( | 12-06-2012 |
20130130044 | METHOD FOR FORMING A DECORATIVE COATING ON A GEMSTONE, A DECORATIVE COATING ON A GEMSTONE, AND USES OF THE SAME - A decorative coating and a method for forming a decorative coating on a gemstone to change the natural visual appearance of the gemstone. The decorative coating comprises an optically absorbing film. Depositing the absorbing film on the substrate comprises the alternating steps of introducing a first precursor to the reaction space such that at least a portion of the first precursor gets adsorbed onto the surface of the substrate, and subsequently purging the reaction space, and introducing a second precursor to the reaction space such that at least a portion of the second precursor reacts with the portion of the first precursor adsorbed onto the surface of the substrate to form a conformal absorbing film on the substrate comprising the gemstone, and subsequently purging the reaction space. The material of the absorbing film is selected from the group of oxides, carbides, noble metals or a mixture thereof. | 05-23-2013 |
Matti Putkonen, Helsinki FI
Patent application number | Description | Published |
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20090035949 | METHOD OF DEPOSITING RARE EARTH OXIDE THIN FILMS - The present invention concerns a process for depositing rare earth oxide thin films, especially yttrium, lanthanum and gadolinium oxide thin films by an ALD process, according to which invention the source chemicals are cyclopentadienyl compounds or rare earth metals, especially those of yttrium, lanthanum and gadolinium. Suitable deposition temperatures for yttrium oxide are between 200 and 400° C. when the deposition pressure is between 1 and 50 mbar. Most suitable deposition temperatures for lanthanum oxide are between 160 and 165° C. when the deposition pressure is between 1 and 50 mbar. | 02-05-2009 |
20100266751 | PROCESS FOR PRODUCING ZIRCONIUM OXIDE THIN FILMS - This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate. According to the invention, an yttrium source material and a zirconium source material are alternately used as the metal source material so as to form an yttrium-stabilised zirconium oxide (YSZ) thin film on a substrate. | 10-21-2010 |