Patent application number | Description | Published |
20090299741 | Detection and Use of Acoustic Signal Quality Indicators - A computer-driven device assists a user in self-regulating speech control of the device. The device processes an input signal representing human speech to compute acoustic signal quality indicators indicating conditions likely to be problematic to speech recognition, and advises the user of those conditions. | 12-03-2009 |
20130060789 | METHOD AND APPARATUS FOR GENERATION AND AUGMENTATION OF SEARCH TERMS FROM EXTERNAL AND INTERNAL SOURCES - A method and apparatus to identify names, personalities, titles, and topics that are present in a repository and to identify names, personalities, titles, and topics that are not present in the repository, uses information from external data sources, notably the text used in non-speech, text-based searches, to expand the search terms. The expansion takes place in two forms: (1) finding plausible linguistic variants of existing search terms that are already comprehended in the repository, but that are present under slightly different names; and (2) expanding the existing search term list with items that should be there by virtue of their currency in popular culture, but which for whatever reason have not yet been reflected with content items in the repository. | 03-07-2013 |
20130325485 | DETECTION AND USE OF ACOUSTIC SIGNAL QUALITY INDICATORS - A computer-driven device assists a user in self-regulating speech control of the device. The device processes an input signal representing human speech to compute acoustic signal quality indicators indicating conditions likely to be problematic to speech recognition, and advises the user of those conditions. | 12-05-2013 |
20150032715 | METHOD AND APPARATUS FOR GENERATION AND AUGMENTATION OF SEARCH TERMS FROM EXTERNAL AND INTERNAL SOURCES - A method and apparatus to identify names, personalities, titles, and topics that are present in a repository and to identify names, personalities, titles, and topics that are not present in the repository, uses information from external data sources, notably the text used in non-speech, text-based searches, to expand the search terms. The expansion takes place in two forms: (1) finding plausible linguistic variants of existing search terms that are already comprehended in the repository, but that are present under slightly different names; and (2) expanding the existing search term list with items that should be there by virtue of their currency in popular culture, but which for whatever reason have not yet been reflected with content items in the repository. | 01-29-2015 |
20150106100 | EFFICIENT EMPIRICAL COMPUTATION AND UTILIZATION OF ACOUSTIC CONFUSABILITY - Efficient empirical determination, computation, and use of an acoustic confusability measure comprises: (1) an empirically derived acoustic confusability measure, comprising a means for determining the acoustic confusability between any two textual phrases in a given language, where the measure of acoustic confusability is empirically derived from examples of the application of a specific speech recognition technology, where the procedure does not require access to the internal computational models of the speech recognition technology, and does not depend upon any particular internal structure or modeling technique, and where the procedure is based upon iterative improvement from an initial estimate; (2) techniques for efficient computation of empirically derived acoustic confusability measure, comprising means for efficient application of an acoustic confusability score, allowing practical application to very large-scale problems; and (3) a method for using acoustic confusability measures to make principled choices about which specific phrases to make recognizable by a speech recognition application. | 04-16-2015 |
Patent application number | Description | Published |
20080215329 | Methods and Apparatus for Generating Dialog State Conditioned Language Models - Techniques are provided for generating improved language modeling. Such improved modeling is achieved by conditioning a language model on a state of a dialog for which the language model is employed. For example, the techniques of the invention may improve modeling of language for use in a speech recognizer of an automatic natural language based dialog system. Improved usability of the dialog system arises from better recognition of a user's utterances by a speech recognizer, associated with the dialog system, using the dialog state-conditioned language models. By way of example, the state of the dialog may be quantified as: (i) the internal state of the natural language understanding part of the dialog system; or (ii) words in the prompt that the dialog system played to the user. | 09-04-2008 |
20090156241 | Automatic Service Vehicle Hailing and Dispatch System and Method - A system and method are provided for improving efficiency of operation and convenience of access to a fleet of taxis, or other service vehicles, requiring rapid, on-demand dispatch to customer-determined locations. Automatic speech recognition (ASR) and/or radiolocation technology are used to automate the entry of the customer pickup location, and optionally the dropoff location and other relevant information as well. A customer speaks the pickup location into a cellular telephone which then digitizes and transmits it as a data communication to an ASR system. The ASR system decodes the digitized utterance into a pickup location which is passed to a vehicle matching and dispatch system. The vehicle matching and dispatch system matches a taxi and dispatches it to the pickup location. In one embodiment, the identified pickup location is transmitted to the customer's cellular telephone for confirmation or correction, before dispatch of the requested taxi. | 06-18-2009 |
20110320232 | Automatic Service Vehicle Hailing and Dispatch System and Method - A system and method are provided for improving efficiency of operation and convenience of access to a fleet of taxis, or other service vehicles, requiring rapid, on-demand dispatch to customer-determined locations. Automatic speech recognition (ASR) and/or radiolocation technology arc used to automate the entry of the customer pickup location, and optionally the dropoff location and other relevant information as well. A customer speaks the pickup location into a cellular telephone which then digitizes and transmits it as a data communication to an ASR system. The ASR system decodes the digitized utterance into a pickup location which is passed to a vehicle matching and dispatch system. The vehicle matching and dispatch system matches a taxi and dispatches it to the pickup location. In one embodiment, the identified pickup location is transmitted to the customer's cellular telephone for confirmation or correction, before dispatch of the requested taxi. | 12-29-2011 |
Patent application number | Description | Published |
20100154826 | System and Method For Rinse Optimization - Embodiments of the invention provide optimized rinse systems and methods for providing rinsing solutions to one or more surfaces of semiconductor wafers. Embodiments of the invention may be applied to process wafers at different points in a manufacturing cycle, and the wafers can include one or more metal layers. | 06-24-2010 |
20100273107 | Dual tone development with a photo-activated acid enhancement component in lithographic applications - A method and system for patterning a substrate using a lithographic process, such as a dual tone development process, is described. The method comprises use of at least one photo-activated acid enhancement component to improve process latitude for the dual tone development process. | 10-28-2010 |
20100273111 | Dual tone development with plural photo-acid generators in lithographic applications - A method and system for patterning a substrate using a dual tone development process is described. The method comprises use of plural photo-acid generators with or without a flood exposure of the substrate to improve process latitude for the dual tone development process. | 10-28-2010 |
20120045721 | METHOD FOR FORMING A SELF-ALIGNED DOUBLE PATTERN - The invention can provide a method of processing a substrate using Double-Patterned-Shadow (D-P-S) processing sequences that can include (D-P-S) creation procedures, (D-P-S) evaluation procedures, and (D-P-S) transfer sequences. The (D-P-S) creation procedures can include deposition procedures, activation procedures, de-protecting procedures, sidewall angle (SWA) correction procedure, and Double Patterned (DP) developing procedures. | 02-23-2012 |
20120045722 | TECHNIQUE TO FORM A SELF-ALIGNED DOUBLE PATTERN - The invention can provide a method of processing a substrate using Double-Patterned-Shadow (D-P-S) processing sequences that can include (D-P-S) creation procedures, (D-P-S) evaluation procedures, and (D-P-S) transfer sequences. The (D-P-S) creation procedures can include deposition procedures, activation procedures, de-protecting procedures, sidewall angle (SWA) correction procedure, and Double Patterned (DP) developing procedures. | 02-23-2012 |
20120247505 | ETCH SYSTEM AND METHOD FOR SINGLE SUBSTRATE PROCESSING - Provided is a method and system for increasing etch rate and etch selectivity of a masking layer on a substrate in an etch treatment system, the etch treatment system configured for single substrate processing. The method comprises obtaining a supply of steam water vapor mixture at elevated pressure, obtaining a supply of treatment liquid for selectively etching the masking layer over the silicon or silicon oxide at a set etch selectivity ratio, placing the substrate into the etch processing chamber, combining the treatment liquid and the steam water vapor mixture, and injecting the combined treatment liquid and the steam water vapor mixture into the etch processing chamber, wherein the flow of the combined treatment liquid and the steam water vapor mixture is controlled to maintain a set etch rate and a set etch selectivity ratio of the masking layer to silicon or silicon oxide. | 10-04-2012 |
20120248061 | INCREASING MASKING LAYER ETCH RATE AND SELECTIVITY - Provided is a method and system for increasing etch rate and etch selectivity of a masking layer on a substrate, wherein the system comprises a plurality of substrates containing the masking layer and a layer of silicon or silicon oxide, an etch processing chamber configured to process the plurality of substrates, the processing chamber containing a treatment liquid for etching the masking layer, and a boiling apparatus coupled to the processing chamber and configured to generate a supply of steam water vapor mixture at elevated pressure, wherein the steam water vapor mixture is introduced into the processing chamber at a controlled rate to maintain a selected target etch rate and a target etch selectivity ratio of the masking layer to silicon or silicon oxide. | 10-04-2012 |
20140137892 | METHOD AND SYSTEM OF PROCESS CHEMICAL TEMPERATURE CONTROL USING AN INJECTION NOZZLE - A method of process chemical temperature control for resist stripping of a substrate in a resist stripping system includes selecting at least two temperature control objectives and selecting at least two temperature control operating variables for optimization to achieve the at least two temperature control objectives. The method further includes injecting and mixing a first process chemical and a second process chemical into a treatment liquid delivery system of the resist stripping system, which forms a treatment liquid including an active species. The method further includes injecting vapor into the treatment liquid delivery system. The vapor is injected into the treatment liquid or the treatment liquid is injected into the vapor. Treatment liquid is dispensed from the dispensing device onto the substrate. At least two of the temperature control operating variables are adjusted in response to at least two metrology data values. | 05-22-2014 |
20140144463 | CONTROLLING CLEANING OF A LAYER ON A SUBSTRATE USING NOZZLES - Provided is a method for cleaning an on implanted resist layer or a substrate after an ashing process. A duty cycle for turning on and turning off flows of a treatment liquid using two or more nozzles is generated. The substrate is exposed to the treatment liquid comprising a first treatment chemical, the first treatment chemical with a first film thickness, temperature, total flow rate, and first composition. A portion of a surface of the substrate is concurrently irradiated with UV light while controlling the selected plurality of cleaning operating variables in order to achieve the two or more cleaning objectives. The cleaning operating variables comprise two or more of the first temperature, first composition, first film thickness, UV wavelength, UV power, first process time, first rotation speed, duty cycle, and percentage of residue removal are optimized to achieve the two or more cleaning objectives, | 05-29-2014 |
20140235070 | COVER PLATE FOR WIND MARK CONTROL IN SPIN COATING PROCESS - Techniques disclosed herein provide an apparatus and method of spin coating that inhibits the formation of wind marks and other defects from turbulent fluid-flow, thereby enabling higher rotational velocities and decreased drying times, while maintaining film uniformity. Techniques disclosed herein include a fluid-flow member, such as a ring or cover, positioned or suspended above the surface of a wafer or other substrate. The fluid-flow member has a radial curvature that prevents wind marks during rotation of a wafer during a coating and spin drying process. | 08-21-2014 |
20150031214 | Chemical Fluid Processing Apparatus and Chemical Fluid Processing Method - A chemical fluid processing apparatus and a chemical fluid processing method are described, to treat a substrate with a plurality of chemical fluids such that substantially constant temperature is maintained across a substrate surface. The apparatus includes a discharge nozzle above the substrate to supply a first chemical fluid at a first temperature to a front surface of the substrate, a bar nozzle oriented in a radial direction of the substrate to supply a second chemical fluid at a second temperature to the front surface or a back surface of the substrate, the second temperature being higher than the first temperature, and where the bar nozzle includes a plurality of outlets for discharging the second chemical fluid to a plurality of contacting places on the front surface or the back surface of the substrate at different distances from the center of the substrate. | 01-29-2015 |
Patent application number | Description | Published |
20150328649 | METHOD AND APPARATUS FOR MULTIPLE RECIRCULATION AND FILTRATION CYCLES PER DISPENSE IN A PHOTORESIST DISPENSE SYSTEM - An apparatus for dispensing a liquid onto a substrate may comprise a reservoir for storing the liquid to be dispensed; a filter comprising an inlet and an outlet, the filter inlet in fluidic communication with the reservoir via a first valve; a dosing pump comprising an inlet, a first outlet, and a second outlet, the dosing pump inlet in fluidic communication with the reservoir and the dosing pump second outlet in fluidic communication with the filter inlet via a second valve, the dosing pump configured to dose an amount of the liquid and pump the liquid; and a dispense nozzle in fluidic communication with the dosing pump first outlet, the dispense nozzle configured to dispense the liquid onto the substrate. | 11-19-2015 |
20150328650 | METHOD AND APPARATUS FOR INCREASED RECIRCULATION AND FILTRATION IN A PHOTORESIST DISPENSE SYSTEM USING A LIQUID EMPTY RESERVOIR - An apparatus for dispensing a liquid onto a substrate may comprise a reservoir for storing the liquid to be dispensed; a filter comprising an inlet and an outlet, the filter inlet in fluidic communication with the reservoir via a first valve; a dosing pump comprising an inlet, a first outlet, and a second outlet, the dosing pump inlet in fluidic communication with the reservoir and the dosing pump second outlet in fluidic communication with the filter inlet via a second valve, the dosing pump configured to dose an amount of the liquid and pump the liquid; and a dispense nozzle in fluidic communication with the dosing pump first outlet, the dispense nozzle configured to dispense the liquid onto the substrate. | 11-19-2015 |
20150331322 | METHOD AND APPARATUS FOR INCREASED RECIRCULATION AND FILTRATION IN A PHOTORESIST DISPENSE SYSTEM USING A RECIRCULATION PUMP/LOOP - An apparatus for dispensing a liquid onto a substrate may comprise a reservoir for storing the liquid to be dispensed; a filter comprising an inlet and an outlet, the filter inlet in fluidic communication with the reservoir via a first valve; a dosing pump comprising an inlet, a first outlet, and a second outlet, the dosing pump inlet in fluidic communication with the reservoir and the dosing pump second outlet in fluidic communication with the filter inlet via a second valve, the dosing pump configured to dose an amount of the liquid and pump the liquid; and a dispense nozzle in fluidic communication with the dosing pump first outlet, the dispense nozzle configured to dispense the liquid onto the substrate. | 11-19-2015 |